JPH04314391A - Adhesive for fabricating printed circuit board by additive process - Google Patents
Adhesive for fabricating printed circuit board by additive processInfo
- Publication number
- JPH04314391A JPH04314391A JP7994491A JP7994491A JPH04314391A JP H04314391 A JPH04314391 A JP H04314391A JP 7994491 A JP7994491 A JP 7994491A JP 7994491 A JP7994491 A JP 7994491A JP H04314391 A JPH04314391 A JP H04314391A
- Authority
- JP
- Japan
- Prior art keywords
- weight
- epoxy resin
- glycidyl methacrylate
- adhesive
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000853 adhesive Substances 0.000 title claims abstract description 45
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 45
- 239000000654 additive Substances 0.000 title claims description 15
- 230000000996 additive effect Effects 0.000 title claims description 15
- 238000000034 method Methods 0.000 title claims description 14
- 239000003822 epoxy resin Substances 0.000 claims abstract description 24
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 24
- 229920000459 Nitrile rubber Polymers 0.000 claims abstract description 23
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229920005989 resin Polymers 0.000 claims abstract description 13
- 239000011347 resin Substances 0.000 claims abstract description 13
- 239000012535 impurity Substances 0.000 claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims abstract description 6
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical class C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 claims abstract description 4
- 238000007772 electroless plating Methods 0.000 claims description 7
- 239000003960 organic solvent Substances 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 6
- 238000004132 cross linking Methods 0.000 claims description 4
- 150000001767 cationic compounds Chemical class 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 125000002091 cationic group Chemical group 0.000 claims 1
- 230000007797 corrosion Effects 0.000 abstract description 9
- 238000005260 corrosion Methods 0.000 abstract description 9
- -1 cation compound Chemical class 0.000 abstract description 7
- 239000000126 substance Substances 0.000 abstract description 7
- 150000002500 ions Chemical class 0.000 abstract description 3
- YXVFYQXJAXKLAK-UHFFFAOYSA-N biphenyl-4-ol Chemical compound C1=CC(O)=CC=C1C1=CC=CC=C1 YXVFYQXJAXKLAK-UHFFFAOYSA-N 0.000 abstract description 2
- 150000001768 cations Chemical class 0.000 abstract 2
- 239000003999 initiator Substances 0.000 abstract 2
- 230000003287 optical effect Effects 0.000 abstract 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 229920001971 elastomer Polymers 0.000 abstract 1
- 239000005060 rubber Substances 0.000 abstract 1
- 238000007747 plating Methods 0.000 description 22
- 239000000758 substrate Substances 0.000 description 12
- 238000012360 testing method Methods 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 10
- 239000010949 copper Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 6
- 239000004020 conductor Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000011256 inorganic filler Substances 0.000 description 3
- 229910003475 inorganic filler Inorganic materials 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 3
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000012952 cationic photoinitiator Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- NGFPWHGISWUQOI-UHFFFAOYSA-N 2-sec-butylphenol Chemical compound CCC(C)C1=CC=CC=C1O NGFPWHGISWUQOI-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- JZULKTSSLJNBQJ-UHFFFAOYSA-N chromium;sulfuric acid Chemical compound [Cr].OS(O)(=O)=O JZULKTSSLJNBQJ-UHFFFAOYSA-N 0.000 description 1
- 239000000701 coagulant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- KPVWDKBJLIDKEP-UHFFFAOYSA-L dihydroxy(dioxo)chromium;sulfuric acid Chemical compound OS(O)(=O)=O.O[Cr](O)(=O)=O KPVWDKBJLIDKEP-UHFFFAOYSA-L 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- QBDSZLJBMIMQRS-UHFFFAOYSA-N p-Cumylphenol Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=CC=C1 QBDSZLJBMIMQRS-UHFFFAOYSA-N 0.000 description 1
- NKTOLZVEWDHZMU-UHFFFAOYSA-N p-cumyl phenol Natural products CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000009824 pressure lamination Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- YDVDUENYRYEFLW-UHFFFAOYSA-K sodium dihydroxy(dioxo)chromium sulfuric acid fluoride Chemical compound [F-].[Na+].OS(O)(=O)=O.O[Cr](O)(=O)=O YDVDUENYRYEFLW-UHFFFAOYSA-K 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、耐電食性に優れかつ低
温、短時間硬化が可能な紫外線硬化型アディティブ法プ
リント配線板用接着剤に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet curing adhesive for additive printed wiring boards that has excellent electrical corrosion resistance and can be cured at low temperatures and in a short time.
【0002】0002
【従来の技術】周知のように、アディティブ法によるプ
リント配線板は、接着剤付き絶縁基板に無電解めっきで
必要な配線パターンを形成するものである。例えば、め
っき触媒を含有する積層板などの絶縁基板にめっき触媒
を含有する接着剤層を設け160℃以上の温度により約
1時間硬化する。次いで、めっきレジストによりマスク
した後、無電解めっき前処理として、クロム硫酸などの
酸化性エッチング液で回路形成部の接着剤層表面を選択
的に化学粗化する。そして、中和及び水洗工程を経て無
電解銅めっき液に浸漬し、回路部に銅を析出させて、配
線パターンを形成する。2. Description of the Related Art As is well known, printed wiring boards produced by the additive method are those in which necessary wiring patterns are formed on an adhesive-coated insulating substrate by electroless plating. For example, an adhesive layer containing a plating catalyst is provided on an insulating substrate such as a laminate containing a plating catalyst and cured at a temperature of 160° C. or higher for about 1 hour. Next, after masking with a plating resist, the surface of the adhesive layer in the circuit forming portion is selectively chemically roughened using an oxidizing etching solution such as chromium sulfuric acid as a pretreatment for electroless plating. Then, after a neutralization and water washing process, it is immersed in an electroless copper plating solution to deposit copper on the circuit portion, thereby forming a wiring pattern.
【0003】このようなアディティブ法によるプリント
配線板の接着剤としては、一般に析出銅めっきとの接着
性に優れたアクリロニトリルブタジエンゴムや両末端の
カルボキシル基を含有するアクリロニトリルブタジエン
ゴムを主成分とし、かつ耐熱性を確保するためにアルキ
ルフェノ−ル樹脂あるいはエポキシ樹脂などの熱硬化性
樹脂成分を配合し、また、接着剤塗膜の補強及び化学粗
化のために無機充填剤などを適宜配合した接着剤が提案
されてきた。[0003] Adhesives for printed wiring boards produced by such an additive method generally contain acrylonitrile butadiene rubber, which has excellent adhesion to deposited copper plating, or acrylonitrile butadiene rubber containing carboxyl groups at both ends, and Adhesives that contain thermosetting resin components such as alkylphenol resins or epoxy resins to ensure heat resistance, and inorganic fillers as appropriate to reinforce and chemically roughen the adhesive coating. agents have been proposed.
【0004】例えば、このような接着剤に関する技術を
開示するものとしては、特公昭48−24250号公報
、特公昭45−9843号公報、特公昭45−9996
号公報、特公昭55−16391号公報、特公昭52−
31539号公報、特開昭51−28668号公報など
がある。[0004] For example, Japanese Patent Publication No. 48-24250, Japanese Patent Publication No. 9843-1983, and Japanese Patent Publication No. 45-9996 disclose techniques related to such adhesives.
Publication No. 16391, Special Publication No. 16391, Special Publication No. 52-
31539, Japanese Unexamined Patent Publication No. 51-28668, etc.
【0005】[0005]
【発明が解決しようとする課題】ところで、近年、電子
機器の小型化、軽量化に伴い配線の高密度化が要求され
ており、それに伴ってスルーホール間隔も狭くなってき
ている。その結果、隣接する配線導体または、スルーホ
ール内壁の導体間に生じる電界によって、その導体を支
持する絶縁基材中の不純物イオンや内部に残る各種の処
理液が活性化され、導体間の移行現象による絶縁劣化が
進行しやすくなる。[Problems to be Solved by the Invention] In recent years, with the miniaturization and weight reduction of electronic devices, there has been a demand for higher wiring densities, and as a result, the spacing between through holes has become narrower. As a result, the electric field generated between adjacent wiring conductors or conductors on the inner wall of the through hole activates impurity ions in the insulating base material that supports the conductor and various processing solutions remaining inside, causing a migration phenomenon between the conductors. Insulation deterioration due to this will progress more easily.
【0006】したがって、高密度配線を行うには、導体
の幅のみを小さくしなければならず、高密度配線に限界
が生じてきた。[0006] Therefore, in order to perform high-density wiring, only the width of the conductor must be reduced, which has put a limit on high-density wiring.
【0007】一方、高密度配線を達成するためには、プ
リント配線板用基板の寸法安定性、そり、ねじれなど機
械的特性も重要となってきた。これからは、接着剤の硬
化及びめっきレジスト硬化あるいは無電解めっき後のア
ニールなど、プリント配線板を製造する工程に加わる熱
により影響を受ける。On the other hand, in order to achieve high-density wiring, mechanical properties such as dimensional stability, warping, and twisting of printed wiring board substrates have also become important. From now on, it will be affected by the heat added to the process of manufacturing printed wiring boards, such as curing of adhesives, curing of plating resists, and annealing after electroless plating.
【0008】このため、プリント配線板用材料には、低
温、短時間で硬化できる技術の開発も必要となっている
。[0008] For this reason, it is necessary to develop a technology that allows materials for printed wiring boards to be cured at low temperatures and in a short time.
【0009】本発明は、このような問題について鋭意検
討した結果なされたもので、耐電食性に優れ絶縁基板の
表面における絶縁劣化に有効で、かつ低温、短時間で硬
化可能な高密度配線に適したアディティブ法プリント配
線板用接着剤を提供するものである。The present invention was developed as a result of intensive studies on these problems, and is suitable for high-density wiring that has excellent electrical corrosion resistance, is effective against insulation deterioration on the surface of an insulated substrate, and can be cured at low temperatures and in a short time. The present invention provides an adhesive for printed wiring boards using an additive method.
【0010】0010
【課題を解決するための手段】本発明のアディティブ法
プリント配線板用接着剤は、(A)分子内にメタクリル
酸グリシジルを有し、かつ金属イオン性不純物含有量が
50ppm以下である高純度アクリロニトリルブタジエ
ンゴムと、(B)アルキルフェノ−ル樹脂と、(C)エ
ポキシ樹脂と、(D)高純度アクリロニトリルブタジエ
ンゴム中のメタクリル酸グリシジルとエポキシ樹脂とを
同時に架橋するカチオン反応型光開始剤とを必須成分と
して含有することを特徴とする。[Means for Solving the Problems] The adhesive for additive printed wiring boards of the present invention comprises (A) a high-purity acrylonitrile having glycidyl methacrylate in the molecule and having a metal ionic impurity content of 50 ppm or less; butadiene rubber, (B) an alkylphenol resin, (C) an epoxy resin, and (D) a cationic photoinitiator that simultaneously crosslinks glycidyl methacrylate and the epoxy resin in the high-purity acrylonitrile butadiene rubber. It is characterized by being contained as an essential component.
【0011】本発明に用いるメタクリル酸グリシジルを
有するアクリロニトリルブタジエンゴムは、アクリロニ
トリルブタジエンにメタクリル酸グリシジルを共重合さ
せたものである。The acrylonitrile butadiene rubber containing glycidyl methacrylate used in the present invention is obtained by copolymerizing acrylonitrile butadiene with glycidyl methacrylate.
【0012】メタクリル酸グリシジルの含有量は、特に
限定するものではないが、2重量%以上含有するものが
好ましい。The content of glycidyl methacrylate is not particularly limited, but it is preferably 2% by weight or more.
【0013】また、通常のアクリロニトリルブタジエン
ゴムは、一般に乳化重合で製造されるが、乳化剤として
使用される界面活性剤、あるいは凝固剤などの重合残渣
によりK+ 、Na+ 、Mg+ 、SO4 2−、C
l− 、などの金属イオン性不純物の総量が数%に及ぶ
。[0013] Ordinary acrylonitrile butadiene rubber is generally produced by emulsion polymerization, but polymerization residues such as a surfactant used as an emulsifier or a coagulant cause K+, Na+, Mg+, SO4 2-, C
The total amount of metal ionic impurities such as l-, etc. reaches several percent.
【0014】本発明に用いる高純度アクリロニトリルブ
タジエンゴムは、その製造工程において、これらのイオ
ン性物質を極力使用しない製造法とした。その結果、K
+ 、Na+ 、Ma+ 、SO4 2−、Cl− 、
などの各イオン総量を50ppm以下とすることができ
る。[0014] The high purity acrylonitrile butadiene rubber used in the present invention is manufactured using a manufacturing process that uses as little of these ionic substances as possible. As a result, K
+, Na+, Ma+, SO4 2-, Cl-,
The total amount of each ion can be 50 ppm or less.
【0015】また、接着剤の有機溶剤を除く固形分のう
ち、メタクリル酸グリシジルを有する高純度アクリロニ
トリルブタジエンゴムの配合量は、10〜60重量部の
範囲である。10重量部未満では、析出した銅との接着
力が低下し易く、60重量部以上では耐熱性が悪化する
。The amount of high purity acrylonitrile butadiene rubber containing glycidyl methacrylate in the solid content of the adhesive excluding organic solvents is in the range of 10 to 60 parts by weight. If it is less than 10 parts by weight, the adhesive strength with deposited copper tends to decrease, and if it is more than 60 parts by weight, heat resistance will deteriorate.
【0016】アルキルフェノ−ル樹脂としては、P−フ
ェノ−ル、P−フェニルフェノ−ル、P−キュミルフェ
ノ−ル、またはアルキルフェノ−ル、ブチルフェノ−ル
、Sec−ブチルフェノ−ルまたはオクチルフェノ−ル
などのP−置換アルキルフェノ−ルを用いる。Examples of the alkylphenol resin include P-phenol, P-phenylphenol, P-cumylphenol, or alkylphenol, butylphenol, Sec-butylphenol, or octylphenol. A P-substituted alkylphenol such as P-substituted alkylphenol is used.
【0017】また、その配合量は、有機溶剤を除く固形
分のうち、2〜20重量部の範囲である。2重量部未満
では、アクリロニトリルブタジエンゴムとの架橋が不十
分で耐熱性が低下し、20重量部以上では、析出しため
っき銅との接着力が低下する。[0017] The blending amount thereof is in the range of 2 to 20 parts by weight based on the solid content excluding the organic solvent. If it is less than 2 parts by weight, the crosslinking with the acrylonitrile butadiene rubber will be insufficient, resulting in a decrease in heat resistance, and if it is more than 20 parts by weight, the adhesive strength with the precipitated plated copper will decrease.
【0018】エポキシ樹脂としては特に制限がなく、ビ
スフェノ−ルA型エポキシ樹脂、ノボラック型エポキシ
樹脂、脂環式エポキシ樹脂などを用いることができる。The epoxy resin is not particularly limited, and bisphenol A type epoxy resins, novolac type epoxy resins, alicyclic epoxy resins, etc. can be used.
【0019】また、その配合量は、有機溶剤を除く固形
分のうち、20〜70重量部の範囲である。20重量部
未満では耐熱性及び耐電食性が低下し、70重量部以上
では析出しためっき銅との接着力が低下する。[0019] The blending amount thereof is in the range of 20 to 70 parts by weight based on the solid content excluding the organic solvent. If it is less than 20 parts by weight, the heat resistance and electrolytic corrosion resistance will decrease, and if it is more than 70 parts by weight, the adhesive force with the deposited plated copper will decrease.
【0020】メタクリル酸グリシジルとエポキシ樹脂と
を同時に架橋するカチオン反応光開始剤としては、トリ
フェニルスルホニウム塩のカチオン性化合物を用いるこ
とができる。As the cationic photoinitiator for simultaneously crosslinking glycidyl methacrylate and the epoxy resin, a cationic compound such as a triphenylsulfonium salt can be used.
【0021】トリフェニルスルホニウム塩のカチオン性
化合物としては、トリフェニルスルフォンヘキサフルオ
ロアンチモネート、トリフェニルスルフォンヘキサフル
オロフォスフェートが使用できる。As the cationic compound of the triphenylsulfonium salt, triphenylsulfone hexafluoroantimonate and triphenylsulfone hexafluorophosphate can be used.
【0022】また、その配合量は、有機溶剤を除く固形
分のうち、0.1〜5重量部の範囲である。0.1重量
部未満では、紫外線照射時におけるメタクリル酸グリシ
ジル及びエポキシ樹脂の反応が不十分であり、5重量部
以上では紫外線硬化反応に寄与しない光開始剤が残存す
るので、不必要である。[0022] The blending amount thereof is in the range of 0.1 to 5 parts by weight based on the solid content excluding the organic solvent. If it is less than 0.1 parts by weight, the reaction between glycidyl methacrylate and the epoxy resin upon irradiation with ultraviolet light will be insufficient, and if it is more than 5 parts by weight, there will remain a photoinitiator that does not contribute to the ultraviolet curing reaction, so it is unnecessary.
【0023】本発明において、接着剤中に無電解めっき
の該となるめっき触媒を含有することができる。In the present invention, the adhesive may contain a plating catalyst for electroless plating.
【0024】めっき触媒としては、元素周期率表8族及
び2B族の元素を金属塩化物の化合物として、無機質ま
たは有機質に吸着させた後、金属に還元しためっき触媒
を使用することができる。[0024] As the plating catalyst, it is possible to use a plating catalyst in which elements of Groups 8 and 2B of the Periodic Table of the Elements are adsorbed on an inorganic or organic substance as a metal chloride compound, and then reduced to a metal.
【0025】接着剤中に含有するめっき触媒の配合量は
、1〜15重量部の範囲が好ましい。1重量部未満でめ
っき析出性が低下し、15重量部以上では絶縁抵抗が低
くなる。The amount of the plating catalyst contained in the adhesive is preferably in the range of 1 to 15 parts by weight. If it is less than 1 part by weight, the plating precipitation properties will be reduced, and if it is more than 15 parts by weight, the insulation resistance will be reduced.
【0026】また、本発明の接着剤において、無機充填
剤を適宜配合することができる。無機充填剤は、化学粗
化工程で凹凸を作り易く、接着性を向上させるものであ
り、例えば、微粉末シリカ、水酸化アルミニウム、ケイ
酸ジルコニウム、シリカ、炭酸カルシウム、タルク等が
使用できる。[0026] Further, in the adhesive of the present invention, an inorganic filler may be appropriately blended. The inorganic filler is one that easily creates irregularities in the chemical roughening process and improves adhesiveness. For example, finely powdered silica, aluminum hydroxide, zirconium silicate, silica, calcium carbonate, talc, etc. can be used.
【0027】上記接着剤の各成分は、有機溶剤中で混練
、混合し、溶液状混合物とする。このときに用いる有機
溶媒としては、トルエン、メチルエチルケトン、キシレ
ン、ジエチレングリコールモノメチルエーテル、ジエチ
レングリコールモノエチルエーテル、ジエチレングリコ
ールモノエチルエーテルアセテート、または酢酸エチル
の1種以上を用いることができる。Each component of the above adhesive is kneaded and mixed in an organic solvent to form a solution mixture. As the organic solvent used at this time, one or more of toluene, methyl ethyl ketone, xylene, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monoethyl ether acetate, or ethyl acetate can be used.
【0028】本発明に係る接着剤を使用する絶縁基板と
しては、特に限定するものではなく、フェノ−ル樹脂系
、またはエポキシ樹脂系樹脂積層板、あるいは無機系ま
たは有機複合物からなる基材等が用いられる。The insulating substrate on which the adhesive according to the present invention is used is not particularly limited, and may include phenolic resin-based or epoxy resin-based resin laminates, substrates made of inorganic or organic composites, etc. is used.
【0029】前記接着剤を絶縁基材に塗布する方法とし
ては、ロールコート法、カーテンコート法、ディッピン
グ法、あるいはドライフィルム状の接着剤と絶縁基材と
をラミネートする方法を用いることができる。接着剤の
塗膜厚みは、10〜50μm程度となるようにする。[0029] As a method of applying the adhesive to the insulating base material, a roll coating method, a curtain coating method, a dipping method, or a method of laminating a dry film adhesive and the insulating base material can be used. The thickness of the adhesive coating is approximately 10 to 50 μm.
【0030】接着剤を絶縁基材に塗布した後、接着剤を
紫外線照射により硬化する。この際の紫外線照射量は、
0.3〜5J/cm2 の範囲である。0.3J/cm
2 未満では接着剤の硬化が完全ではなく、5J/cm
2 以上では、接着剤の塗膜が黄褐色に変色し好ましく
ない。
これらの紫外線照射量は、ランプのワット数またはコン
ベア速度あるいはランプの照射距離で調整する。After applying the adhesive to the insulating substrate, the adhesive is cured by ultraviolet irradiation. The amount of UV irradiation at this time is
It is in the range of 0.3 to 5 J/cm2. 0.3J/cm
If it is less than 2, the adhesive will not be completely cured and the
2 or more, the adhesive coating changes color to yellowish brown, which is not preferable. The amount of UV irradiation is adjusted by the lamp wattage, conveyor speed, or lamp irradiation distance.
【0031】無電解めっきを析出させるに際しては、接
着剤表面を化学的に粗化して、接着に適した形状にする
。[0031] When depositing electroless plating, the surface of the adhesive is chemically roughened to give it a shape suitable for adhesion.
【0032】化学的粗化に用いる処理液は、クロム酸ー
硫酸、クロム酸ー硫酸ーフッ化ナトリウム、ホウフッ化
水素酸ー重クロム酸などが使用できる。無電解めっき浴
としては、一般の銅をめっき膜として形成できるものが
使用される。As the treatment liquid used for chemical roughening, chromic acid-sulfuric acid, chromic acid-sulfuric acid-sodium fluoride, hydrofluoroboric acid-dichromic acid, etc. can be used. As the electroless plating bath, one that can form a general copper plating film is used.
【0033】配線板の電子部品搭載穴や導通のための穴
あけは、パンチプレスあるいはNCドリルマシンを使用
して行われる。[0033] Holes for mounting electronic components and holes for conduction in the wiring board are made using a punch press or an NC drill machine.
【0034】パターン形成は、めっきレジストをスクリ
ーン印刷あるいはフォトマスクを紫外線硬化し、現像し
て形成する。The pattern is formed by screen printing a plating resist or by curing a photomask with ultraviolet rays and developing it.
【0035】これらめっきレジストの形成は、化学的粗
化処理工程の前あるいは処理した後で行われる。These plating resists are formed before or after the chemical roughening process.
【0036】[0036]
【作用】通常のアディティブ配線板用接着剤は、析出銅
めっきとの接着性に優れたアクリロニトリルブタジエン
ゴムを主成分として用いられる。[Operation] Ordinary adhesives for additive wiring boards use acrylonitrile butadiene rubber as a main component, which has excellent adhesion to deposited copper plating.
【0037】このアクリロニトリルブタジエンゴムは、
紫外線照射によって硬化できる反応基を有していないた
めに、通常はフェノ−ル樹脂を配合して架橋する方式が
用いられていた。[0037] This acrylonitrile butadiene rubber is
Since it does not have a reactive group that can be cured by ultraviolet irradiation, a method of crosslinking by blending a phenol resin has usually been used.
【0038】このため、接着剤を硬化するには、160
℃以上の熱で1時間以上を必要としており、製造コスト
あるいは基板の機械的特性上にも好ましくなかった。Therefore, in order to cure the adhesive, 160
This requires more than one hour at a temperature of .degree. C. or higher, which is not desirable in terms of manufacturing cost or mechanical properties of the substrate.
【0039】また、通常のアクリロニトリルブタジエン
ゴムは、その製造過程で混入するイオン性の不純物が多
量に混存するため、耐電食性の点でも好ましくなかった
。Furthermore, ordinary acrylonitrile butadiene rubber is unfavorable in terms of electrical corrosion resistance because it contains a large amount of ionic impurities that are mixed in during the manufacturing process.
【0040】本発明はアクリロニトリルブタジエンゴム
に、メタクリル酸グリシジルを付与し、さらに、イオン
性の不純物を低減させると同時にエポキシ樹脂、フェノ
−ル樹脂、光開始剤を配合する構成とした。In the present invention, glycidyl methacrylate is added to acrylonitrile butadiene rubber, and at the same time, ionic impurities are reduced, and at the same time, an epoxy resin, a phenol resin, and a photoinitiator are blended.
【0041】その結果、紫外線によって低温、短時間で
接着剤が硬化すると同時に耐電食性に優れたアディティ
ブ法プリント配線板用接着剤を提供することができる。[0041] As a result, it is possible to provide an adhesive for additive printed wiring boards which is cured by ultraviolet rays at low temperatures and in a short time, and at the same time has excellent electrolytic corrosion resistance.
【0042】[0042]
【実施例】以下、本発明を実施例に基づいて詳細に説明
するが、本発明はこれに限定されるものではない。EXAMPLES The present invention will be explained in detail below based on Examples, but the present invention is not limited thereto.
【0043】実施例1
〔組成〕
メタクリル酸グリシジル含有高純度アクリロニトリ
ルブタジエンゴム (メタクリル酸グリシジル含
有量6重量%、 イオン性不純物総量12p
pm、日本ゼオン社製)・・・・・30重量部 アル
キルフェノ−ル樹脂ヒタノール2400 (
日立化成工業(株)製商品名)・・・・・・・・・・・
・・10重量部 エポキシ樹脂UVR−6400
(ユニオンカーバイト社製商品名)・・・
・・・・・・・・・45重量部 光開始剤UVI−6
970
(トリフェニルスルフォンヘキサフルオロ
アンチモネート、 ユニオンカーバイト
社製商品名)・・・・・・・・・・・・・1重量部
めっき触媒Cat#11
(日立化成工業(株)製商品名)・・・・
・・・・・・・・・・4重量部 充填剤ミクロパック
ス20A
(白水化学社製商品名)・・・・・・
・・・・・・・・・・10重量部これらの材料を、ライ
カイ機及び攪拌機を使用してMEK溶媒に溶解させて、
固形分30重量%の接着剤溶液を作製した。この接着剤
溶液を離型処理が施されたPETフィルム上にロールコ
ータで塗布、乾燥し、接着剤の膜厚を約30μmにした
。Example 1 [Composition] High purity acrylonitrile butadiene rubber containing glycidyl methacrylate (glycidyl methacrylate content 6% by weight, total amount of ionic impurities 12p)
pm, Nippon Zeon Co., Ltd.)...30 parts by weight Alkylphenol resin Hytanol 2400 (
Hitachi Chemical Co., Ltd. product name)
...10 parts by weight Epoxy resin UVR-6400 (trade name manufactured by Union Carbide)...
・・・・・・・・・45 parts by weight Photoinitiator UVI-6
970 (Triphenylsulfone hexafluoroantimonate, trade name manufactured by Union Carbide) 1 part by weight
Plating catalyst Cat#11 (product name manufactured by Hitachi Chemical Co., Ltd.)...
......4 parts by weight Filler Micropax 20A (product name manufactured by Hakusui Chemical Co., Ltd.)...
......10 parts by weight of these materials were dissolved in MEK solvent using a laikai machine and a stirrer,
An adhesive solution having a solid content of 30% by weight was prepared. This adhesive solution was applied onto a release-treated PET film using a roll coater and dried to give an adhesive film thickness of about 30 μm.
【0044】この接着剤付フィルムをガラスエポキシ樹
脂積層板(日立化成工業(株)製商品名 LE−16
8)の両面に加熱加圧ラミネートを行った。[0044] This adhesive-coated film was used as a glass epoxy resin laminate (manufactured by Hitachi Chemical Co., Ltd., trade name LE-16).
Heat and pressure lamination was performed on both sides of 8).
【0045】次いで、紫外線1J/cm2 を照射して
、接着剤付絶縁基板を得た。この基板に、めっき用フォ
トレジストSR−3000(日立化成工業(株)製商品
名)をラミネートし、紫外線照射及び溶剤現像して、ラ
イン/スペース0.2mm/0.2mmの耐電食性評価
用クシ型パターンとピール強度及びはんだ耐熱性測定用
の10mmライン巾と25mm角からなる試験パターン
を作製した。[0045] Next, ultraviolet rays were irradiated at 1 J/cm2 to obtain an adhesive-coated insulating substrate. A plating photoresist SR-3000 (trade name, manufactured by Hitachi Chemical Co., Ltd.) was laminated onto this substrate, and a comb for evaluating electrolytic corrosion resistance with line/space of 0.2 mm/0.2 mm was formed by UV irradiation and solvent development. A mold pattern and a test pattern consisting of a 10 mm line width and a 25 mm square for measuring peel strength and soldering heat resistance were prepared.
【0046】次いで、クロム酸液(CrO3 55g、
濃硫酸220mlを水で希釈して全体を1lとしたもの
)に40℃で15分間浸漬して、パターン部の接着剤面
を選択的に化学粗化し、水洗及び中和した。Next, chromic acid solution (55 g of CrO3,
The adhesive surface of the patterned portion was selectively roughened by immersing it in 220 ml of concentrated sulfuric acid diluted with water to make a total volume of 1 liter at 40° C. for 15 minutes, followed by washing with water and neutralization.
【0047】次に、無電解銅めっき液(日立化成工業(
株)製、商品名 CC−41)に投入して銅めっきを
35μm析出させた後、160℃−60分アニーリング
を行い、アディティブ法プリント配線板の試験パターン
を得た。Next, electroless copper plating solution (Hitachi Chemical Co., Ltd.
Co., Ltd. (trade name: CC-41) to deposit 35 μm of copper plating, and then annealing was performed at 160° C. for 60 minutes to obtain a test pattern for an additive printed wiring board.
【0048】耐電食性の試験は、85℃−85%RHの
加温加湿中下で回路間にDC100Vを連続印加し、所
定時間毎の絶縁抵抗を調べた。なお、上記試験環境下で
直接回路間に水滴が付着するのを防止するため、試験前
に予めはんだレジストを全面に印刷して成膜保護した。[0048] In the electrolytic corrosion resistance test, DC 100V was continuously applied between the circuits under heating and humidification at 85°C and 85% RH, and the insulation resistance was examined at predetermined intervals. In addition, in order to prevent water droplets from directly adhering between the circuits under the above test environment, a solder resist was printed on the entire surface in advance to protect the film formation before the test.
【0049】ピール強度とはんだ耐熱性は、JIS−C
−6481に準じた。表1にこれらの試験結果を示す。Peel strength and soldering heat resistance are determined according to JIS-C
-6481. Table 1 shows the results of these tests.
【0050】実施例2
〔組成〕
メタクリル酸グリシジル含有高純度アクリロニトリ
ルブタジエンゴム (メタクリル酸グリシジ
ル含有量8重量%、 イオン性不純物総
量10ppm、日本ゼオン社製)・・・・40重量部
アルキルフェノ−ル樹脂ヒタノール2400
(日立化成工業(株)製商品名)・・・・・・・・
・・・・・・5重量部 エポキシ樹脂UVR−640
0(ユニオンカーバイト社製商品名)・1重量部 光
開始剤UVI−6970
(トリフェニルスルフォンヘキサフルオロ
アンチモネート、 ユニオンカーバイト
社製商品名)・・・・・・・・・・・・・1重量部
めっき触媒Cat#11(日立化成工業(株)製商品名
)・・・・・4重量部 充填剤ハイジライトH−42
M(昭和電工社製商品名)・・・・・10重量部これら
からなる組成物を実施例1に述べたと同様に接着剤溶液
を作製し、アディティブ法プリント配線板の試験パター
ンを得た。試験結果を表1に示す。Example 2 [Composition] High purity acrylonitrile butadiene rubber containing glycidyl methacrylate (glycidyl methacrylate content: 8% by weight, total amount of ionic impurities: 10 ppm, manufactured by Nippon Zeon Co., Ltd.)...40 parts by weight
Alkylphenol resin Hytanol 2400
(Product name manufactured by Hitachi Chemical Co., Ltd.)
...5 parts by weight Epoxy resin UVR-640
0 (trade name manufactured by Union Carbide Company)・1 part by weight Photoinitiator UVI-6970 (triphenylsulfone hexafluoroantimonate, trade name manufactured by Union Carbide Company)・・・・・・・・・・・・・・・1 part by weight
Plating catalyst Cat #11 (trade name manufactured by Hitachi Chemical Co., Ltd.)...4 parts by weight Filler Hygilite H-42
M (trade name manufactured by Showa Denko K.K.): 10 parts by weight An adhesive solution was prepared from a composition consisting of these in the same manner as described in Example 1, and a test pattern for an additive printed wiring board was obtained. The test results are shown in Table 1.
【0051】実施例3
〔組成〕
メタクリル酸グリシジル含有高純度アクリロニトリ
ルブタジエンゴム (メタクリル酸グリシジ
ル含有量6重量%、 イオン性不純物総
量12ppm、日本ゼオン社製)・・・・40重量部
アルキルフェノ−ル樹脂ヒタノール2400
(日立化成工業(株)製商品名)・・・・・・・・
・・・・・5重量部 エポキシ樹脂DEN−438(
ダウンケミカル社製商品名)・・30重量部 光開始
剤UVI−6950
(トリフェニルスルフォンヘキサフルオロ
フォフェート、 ユニオンカーバイト社
製商品名)・・・・・・・・・・・・1重量部 めっ
き触媒Cat#11(日立化成工業(株)製商品名)・
・・・4重量部 充填剤ミクロパックス20A(白水
化学社製商品名)・・・・・15重量部これらからなる
組成物を実施例1に述べたと同様に接着剤の溶液を作製
し、アディティブ法プリント配線板の試験パターンを得
た。試験結果を表1に示す。Example 3 [Composition] High purity acrylonitrile butadiene rubber containing glycidyl methacrylate (glycidyl methacrylate content 6% by weight, total ionic impurities 12 ppm, manufactured by Nippon Zeon Co., Ltd.)...40 parts by weight
Alkylphenol resin Hytanol 2400
(Product name manufactured by Hitachi Chemical Co., Ltd.)
...5 parts by weight Epoxy resin DEN-438 (
Down Chemical Co., Ltd. (trade name): 30 parts by weight Photoinitiator UVI-6950 (triphenylsulfone hexafluorophore, Union Carbide Co., Ltd. trade name): 1 part by weight Plating catalyst Cat #11 (trade name manufactured by Hitachi Chemical Co., Ltd.)・
...4 parts by weight Filler Micropax 20A (trade name manufactured by Hakusui Kagaku Co., Ltd.) ...15 parts by weight An adhesive solution was prepared from a composition consisting of these in the same manner as described in Example 1, and additive A test pattern of printed wiring board was obtained. The test results are shown in Table 1.
【0052】比較例1
〔組成〕
非メタクリル酸グリシジルアクリロニトリルブタジ
エンゴムニポール1042 (イオン性不純
物総量150ppm、 日本ゼオン社製
、商品名)・・・・・・・・・・・・・・・40重量部
アルキルフェノ−ル樹脂ヒタノール2400
(日立化成工業(株)製商品名)・・・・・・・
・・・・・・20重量部 エポキシ樹脂エピコート1
001(油化シェル社製商品名)・・・20重量部
エポキシ硬化剤イミダゾール2EMz(四国化成社製商
品名)・0.1重量部 めっき触媒Cat#11(日
立化成工業(株)製商品名)・・・・・5重量部 充
填剤ミクロパックス20A(白水化学社製商品名)・・
・・・・15重量部これらからなる組成物を実施例1と
同様な方法で、絶縁基材にラミネートした。次いで、1
70℃、1時間接着剤を硬化させて、接着剤付絶縁基板
を作製した。この接着剤付絶縁基板を用いて、実施例1
と同様にして試験パターンを得た。試験結果を表1に示
す。Comparative Example 1 [Composition] Non-methacrylic acid glycidyl acrylonitrile butadiene rubber Nipol 1042 (total ionic impurities 150 ppm, manufactured by Nippon Zeon Co., Ltd., trade name) 40 weight Part Alkylphenol resin Hytanol 2400
(Product name manufactured by Hitachi Chemical Co., Ltd.)
...20 parts by weight Epoxy resin Epicoat 1
001 (trade name manufactured by Yuka Shell Co., Ltd.)...20 parts by weight
Epoxy curing agent Imidazole 2EMz (trade name manufactured by Shikoku Kasei Co., Ltd.) - 0.1 part by weight Plating catalyst Cat #11 (trade name manufactured by Hitachi Chemical Co., Ltd.) - 5 parts by weight Filler Micropax 20A (white water Chemical company product name)...
...15 parts by weight of the composition was laminated onto an insulating base material in the same manner as in Example 1. Then 1
The adhesive was cured at 70° C. for 1 hour to produce an adhesive-attached insulating substrate. Example 1 Using this insulating substrate with adhesive
A test pattern was obtained in the same manner. The test results are shown in Table 1.
【0053】[0053]
【表1】[Table 1]
【0054】[0054]
【発明の効果】以上説明したように、本発明による接着
剤組成によれば、紫外線照射によって低温、短時間で硬
化可能で、かつ耐電食性に優れたアディティブ法プリン
ト配線板用接着剤を提供することができる。[Effects of the Invention] As explained above, the adhesive composition of the present invention provides an adhesive for additive printed wiring boards that can be cured at low temperatures and in a short time by ultraviolet irradiation, and has excellent electrical corrosion resistance. be able to.
Claims (3)
よって形成するアディティブ法プリント配線板において
、以下の成分からなる接着剤を用いる。 A.分子内にメタクリル酸グリシジルを有し、かつ金属
イオン性不純物含有量が50ppm以下である高純度ア
クリロニトリルブタジエンゴム B.アルキルフェノ−ル樹脂 C.エポキシ樹脂 D.高純度アクリロニトリルブタジエンゴム中のメタク
リル酸グリシジルとエポキシ樹脂とを同時に架橋するカ
チオン反応型光開始剤1. In an additive printed wiring board in which a necessary circuit pattern is formed by electroless plating, an adhesive consisting of the following components is used. A. High purity acrylonitrile butadiene rubber having glycidyl methacrylate in the molecule and having a metal ionic impurity content of 50 ppm or less B. Alkylphenol resin C. Epoxy resin D. Cation-reactive photoinitiator that simultaneously crosslinks glycidyl methacrylate and epoxy resin in high-purity acrylonitrile butadiene rubber
リル酸グリシジルを有する高純度アクリロニトリルブタ
ジエンゴムが10〜60重量部、アルキルフェノ−ル樹
脂が2〜20重量部、エポキシ樹脂が20〜70重量部
、高純度アクリロニトリルブタジエンゴム中のメタクリ
ル酸グリシジルとエポキシ樹脂とを同時に架橋するカチ
オン反応型光開始剤が0.1〜5重量部の範囲である請
求項1記載のアディティブ法プリント配線板用接着剤。2. Of the solid content excluding organic solvents, 10 to 60 parts by weight of high purity acrylonitrile butadiene rubber containing glycidyl methacrylate, 2 to 20 parts by weight of alkylphenol resin, and 20 to 70 parts by weight of epoxy resin. 2. The additive method printed wiring board adhesive according to claim 1, wherein the cationic reactive photoinitiator that simultaneously crosslinks glycidyl methacrylate and the epoxy resin in the high purity acrylonitrile butadiene rubber is in the range of 0.1 to 5 parts by weight. agent.
脂を同時に架橋するカチオン反応型光開始剤として、ト
リフェニルスルホニウム塩のカチオン性化合物を使用し
た、特許請求項1記載のアディティブ法プリント配線板
用接着剤。3. The additive method printed wiring board adhesive according to claim 1, wherein a cationic compound of triphenylsulfonium salt is used as a cation-reactive photoinitiator for simultaneously crosslinking glycidyl methacrylate and an epoxy resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7994491A JPH04314391A (en) | 1991-04-12 | 1991-04-12 | Adhesive for fabricating printed circuit board by additive process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7994491A JPH04314391A (en) | 1991-04-12 | 1991-04-12 | Adhesive for fabricating printed circuit board by additive process |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04314391A true JPH04314391A (en) | 1992-11-05 |
Family
ID=13704422
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7994491A Pending JPH04314391A (en) | 1991-04-12 | 1991-04-12 | Adhesive for fabricating printed circuit board by additive process |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04314391A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000078887A1 (en) * | 1999-06-18 | 2000-12-28 | Hitachi Chemical Company, Ltd. | Adhesive, adhesive member, circuit substrate for semiconductor mounting having adhesive member, and semiconductor device containing the same |
JP2007162019A (en) * | 1993-07-29 | 2007-06-28 | Hitachi Chem Co Ltd | Circuit connecting material and method for connecting circuit using the same |
JP2012140589A (en) * | 2010-12-29 | 2012-07-26 | Cheil Industries Inc | Anisotropic conductive film, anisotropic conductive film composition included in the same, and device using the same |
WO2012173038A1 (en) * | 2011-06-14 | 2012-12-20 | 日東電工株式会社 | Removable adhesive tape and manufacturing method thereof |
US20140114025A1 (en) * | 2010-12-29 | 2014-04-24 | Lanxess Deutschland Gmbh | Vulcanizable compositions based on nitrile rubbers containing epoxy groups |
-
1991
- 1991-04-12 JP JP7994491A patent/JPH04314391A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007162019A (en) * | 1993-07-29 | 2007-06-28 | Hitachi Chem Co Ltd | Circuit connecting material and method for connecting circuit using the same |
JP4539644B2 (en) * | 1993-07-29 | 2010-09-08 | 日立化成工業株式会社 | Circuit connection material and circuit connection method using the connection material |
WO2000078887A1 (en) * | 1999-06-18 | 2000-12-28 | Hitachi Chemical Company, Ltd. | Adhesive, adhesive member, circuit substrate for semiconductor mounting having adhesive member, and semiconductor device containing the same |
US6838170B2 (en) | 1999-06-18 | 2005-01-04 | Hitachi Chemical Company, Ltd. | Adhesive, adhesive member, interconnecting substrate for semiconductor mounting having adhesive member, and semiconductor device containing the same |
JP2012140589A (en) * | 2010-12-29 | 2012-07-26 | Cheil Industries Inc | Anisotropic conductive film, anisotropic conductive film composition included in the same, and device using the same |
US20140114025A1 (en) * | 2010-12-29 | 2014-04-24 | Lanxess Deutschland Gmbh | Vulcanizable compositions based on nitrile rubbers containing epoxy groups |
JP2016189334A (en) * | 2010-12-29 | 2016-11-04 | チェイル インダストリーズ インコーポレイテッド | Anisotropic conductive film, anisotropic conductive film composition contained in the same, and apparatus including the same |
US9650452B2 (en) * | 2010-12-29 | 2017-05-16 | Arlanxeo Deutschland Gmbh | Vulcanizable compositions based on nitrile rubbers containing epoxy groups |
WO2012173038A1 (en) * | 2011-06-14 | 2012-12-20 | 日東電工株式会社 | Removable adhesive tape and manufacturing method thereof |
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