JPS60225428A - パタ−ン位置検出装置 - Google Patents

パタ−ン位置検出装置

Info

Publication number
JPS60225428A
JPS60225428A JP59082453A JP8245384A JPS60225428A JP S60225428 A JPS60225428 A JP S60225428A JP 59082453 A JP59082453 A JP 59082453A JP 8245384 A JP8245384 A JP 8245384A JP S60225428 A JPS60225428 A JP S60225428A
Authority
JP
Japan
Prior art keywords
pattern
combination
signal
mark
waveform
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59082453A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0552660B2 (enrdf_load_stackoverflow
Inventor
Hidemi Kawai
秀実 川井
Masakazu Murakami
雅一 村上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP59082453A priority Critical patent/JPS60225428A/ja
Publication of JPS60225428A publication Critical patent/JPS60225428A/ja
Priority to US07/218,503 priority patent/US4860374A/en
Publication of JPH0552660B2 publication Critical patent/JPH0552660B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59082453A 1984-04-19 1984-04-24 パタ−ン位置検出装置 Granted JPS60225428A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59082453A JPS60225428A (ja) 1984-04-24 1984-04-24 パタ−ン位置検出装置
US07/218,503 US4860374A (en) 1984-04-19 1988-07-06 Apparatus for detecting position of reference pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59082453A JPS60225428A (ja) 1984-04-24 1984-04-24 パタ−ン位置検出装置

Publications (2)

Publication Number Publication Date
JPS60225428A true JPS60225428A (ja) 1985-11-09
JPH0552660B2 JPH0552660B2 (enrdf_load_stackoverflow) 1993-08-06

Family

ID=13774935

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59082453A Granted JPS60225428A (ja) 1984-04-19 1984-04-24 パタ−ン位置検出装置

Country Status (1)

Country Link
JP (1) JPS60225428A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0552660B2 (enrdf_load_stackoverflow) 1993-08-06

Similar Documents

Publication Publication Date Title
US4860374A (en) Apparatus for detecting position of reference pattern
US4870452A (en) Projection exposure apparatus
US4679942A (en) Method of aligning a semiconductor substrate and a photomask
JPH09504142A (ja) 基板上にマスクパターンを繰り返し写像する方法
JPH0580497A (ja) 面状態検査装置
US4669867A (en) Alignment and exposure apparatus
JPH0785466B2 (ja) 位置合せ装置
JPH05264221A (ja) 半導体露光装置用マーク位置検出装置及びこれを用いた半導体露光装置用位置合わせ装置
US4614432A (en) Pattern detector
US4655599A (en) Mask aligner having a photo-mask setting device
JPH0927445A (ja) ショットマップ作成方法
JP3230094B2 (ja) 投影光学系の光学特性測定方法、光学特性測定装置、露光方法及びマスク
JPS60225428A (ja) パタ−ン位置検出装置
JPH0525167B2 (enrdf_load_stackoverflow)
JPH06252030A (ja) 位置検出装置及びそれを用いた半導体素子の製造方法
JPH04273246A (ja) 位置検出装置、露光装置および露光方法
JPH0344242B2 (enrdf_load_stackoverflow)
JPH07234527A (ja) 露光方法
JPH0648676B2 (ja) アライメント装置
JPS61230114A (ja) アライメント光学装置
JPH0756183A (ja) 位置合わせ方法
JP4214555B2 (ja) パターン位置計測装置
JPH0570925B2 (enrdf_load_stackoverflow)
JPS60168112A (ja) 投影装置の焦点合せ装置
JPS6211779B2 (enrdf_load_stackoverflow)

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term