JPH0552660B2 - - Google Patents

Info

Publication number
JPH0552660B2
JPH0552660B2 JP59082453A JP8245384A JPH0552660B2 JP H0552660 B2 JPH0552660 B2 JP H0552660B2 JP 59082453 A JP59082453 A JP 59082453A JP 8245384 A JP8245384 A JP 8245384A JP H0552660 B2 JPH0552660 B2 JP H0552660B2
Authority
JP
Japan
Prior art keywords
pattern
waveform
mark
combination
image signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59082453A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60225428A (ja
Inventor
Hidemi Kawai
Masakazu Murakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP59082453A priority Critical patent/JPS60225428A/ja
Publication of JPS60225428A publication Critical patent/JPS60225428A/ja
Priority to US07/218,503 priority patent/US4860374A/en
Publication of JPH0552660B2 publication Critical patent/JPH0552660B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP59082453A 1984-04-19 1984-04-24 パタ−ン位置検出装置 Granted JPS60225428A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59082453A JPS60225428A (ja) 1984-04-24 1984-04-24 パタ−ン位置検出装置
US07/218,503 US4860374A (en) 1984-04-19 1988-07-06 Apparatus for detecting position of reference pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59082453A JPS60225428A (ja) 1984-04-24 1984-04-24 パタ−ン位置検出装置

Publications (2)

Publication Number Publication Date
JPS60225428A JPS60225428A (ja) 1985-11-09
JPH0552660B2 true JPH0552660B2 (enrdf_load_stackoverflow) 1993-08-06

Family

ID=13774935

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59082453A Granted JPS60225428A (ja) 1984-04-19 1984-04-24 パタ−ン位置検出装置

Country Status (1)

Country Link
JP (1) JPS60225428A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS60225428A (ja) 1985-11-09

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term