JPS60225426A - プラズマｘ線露光装置 - Google Patents

プラズマｘ線露光装置

Info

Publication number
JPS60225426A
JPS60225426A JP59080127A JP8012784A JPS60225426A JP S60225426 A JPS60225426 A JP S60225426A JP 59080127 A JP59080127 A JP 59080127A JP 8012784 A JP8012784 A JP 8012784A JP S60225426 A JPS60225426 A JP S60225426A
Authority
JP
Japan
Prior art keywords
plasma
chamber
ray
discharge space
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59080127A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0520891B2 (enExample
Inventor
Yasuo Kato
加藤　靖夫
Yoshio Watanabe
渡辺　良男
Seiichi Murayama
村山　精一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59080127A priority Critical patent/JPS60225426A/ja
Publication of JPS60225426A publication Critical patent/JPS60225426A/ja
Publication of JPH0520891B2 publication Critical patent/JPH0520891B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59080127A 1984-04-23 1984-04-23 プラズマｘ線露光装置 Granted JPS60225426A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59080127A JPS60225426A (ja) 1984-04-23 1984-04-23 プラズマｘ線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59080127A JPS60225426A (ja) 1984-04-23 1984-04-23 プラズマｘ線露光装置

Publications (2)

Publication Number Publication Date
JPS60225426A true JPS60225426A (ja) 1985-11-09
JPH0520891B2 JPH0520891B2 (enExample) 1993-03-22

Family

ID=13709548

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59080127A Granted JPS60225426A (ja) 1984-04-23 1984-04-23 プラズマｘ線露光装置

Country Status (1)

Country Link
JP (1) JPS60225426A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3029151U (ja) * 1996-03-19 1996-09-27 拓也 坂本 ワンタッチ式テープ脱着保持器具

Also Published As

Publication number Publication date
JPH0520891B2 (enExample) 1993-03-22

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