JPS60218474A - 成膜方法 - Google Patents

成膜方法

Info

Publication number
JPS60218474A
JPS60218474A JP7295784A JP7295784A JPS60218474A JP S60218474 A JPS60218474 A JP S60218474A JP 7295784 A JP7295784 A JP 7295784A JP 7295784 A JP7295784 A JP 7295784A JP S60218474 A JPS60218474 A JP S60218474A
Authority
JP
Japan
Prior art keywords
plasma
plasma generation
gas
chamber
generation chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7295784A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6214225B2 (enrdf_load_stackoverflow
Inventor
Shinji Sugioka
晋次 杉岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP7295784A priority Critical patent/JPS60218474A/ja
Publication of JPS60218474A publication Critical patent/JPS60218474A/ja
Publication of JPS6214225B2 publication Critical patent/JPS6214225B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
JP7295784A 1984-04-13 1984-04-13 成膜方法 Granted JPS60218474A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7295784A JPS60218474A (ja) 1984-04-13 1984-04-13 成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7295784A JPS60218474A (ja) 1984-04-13 1984-04-13 成膜方法

Publications (2)

Publication Number Publication Date
JPS60218474A true JPS60218474A (ja) 1985-11-01
JPS6214225B2 JPS6214225B2 (enrdf_load_stackoverflow) 1987-04-01

Family

ID=13504367

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7295784A Granted JPS60218474A (ja) 1984-04-13 1984-04-13 成膜方法

Country Status (1)

Country Link
JP (1) JPS60218474A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6267179A (ja) * 1985-09-19 1987-03-26 Matsushita Electric Ind Co Ltd プラズマ装置
JPS6267178A (ja) * 1985-09-19 1987-03-26 Matsushita Electric Ind Co Ltd プラズマ装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60202928A (ja) * 1984-03-28 1985-10-14 Toshiba Corp 光励起反応装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60202928A (ja) * 1984-03-28 1985-10-14 Toshiba Corp 光励起反応装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6267179A (ja) * 1985-09-19 1987-03-26 Matsushita Electric Ind Co Ltd プラズマ装置
JPS6267178A (ja) * 1985-09-19 1987-03-26 Matsushita Electric Ind Co Ltd プラズマ装置

Also Published As

Publication number Publication date
JPS6214225B2 (enrdf_load_stackoverflow) 1987-04-01

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