JPS60211956A - Probing machine - Google Patents

Probing machine

Info

Publication number
JPS60211956A
JPS60211956A JP6890784A JP6890784A JPS60211956A JP S60211956 A JPS60211956 A JP S60211956A JP 6890784 A JP6890784 A JP 6890784A JP 6890784 A JP6890784 A JP 6890784A JP S60211956 A JPS60211956 A JP S60211956A
Authority
JP
Japan
Prior art keywords
marking
wafers
elements
defective
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6890784A
Other languages
Japanese (ja)
Other versions
JPH0669053B2 (en
Inventor
Kanetoshi Nagata
永田 兼俊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Seimitsu Co Ltd
Original Assignee
Tokyo Seimitsu Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Seimitsu Co Ltd filed Critical Tokyo Seimitsu Co Ltd
Priority to JP59068907A priority Critical patent/JPH0669053B2/en
Publication of JPS60211956A publication Critical patent/JPS60211956A/en
Publication of JPH0669053B2 publication Critical patent/JPH0669053B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Abstract

PURPOSE:To enable to surely perform a marking on defective elements by a method wherein the titled probing machine is constituted in such a way that the marking is performed on the defective elements at a position separated from normal elements after the measurement of all elements, wafers, was completed. CONSTITUTION:Numerous wafers, which have been accommodated in a cassette 4 before being measured, are conducted to a conveying belt 5 one by one, are conveyed along an arrow in the diagram and are fed in a pre-alignment unit 6. The wafers 1, which have come being fed towards an arbitrary direction from the cassette 4, are positioned in a condition aligned in a constant direction as indicated by a one dotted chain line in the diagram in the pre-alignment unit 6. When the measurement of all of the elements, wafers, was completed, the wafers are shifted to a position E, where a marking unit 12 is standing by, in a condition fixed attractingly by a suction table 9, in brief, in the same condition as the positions and directions at a time when the wafers were measured without changing the positions and directions at a time when the wafers were measured. When a defective element, which has been memorized in advance by the instruction sent from the control part, comes right under the marking pen, the defective element is made to stop at a position located right under the marking pen. Then, the suction table 9 is made to ascend or the marking unit 12 is made to descend and a mark is put on the surface of the defective element.

Description

【発明の詳細な説明】 この発明はウェハ上に格子状に配列された集積回路等の
半導体素子の電気的特性を測定検査するブロービングマ
シンのマーキング装置に係るものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a marking device for a blobbing machine that measures and inspects the electrical characteristics of semiconductor devices such as integrated circuits arranged in a grid on a wafer.

周知のようにブロービングマシンにおいては、X−Yテ
ーブル上に設けられた吸着テーブルに第1図に示すよう
なウェハ1を定められた方向にセットして、ウェハ1上
に格子状に配列されている多数の素子2の電気的特性を
、素子の電極と同じ位置・配列の触針を有するプローブ
カードと接続するテスタにより、一つずつ順に測定検査
し、不良素子にはインク等によりマーク3を付け、後の
工程でこのマークに従って不良素子を除去している。こ
のようなブロービングマシンにおいて、不良素子にマー
クを付ける従来の方法は、プローブカードの各触針が素
子の各電極に接触し、プローブカードと接続するテスタ
によりその電気的特性が測定・検査されると、その直後
にその位置においで各触針の中火部からマーキングのペ
ンが挿入されてマークが伺されるというもので゛あった
As is well known, in a blobbing machine, wafers 1 as shown in FIG. The electrical characteristics of a large number of elements 2 are measured and inspected one by one using a tester connected to a probe card that has probes in the same position and arrangement as the electrodes of the elements, and defective elements are marked with ink or the like. is marked, and defective elements are removed in a later process according to this mark. In such a blobbing machine, the conventional method for marking defective devices is that each stylus of a probe card contacts each electrode of the device, and its electrical characteristics are measured and inspected by a tester connected to the probe card. Immediately after that, a marking pen was inserted into the middle part of each stylus at that location and a mark was made.

ところが半導体素子の高集積化、高密度化が進むにつれ
で電極数が多くなり、例えば10 tn m角の素子内
に電極を200以上も有するものが作られるようになっ
てくると、上記したようなマーキング方法は適用するこ
とが難しい。すなわち多数の電極を有する素子の電気的
特性を測定する場合には、その電極数と同配列の多数の
触針を有するプローブカードを使用しで行なわなければ
ならないが、狭いスペースに多数の触側が密集して設け
られでいるため、その中央部からマーキング用ペンを挿
入することは難しくなる。また、たとえその狭いスペー
スからマーキング用ペンを挿入し得たとしても、マーキ
ング用ペンが各触針に接触して触針先端位置を狂わせる
とか、あるいは触針にインクが付着する等の面倒なトラ
ブルの発生は避けられな(1゜また、被検査素子として
、7オトグイオードアレイのように素子に光を当てた状
態でその特性検査を行なう必要のある素子の場合には、
マーキング用ペンが光を遮えぎるため、素子に光が当た
らず測定ができないという欠点があった。
However, as the integration and density of semiconductor devices progresses, the number of electrodes increases, and devices with more than 200 electrodes in a 10 tn m square element, for example, are manufactured. marking methods are difficult to apply. In other words, when measuring the electrical characteristics of a device with a large number of electrodes, it is necessary to use a probe card with a large number of probes in the same arrangement as the number of electrodes, but this requires a large number of probes in a small space. Since they are arranged closely together, it is difficult to insert a marking pen from the center. Furthermore, even if it is possible to insert a marking pen through such a narrow space, troublesome problems such as the marking pen touching each stylus and causing the tip of the stylus to be misaligned, or ink adhering to the stylus may occur. (1°) Also, in the case of a device to be tested, such as a 7-wire array, whose characteristics must be tested with light shining on the device,
The disadvantage was that the marking pen blocked the light, preventing light from hitting the element and making measurements impossible.

そこで他のマーキング方法として各素子の測定を行なう
と同時に、その素子の番地〔第1図の(×1、yl)、
(X2、y 2 ) ・−−(x n、yn)]とその
素子か不良素子であるか否かを記憶しておいて、ウェハ
上の全部の素子の測定を終えた後にそのウェハを別に設
けられたマーキング専用機によって、記憶に従ってマー
キングする方法が考えられるが、これにはウェハが測定
記憶時と絶対に間違いない順序、方向で、マーキング機
に正しく送り込まれ、駆動されること、測定開始基準と
なる素子、例えば(x+、y+)の位置が絶対に狂わな
いことが不可欠な条件となる。そこでこのマーキング方
法では全自動で多数の素子を連続して処理する場合には
、一度ミスが発生するとその後のマーキングは、全く信
頼できないという実用上致命的な危険を伴なうことにな
る。
Therefore, as another marking method, we measure each element and at the same time write the address of the element [(x1, yl) in Figure 1,
(X2, y 2 ) ·--(x n, yn)] and whether or not that element is a defective element, and after completing the measurement of all the elements on the wafer, separate the wafer. One possible method is to use a dedicated marking machine to mark according to memory, but this requires that the wafer be correctly fed into the marking machine and driven in the exact order and direction as when the measurement was memorized, and that the wafer must be driven correctly before starting measurement. An essential condition is that the position of the reference element, for example (x+, y+), never deviates. Therefore, when using this marking method to process a large number of devices in a fully automated manner in succession, once a mistake occurs, subsequent markings are completely unreliable, which poses a fatal danger in practice.

なお測定の際不良素子が発生したとき、触針を移動させ
てマーキングする方式も考えられないことではないが、
非常に厳格に位置決めを要する触針な不良素子発生の度
に移動したとすると、ずれを生ずる危険があることと、
プローブカードの各触側と制御部とはそれぞれ触針と同
じ本数の多数のワイヤで接続されているため、これを移
動させることは技術的に非常に難しいという欠点がある
It is not inconceivable that when a defective element occurs during measurement, it is possible to move the stylus and mark it.
If a defective element that requires very strict positioning is moved every time a defective element occurs, there is a risk of misalignment.
Each contact side of the probe card and the control section are connected by a large number of wires, each having the same number of probes, so it is technically very difficult to move them.

本発明はこれらの点を改善したもので、簡単な機構によ
り確実にマーキングする装置を提供するものである。以
下、本発明の一実施例について説明する。
The present invention improves these points and provides a device that reliably marks using a simple mechanism. An embodiment of the present invention will be described below.

第2図は本発明のマーキング装置を媚1えたプロービン
グマシンの平面図で、カセット4に多数枚収容されてい
る測定前のウェハは、1枚ずつ搬送ベルト5に導かれて
図の矢印に沿って搬送されて、プリアライメント装置6
に供給される。プリアライメント装置6においては、カ
セット4から任意な方向をもって供給されてきたウェハ
1を、図の一点鎖線で示すように一定方向に揃えた状態
で位置決めする。このプリアライメント装置6の機構に
ついては、本願出願人に係る特公昭56−34092号
公報1−ウェハの位置決め装置」に詳細に記載されでい
るので、ここではその構造の説明は省略する。
FIG. 2 is a plan view of a probing machine incorporating the marking device of the present invention. A large number of wafers to be measured are stored in a cassette 4 and are guided one by one to a conveyor belt 5 along the arrows in the figure. and transported to the pre-alignment device 6.
supplied to In the pre-alignment device 6, the wafers 1 supplied from the cassette 4 in an arbitrary direction are positioned so as to be aligned in a certain direction as shown by the dashed line in the figure. The mechanism of this pre-alignment device 6 is described in detail in Japanese Patent Publication No. 56-34092 1-Wafer Positioning Apparatus, filed by the applicant of the present application, so a description of its structure will be omitted here.

プリアライメント装置6において位置決めされたウェハ
1は、A−8間を移動可能なウェハ吸着装置7によって
A位置において吸着されでB位置へ移動される。B位置
にはウェハ吸着装置7の真下の位置に、X−Yテーブル
8上に上下動および回転可能に設けられた吸着テーブル
9が待機しでおり、ウェハ吸着装置7から解放されたウ
ェハ1を吸着テーブル9上に真空吸着するようになって
いる。なお図においては吸着テーブル9を明示するため
に、1吸着テーブル9はウェハ吸着装置マの真下にはな
く、Y方向に移動した状態で示されている。
The wafer 1 positioned in the pre-alignment device 6 is sucked at the A position by the wafer suction device 7 which is movable between A and 8, and then moved to the B position. At position B, a suction table 9 that is movable up and down and rotatable on an X-Y table 8 is waiting at a position directly below the wafer suction device 7, and picks up the wafer 1 released from the wafer suction device 7. It is designed to be vacuum suctioned onto a suction table 9. In the figure, in order to clearly show the suction table 9, the first suction table 9 is not shown directly below the wafer suction device 9, but is shown moved in the Y direction.

吸着テーブル9上に吸着固定されたウェハ1は、X−Y
テーブル8によってC位置にまで移動され、この位置に
おいて光学的な方法による検出結果により、吸着テーブ
ル9をX−Y方向へ微小移動させたり、あるいは微回転
させてウェハ1の精密な位置決めが行なわれる。こうし
て位置決めされたウェハ1は、予め入力されているデー
タを基にX−Yテーブル8によって測定エリアであるD
位置にまで移動され、このD位置において図示しない顕
微鏡により素子の各電極と正確に釧合わせされたプロー
ブカード10の多数の触3」11が素子の各電極に接触
し、例えば第1図の矢印で示すように(×1、yl)、
(X2、y2)・・・・・・・・(xn、yll)の順
序で測定検査を行なう。
The wafer 1 suctioned and fixed on the suction table 9 is
The wafer 1 is moved to position C by the table 8, and at this position, the suction table 9 is moved slightly in the X-Y direction or rotated slightly depending on the detection result by the optical method, and precise positioning of the wafer 1 is performed. . The wafer 1 thus positioned is moved to the measurement area D by the X-Y table 8 based on the data inputted in advance.
The probe card 10 is moved to the position D, and at this position D, a number of contacts 3'' 11 of the probe card 10, which are precisely aligned with each electrode of the element using a microscope (not shown), come into contact with each electrode of the element, for example, as indicated by the arrows in FIG. As shown in (×1, yl),
Measurement and inspection are performed in the order of (X2, y2)...(xn, yll).

その際、不良素子がある場合には、制御部の記憶装置に
よりその素子の番地例えば(x +n s y +n 
)が記憶される。全ての素子の測定が完了すると、ウェ
ハは吸着テーブル9に吸着固定された状態で、つまり測
定されたときと位置・方向を変えることなく同じ状態で
マーキング装置12の待+幾するE位置に移動され、制
御部からの指令によって先に記・臆されている不良素子
がマーキングペンの真下に来る位置で停止し、吸着テー
ブル9が上昇するからあるいはマ−キングペン12が下
降して、その素子表面にマークを付ける。
At that time, if there is a defective element, the memory device of the control unit stores the address of the element, for example (x + n sy + n
) is memorized. When the measurement of all elements is completed, the wafer is moved to the waiting position E of the marking device 12 while being suctioned and fixed to the suction table 9, that is, in the same state as when it was measured without changing the position or direction. Then, the defective element previously marked or marked by a command from the control unit stops directly under the marking pen, and as the suction table 9 rises or the marking pen 12 descends, the surface of the element is removed. mark.

マーキング装置12は例えば第3図に示すように、ブロ
ービングマシンの基台等に固定されたアーム13の一端
にインク壺14が収り伺けられ、その先端にマーキング
用ペン15が保持されているものが使用される。第3図
の16に示す装置はマークセンサ、つまり前記マーキン
グ装置12によって不良素子に確実にマークが付された
否かを検出する検出器で、例えば照射した尤の反射光の
有無を検出することによってマークが付されたか否かを
検出することができる。マークセンサは16に示すよう
にマーキングペン15に近接して1本設け、マークが付
された直後にその有無を検出するようにしてもよいし、
また17.18に示すようにマーキングペン14の前後
に1個分あるいは複数個分適宜離して2本設け、マーク
が付された素子がその下に送られてきたときに、マーク
の有無を検出するようにしてもよい。この場合マークセ
ンサを前後に2本設けた理由、は第1図の矢印で示すよ
うにウェハが左から右へ送られる場合と右から左へ送ら
れる場合があるからである。マークセンサによってもし
不良素子にマークが付されていないことが検出された場
合には、インク壺14にインクかなくなったとか、ある
いはマーキングペン14と素子との接触が充分でないと
か等の何等かのトラブルが発生したことが想定されるか
ら、装置の稼動を停止させてそのトラブルを解除してや
ることにより、後工程において不良素子が良品に混入す
ることを事前に防止することかできる。
For example, as shown in FIG. 3, the marking device 12 has an ink pot 14 housed in one end of an arm 13 fixed to the base of a blobbing machine, and a marking pen 15 held at the tip of the arm 13. What is available is used. The device shown at 16 in FIG. 3 is a mark sensor, that is, a detector that detects whether or not the marking device 12 has reliably marked a defective element. It is possible to detect whether a mark has been added or not. One mark sensor may be provided close to the marking pen 15 as shown in 16 to detect the presence or absence of a mark immediately after it is attached, or
In addition, as shown in 17.18, two pens are provided before and after the marking pen 14, separated by one or more pens, to detect the presence or absence of a mark when an element with a mark is sent under it. You may also do so. In this case, the reason why two mark sensors are provided at the front and rear is that the wafer is sometimes fed from left to right and sometimes from right to left, as shown by the arrows in FIG. If the mark sensor detects that the defective element is not marked, it may be due to some reason, such as the ink bottle 14 running out of ink or the marking pen 14 not making enough contact with the element. Since it is assumed that a trouble has occurred, by stopping the operation of the device and resolving the trouble, it is possible to prevent defective elements from being mixed with non-defective products in the subsequent process.

こうして全部の不良素子にマークを付されたウェハ1は
、吸着テーブル9に吸着固定された状態でF位置まで移
動される。F位置にはF−0間を移動可能なウェハ吸着
装置19が待機しており、測定検査を終えたウェハ1を
吸着しG位置まで搬送し、解放する。解放されたウェハ
1は搬送ベルト20によって図の矢印に沿って搬送され
ウェハ収納カセット21に収容されて測定を完了する。
The wafer 1 with all the defective elements marked in this manner is moved to the F position while being suctioned and fixed on the suction table 9. A wafer suction device 19 that can move between F-0 is waiting at position F, and picks up the wafer 1 that has been subjected to measurement and inspection, transports it to position G, and releases it. The released wafer 1 is conveyed by the conveyor belt 20 along the arrow in the figure and is housed in the wafer storage cassette 21 to complete the measurement.

以上詳述したように本発明によればウェハ上の全ての素
子の測定を完了した後に別の位置で、不良素子にマーキ
ングするよう構成したため、従来の各素子を測定した直
後にマーキングする方法、あるいはブロービングマシン
とは別の専用機によってマーキングする方法等の有する
欠点を解決し、確実にマーキングすることが可能となり
、ひいてはマーキングミスによる後工程での不良素子の
良品への混入を事前に防止し、歩留まり(完成品の良品
率)の向上に寄与することが可能となった。さらに、本
発明は通常のブロービングマシンが本来具備するウェハ
のX・Y方向の駆動機構等をそのまま利用し、わずかな
桟構部品の追加により従来困難視されできたミスのない
マーキングと、その確認機能の(11加を可能とするも
ので、信頼性、経済性において極めて大きい実用上の効
果をもたらすものである。
As described in detail above, according to the present invention, the defective elements are marked at a different position after the measurement of all the elements on the wafer is completed. Alternatively, it solves the drawbacks of marking methods using a special machine other than a blobbing machine, making it possible to mark reliably and prevent defective elements from being mixed into non-defective products in the subsequent process due to marking mistakes. This makes it possible to contribute to improving the yield (rate of non-defective finished products). Furthermore, the present invention utilizes the drive mechanism of the wafer in the X and Y directions that is originally included in a normal blobbing machine, and by adding a small number of frame parts, it is possible to perform error-free marking, which was previously thought to be difficult. It is possible to add (11) the confirmation function, and it brings extremely large practical effects in terms of reliability and economy.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はウェハの平面図、第2図は本発明の平面図、第
3図はt52図の■−■線矢視図。 1:ウェハ 2:半導体索子 3:不良素子マーク 8:X−Yテーブル9:吸着テー
ブル 10ニブローブカード11:触針 12:マーキ
ング装置 16.17.18:マークセンサ 特許出願人 株式会社 東京精密
FIG. 1 is a plan view of the wafer, FIG. 2 is a plan view of the present invention, and FIG. 3 is a view taken along the line ■-■ of the t52 diagram. 1: Wafer 2: Semiconductor probe 3: Defective element mark 8: X-Y table 9: Suction table 10 Nibrobe card 11: Stylus 12: Marking device 16.17.18: Mark sensor patent applicant Tokyo Seimitsu Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] (1)ウェハを載置するテーブルと、該テーブルを測定
位置へ移送し、かっXY方向のステップ送りを可能とす
るX−Yテーブルの駆動機構と、その制御部とを備え、
ウェハ上に格子状に配列された半導体素子の電気的特性
を素子の各電極と接触する触針を介して順次測定するブ
ロービングマシンにおいて、測定位置とは別個にマーキ
ング位置を設け、測定完了後のウェハを前記駆動制御機
構を用いて移動させ、測定時に記憶した良否の判定結果
に基づき不良素子にマーキングするマーキング装置を設
けたことを特徴とするブロービングマシン。
(1) Equipped with a table on which a wafer is placed, an X-Y table drive mechanism that transports the table to a measurement position and enables step feeding in the X and Y directions, and a control unit thereof,
In a blobbing machine that sequentially measures the electrical characteristics of semiconductor devices arranged in a grid on a wafer through a stylus that contacts each electrode of the device, a marking position is set up separately from the measurement position, and after the measurement is completed, A blobbing machine, characterized in that it is provided with a marking device that moves the wafer using the drive control mechanism and marks defective elements based on the pass/fail determination results stored at the time of measurement.
(2)前記マーキング位置に不良素子マーク確認用セン
サを設けたことを特徴とする特許請求の111(1)記
載のブロービングマシン。
(2) The blobbing machine according to claim 111(1), characterized in that a sensor for confirming a defective element mark is provided at the marking position.
JP59068907A 1984-04-06 1984-04-06 Probing machine Expired - Lifetime JPH0669053B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59068907A JPH0669053B2 (en) 1984-04-06 1984-04-06 Probing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59068907A JPH0669053B2 (en) 1984-04-06 1984-04-06 Probing machine

Publications (2)

Publication Number Publication Date
JPS60211956A true JPS60211956A (en) 1985-10-24
JPH0669053B2 JPH0669053B2 (en) 1994-08-31

Family

ID=13387190

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59068907A Expired - Lifetime JPH0669053B2 (en) 1984-04-06 1984-04-06 Probing machine

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62224943A (en) * 1986-03-27 1987-10-02 Rohm Co Ltd Wafer prober
JPS63229835A (en) * 1987-03-19 1988-09-26 Tokyo Electron Ltd Probe device
JPS63240039A (en) * 1987-03-27 1988-10-05 Tokyo Electron Ltd Device for visual inspecting subsequent to wafer cutting process
JPH01112744A (en) * 1987-10-27 1989-05-01 Tokyo Electron Ltd Wafer prober
JPH01296177A (en) * 1988-05-24 1989-11-29 Tokyo Electron Ltd Inspection apparatus
JPH02205048A (en) * 1989-02-02 1990-08-14 Tokyo Electron Ltd Method of probing semiconductor wafer
JPH02291951A (en) * 1989-05-01 1990-12-03 Figaro Eng Inc Manufacture of gas sensor
CN100459034C (en) * 2007-07-12 2009-02-04 格兰达技术(深圳)有限公司 Full-automatic wafer rear marking machine

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57104238A (en) * 1980-12-22 1982-06-29 Nec Corp Inspection device for semiconductor wafer
JPS57162441A (en) * 1981-03-31 1982-10-06 Toshiba Corp Automatic wafer tester
JPS58218132A (en) * 1982-05-21 1983-12-19 Nec Home Electronics Ltd Inspecting and treating method for characteristic of semiconductor wafer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57104238A (en) * 1980-12-22 1982-06-29 Nec Corp Inspection device for semiconductor wafer
JPS57162441A (en) * 1981-03-31 1982-10-06 Toshiba Corp Automatic wafer tester
JPS58218132A (en) * 1982-05-21 1983-12-19 Nec Home Electronics Ltd Inspecting and treating method for characteristic of semiconductor wafer

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62224943A (en) * 1986-03-27 1987-10-02 Rohm Co Ltd Wafer prober
JPS63229835A (en) * 1987-03-19 1988-09-26 Tokyo Electron Ltd Probe device
JPS63240039A (en) * 1987-03-27 1988-10-05 Tokyo Electron Ltd Device for visual inspecting subsequent to wafer cutting process
JPH01112744A (en) * 1987-10-27 1989-05-01 Tokyo Electron Ltd Wafer prober
JPH01296177A (en) * 1988-05-24 1989-11-29 Tokyo Electron Ltd Inspection apparatus
JPH02205048A (en) * 1989-02-02 1990-08-14 Tokyo Electron Ltd Method of probing semiconductor wafer
JPH02291951A (en) * 1989-05-01 1990-12-03 Figaro Eng Inc Manufacture of gas sensor
CN100459034C (en) * 2007-07-12 2009-02-04 格兰达技术(深圳)有限公司 Full-automatic wafer rear marking machine

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