JPS60211939A - 微細パタン形成法 - Google Patents

微細パタン形成法

Info

Publication number
JPS60211939A
JPS60211939A JP6845684A JP6845684A JPS60211939A JP S60211939 A JPS60211939 A JP S60211939A JP 6845684 A JP6845684 A JP 6845684A JP 6845684 A JP6845684 A JP 6845684A JP S60211939 A JPS60211939 A JP S60211939A
Authority
JP
Japan
Prior art keywords
thin film
substrate
pattern
molecular weight
low molecular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6845684A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0475647B2 (enExample
Inventor
Akira Morinaka
森中　彰
Shigeru Oikawa
及川　茂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP6845684A priority Critical patent/JPS60211939A/ja
Publication of JPS60211939A publication Critical patent/JPS60211939A/ja
Publication of JPH0475647B2 publication Critical patent/JPH0475647B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • ing And Chemical Polishing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6845684A 1984-04-06 1984-04-06 微細パタン形成法 Granted JPS60211939A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6845684A JPS60211939A (ja) 1984-04-06 1984-04-06 微細パタン形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6845684A JPS60211939A (ja) 1984-04-06 1984-04-06 微細パタン形成法

Publications (2)

Publication Number Publication Date
JPS60211939A true JPS60211939A (ja) 1985-10-24
JPH0475647B2 JPH0475647B2 (enExample) 1992-12-01

Family

ID=13374213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6845684A Granted JPS60211939A (ja) 1984-04-06 1984-04-06 微細パタン形成法

Country Status (1)

Country Link
JP (1) JPS60211939A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7686972B2 (en) 2006-02-16 2010-03-30 Kabushiki Kaisha Toshiba Method for manufacturing magnetic recording medium
US7931819B2 (en) 2006-08-15 2011-04-26 Kabushiki Kaisha Toshiba Method for pattern formation
US8105952B2 (en) 2007-09-26 2012-01-31 Kabushiki Kaisha Toshiba Method of forming a pattern

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5218175A (en) * 1975-08-01 1977-02-10 Hitachi Ltd Circuit pattern formation method and its device
JPS5711344A (en) * 1980-06-25 1982-01-21 Mitsubishi Electric Corp Dry developing method
JPS57157241A (en) * 1981-03-25 1982-09-28 Oki Electric Ind Co Ltd Formation of resist material and its pattern
JPS57162330A (en) * 1981-03-31 1982-10-06 Kazuyuki Sugita Dry formation of pattern or dry removal of resist pattern

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5218175A (en) * 1975-08-01 1977-02-10 Hitachi Ltd Circuit pattern formation method and its device
JPS5711344A (en) * 1980-06-25 1982-01-21 Mitsubishi Electric Corp Dry developing method
JPS57157241A (en) * 1981-03-25 1982-09-28 Oki Electric Ind Co Ltd Formation of resist material and its pattern
JPS57162330A (en) * 1981-03-31 1982-10-06 Kazuyuki Sugita Dry formation of pattern or dry removal of resist pattern

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7686972B2 (en) 2006-02-16 2010-03-30 Kabushiki Kaisha Toshiba Method for manufacturing magnetic recording medium
US7931819B2 (en) 2006-08-15 2011-04-26 Kabushiki Kaisha Toshiba Method for pattern formation
US8105952B2 (en) 2007-09-26 2012-01-31 Kabushiki Kaisha Toshiba Method of forming a pattern

Also Published As

Publication number Publication date
JPH0475647B2 (enExample) 1992-12-01

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