JPS60211074A - 導電膜パタ−ンの形成方法 - Google Patents

導電膜パタ−ンの形成方法

Info

Publication number
JPS60211074A
JPS60211074A JP6795184A JP6795184A JPS60211074A JP S60211074 A JPS60211074 A JP S60211074A JP 6795184 A JP6795184 A JP 6795184A JP 6795184 A JP6795184 A JP 6795184A JP S60211074 A JPS60211074 A JP S60211074A
Authority
JP
Japan
Prior art keywords
conductive film
substrate
light
film pattern
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6795184A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0114313B2 (enExample
Inventor
Akinori Shimizu
了典 清水
Misao Saga
佐賀　操
Kazuo Matsuzaki
松崎　一夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Corporate Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Corporate Research and Development Ltd filed Critical Fuji Electric Corporate Research and Development Ltd
Priority to JP6795184A priority Critical patent/JPS60211074A/ja
Publication of JPS60211074A publication Critical patent/JPS60211074A/ja
Publication of JPH0114313B2 publication Critical patent/JPH0114313B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/047—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP6795184A 1984-04-05 1984-04-05 導電膜パタ−ンの形成方法 Granted JPS60211074A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6795184A JPS60211074A (ja) 1984-04-05 1984-04-05 導電膜パタ−ンの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6795184A JPS60211074A (ja) 1984-04-05 1984-04-05 導電膜パタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS60211074A true JPS60211074A (ja) 1985-10-23
JPH0114313B2 JPH0114313B2 (enExample) 1989-03-10

Family

ID=13359760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6795184A Granted JPS60211074A (ja) 1984-04-05 1984-04-05 導電膜パタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS60211074A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0477890A3 (en) * 1990-09-26 1996-12-18 Canon Kk Processing method and apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0477890A3 (en) * 1990-09-26 1996-12-18 Canon Kk Processing method and apparatus
EP0908782A1 (en) * 1990-09-26 1999-04-14 Canon Kabushiki Kaisha Photolithographic processing method
US5962194A (en) * 1990-09-26 1999-10-05 Canon Kabushiki Kaisha Processing method and apparatus
US6025115A (en) * 1990-09-26 2000-02-15 Canon Kabushiki Kaisha Processing method for etching a substrate

Also Published As

Publication number Publication date
JPH0114313B2 (enExample) 1989-03-10

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