JPS60202711A - ＳｉＯ↓２粉塵の処理装置 - Google Patents
ＳｉＯ↓２粉塵の処理装置Info
- Publication number
- JPS60202711A JPS60202711A JP5787084A JP5787084A JPS60202711A JP S60202711 A JPS60202711 A JP S60202711A JP 5787084 A JP5787084 A JP 5787084A JP 5787084 A JP5787084 A JP 5787084A JP S60202711 A JPS60202711 A JP S60202711A
- Authority
- JP
- Japan
- Prior art keywords
- blower
- dust
- mist
- liquid
- sio2
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000428 dust Substances 0.000 title claims abstract description 41
- 239000007788 liquid Substances 0.000 claims abstract description 47
- 239000003595 mist Substances 0.000 claims abstract description 46
- 238000006243 chemical reaction Methods 0.000 claims abstract description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000007921 spray Substances 0.000 claims abstract description 10
- 238000004140 cleaning Methods 0.000 claims description 29
- 238000004519 manufacturing process Methods 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 28
- 229910052681 coesite Inorganic materials 0.000 abstract description 14
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 14
- 239000000377 silicon dioxide Substances 0.000 abstract description 14
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 14
- 229910052682 stishovite Inorganic materials 0.000 abstract description 14
- 229910052905 tridymite Inorganic materials 0.000 abstract description 14
- 238000005406 washing Methods 0.000 abstract description 4
- 238000005507 spraying Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 22
- 239000012670 alkaline solution Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000003513 alkali Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000006477 desulfuration reaction Methods 0.000 description 1
- 230000023556 desulfurization Effects 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- 239000003546 flue gas Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- -1 silicate ions Chemical class 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
Landscapes
- Separation Of Particles Using Liquids (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5787084A JPS60202711A (ja) | 1984-03-26 | 1984-03-26 | ＳｉＯ↓２粉塵の処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5787084A JPS60202711A (ja) | 1984-03-26 | 1984-03-26 | ＳｉＯ↓２粉塵の処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60202711A true JPS60202711A (ja) | 1985-10-14 |
| JPH0334364B2 JPH0334364B2 (enExample) | 1991-05-22 |
Family
ID=13068014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5787084A Granted JPS60202711A (ja) | 1984-03-26 | 1984-03-26 | ＳｉＯ↓２粉塵の処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60202711A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6706647B1 (en) * | 1999-04-16 | 2004-03-16 | Hitachi, Ltd. | Method of and apparatus for manufacturing semiconductors |
| CN100391581C (zh) * | 2005-08-19 | 2008-06-04 | 力晶半导体股份有限公司 | 粉末去除装置与废气处理机 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4973772A (enExample) * | 1972-11-21 | 1974-07-16 | ||
| JPS4978264A (enExample) * | 1972-11-30 | 1974-07-27 |
-
1984
- 1984-03-26 JP JP5787084A patent/JPS60202711A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4973772A (enExample) * | 1972-11-21 | 1974-07-16 | ||
| JPS4978264A (enExample) * | 1972-11-30 | 1974-07-27 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6706647B1 (en) * | 1999-04-16 | 2004-03-16 | Hitachi, Ltd. | Method of and apparatus for manufacturing semiconductors |
| CN100391581C (zh) * | 2005-08-19 | 2008-06-04 | 力晶半导体股份有限公司 | 粉末去除装置与废气处理机 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0334364B2 (enExample) | 1991-05-22 |
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