JPS60191016A - 高純度シリカゲル - Google Patents

高純度シリカゲル

Info

Publication number
JPS60191016A
JPS60191016A JP4538884A JP4538884A JPS60191016A JP S60191016 A JPS60191016 A JP S60191016A JP 4538884 A JP4538884 A JP 4538884A JP 4538884 A JP4538884 A JP 4538884A JP S60191016 A JPS60191016 A JP S60191016A
Authority
JP
Japan
Prior art keywords
silica
acid
reaction
purity
impurities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4538884A
Other languages
English (en)
Japanese (ja)
Other versions
JPH05339B2 (enExample
Inventor
Hiroyuki Matsubara
宏之 松原
Genichi Sato
源一 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP4538884A priority Critical patent/JPS60191016A/ja
Publication of JPS60191016A publication Critical patent/JPS60191016A/ja
Publication of JPH05339B2 publication Critical patent/JPH05339B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)
JP4538884A 1984-03-12 1984-03-12 高純度シリカゲル Granted JPS60191016A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4538884A JPS60191016A (ja) 1984-03-12 1984-03-12 高純度シリカゲル

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4538884A JPS60191016A (ja) 1984-03-12 1984-03-12 高純度シリカゲル

Publications (2)

Publication Number Publication Date
JPS60191016A true JPS60191016A (ja) 1985-09-28
JPH05339B2 JPH05339B2 (enExample) 1993-01-05

Family

ID=12717882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4538884A Granted JPS60191016A (ja) 1984-03-12 1984-03-12 高純度シリカゲル

Country Status (1)

Country Link
JP (1) JPS60191016A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6140812A (ja) * 1984-07-11 1986-02-27 ロ−ヌ−プ−ラン　シミ−　ドウ　バ−ズ シリカコロイド及び球状シリカの製造方法
US4683128A (en) * 1985-06-27 1987-07-28 Nitto Chemical Industry Co., Ltd. Process for manufacturing high purity silica

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110330022B (zh) * 2019-07-08 2020-11-24 福建远翔新材料股份有限公司 一种发泡硅橡胶海绵用高分散二氧化硅的制备方法

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54141569A (en) * 1978-04-26 1979-11-02 Toshiba Corp Semiconductor device
JPS554952A (en) * 1978-06-28 1980-01-14 Toshiba Corp Semiconductor device
JPS5610947A (en) * 1979-07-10 1981-02-03 Toshiba Corp Semiconductor sealing resin composition
JPS56149310A (en) * 1980-04-22 1981-11-19 Showa Denko Kk Manufacture of silica gel catalyst
JPS57195151A (en) * 1981-05-27 1982-11-30 Denki Kagaku Kogyo Kk Low-radioactive resin composition
JPS57212224A (en) * 1981-06-24 1982-12-27 Nitto Electric Ind Co Ltd Epoxy resin composition for encapsulation of semiconductor
JPS5829858A (ja) * 1981-08-13 1983-02-22 Nitto Electric Ind Co Ltd 電子部品封止用樹脂組成物
JPS58151318A (ja) * 1982-02-26 1983-09-08 Shin Etsu Chem Co Ltd 合成シリカおよびこれを含有してなる電子部品封止用樹脂組成物
JPS5954632A (ja) * 1982-09-21 1984-03-29 Mitsubishi Metal Corp 石英ガラス粉末の製造法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54141569A (en) * 1978-04-26 1979-11-02 Toshiba Corp Semiconductor device
JPS554952A (en) * 1978-06-28 1980-01-14 Toshiba Corp Semiconductor device
JPS5610947A (en) * 1979-07-10 1981-02-03 Toshiba Corp Semiconductor sealing resin composition
JPS56149310A (en) * 1980-04-22 1981-11-19 Showa Denko Kk Manufacture of silica gel catalyst
JPS57195151A (en) * 1981-05-27 1982-11-30 Denki Kagaku Kogyo Kk Low-radioactive resin composition
JPS57212224A (en) * 1981-06-24 1982-12-27 Nitto Electric Ind Co Ltd Epoxy resin composition for encapsulation of semiconductor
JPS5829858A (ja) * 1981-08-13 1983-02-22 Nitto Electric Ind Co Ltd 電子部品封止用樹脂組成物
JPS58151318A (ja) * 1982-02-26 1983-09-08 Shin Etsu Chem Co Ltd 合成シリカおよびこれを含有してなる電子部品封止用樹脂組成物
JPS5954632A (ja) * 1982-09-21 1984-03-29 Mitsubishi Metal Corp 石英ガラス粉末の製造法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6140812A (ja) * 1984-07-11 1986-02-27 ロ−ヌ−プ−ラン　シミ−　ドウ　バ−ズ シリカコロイド及び球状シリカの製造方法
US4683128A (en) * 1985-06-27 1987-07-28 Nitto Chemical Industry Co., Ltd. Process for manufacturing high purity silica

Also Published As

Publication number Publication date
JPH05339B2 (enExample) 1993-01-05

Similar Documents

Publication Publication Date Title
CA1144699A (en) Alumina compounds in ion exchange resins
JPH072512A (ja) 岩石から純粋な無定形シリカの製造方法
JPS6212608A (ja) 高純度シリカ及びその製造方法
US4045240A (en) Amorphous precipitated siliceous pigments and methods for their production
US2956859A (en) Preparation of anhydrite
JPS5954632A (ja) 石英ガラス粉末の製造法
US4732742A (en) Process for the production at a high level of productivity of aluminum trihydroxide in a high state of purity and with a median diameter of less than 4 micrometers, which is regulated as required
JPS60191016A (ja) 高純度シリカゲル
JPS63291808A (ja) 高純度シリカの製造方法
EP4450657A1 (en) Recovery method of lithium ion
JPH0121093B2 (enExample)
JPS6090811A (ja) 高純度シリカの製造法
JP2694163B2 (ja) 高純度シリカの製造法
JP5053925B2 (ja) 酸化銀粉末
JPH0118006B2 (enExample)
JPS60180911A (ja) 高純度シリカおよびその製造法
US1796026A (en) Recovery of tungsten from ores
US3005685A (en) Process for desilicifying fluorspar and the like minerals
JPH0516372B2 (enExample)
JPS6242854B2 (enExample)
JPS6090812A (ja) 高純度シリカの製造法
JPH055766B2 (enExample)
JPH0532418A (ja) 結晶性五酸化アンチモン水和物の製造方法
US2452179A (en) Chemical conversion of salt containing solutions
JPH0218906B2 (enExample)

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term