JPS60186318A - チタンおよびその合金の鏡面加工方法 - Google Patents
チタンおよびその合金の鏡面加工方法Info
- Publication number
- JPS60186318A JPS60186318A JP3957084A JP3957084A JPS60186318A JP S60186318 A JPS60186318 A JP S60186318A JP 3957084 A JP3957084 A JP 3957084A JP 3957084 A JP3957084 A JP 3957084A JP S60186318 A JPS60186318 A JP S60186318A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- electrolytic
- electrolyte
- mirror
- abrasive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000956 alloy Substances 0.000 title claims abstract description 16
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 16
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims description 12
- 239000010936 titanium Substances 0.000 title claims description 12
- 229910052719 titanium Inorganic materials 0.000 title claims description 12
- 229910052751 metal Inorganic materials 0.000 claims abstract description 19
- 239000002184 metal Substances 0.000 claims abstract description 19
- 239000003792 electrolyte Substances 0.000 claims abstract description 18
- 239000004094 surface-active agent Substances 0.000 claims abstract description 11
- 239000008151 electrolyte solution Substances 0.000 claims abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 12
- 238000005868 electrolysis reaction Methods 0.000 claims description 6
- 230000000694 effects Effects 0.000 claims description 4
- 238000010828 elution Methods 0.000 claims description 4
- 238000005299 abrasion Methods 0.000 claims description 2
- 238000003754 machining Methods 0.000 abstract description 18
- 239000003082 abrasive agent Substances 0.000 abstract description 10
- 239000002131 composite material Substances 0.000 abstract description 6
- 239000004745 nonwoven fabric Substances 0.000 abstract description 3
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract 1
- 239000008399 tap water Substances 0.000 description 8
- 235000020679 tap water Nutrition 0.000 description 8
- 239000012530 fluid Substances 0.000 description 6
- 230000003746 surface roughness Effects 0.000 description 6
- 239000006061 abrasive grain Substances 0.000 description 5
- 238000002386 leaching Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229940021013 electrolyte solution Drugs 0.000 description 2
- 244000274847 Betula papyrifera Species 0.000 description 1
- 235000009113 Betula papyrifera Nutrition 0.000 description 1
- 235000009109 Betula pendula Nutrition 0.000 description 1
- 235000010928 Betula populifolia Nutrition 0.000 description 1
- 235000002992 Betula pubescens Nutrition 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 206010008631 Cholera Diseases 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 244000221110 common millet Species 0.000 description 1
- 238000010612 desalination reaction Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 235000010289 potassium nitrite Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H5/00—Combined machining
- B23H5/06—Electrochemical machining combined with mechanical working, e.g. grinding or honing
- B23H5/08—Electrolytic grinding
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3957084A JPS60186318A (ja) | 1984-02-29 | 1984-02-29 | チタンおよびその合金の鏡面加工方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3957084A JPS60186318A (ja) | 1984-02-29 | 1984-02-29 | チタンおよびその合金の鏡面加工方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60186318A true JPS60186318A (ja) | 1985-09-21 |
| JPH0349688B2 JPH0349688B2 (https=) | 1991-07-30 |
Family
ID=12556732
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3957084A Granted JPS60186318A (ja) | 1984-02-29 | 1984-02-29 | チタンおよびその合金の鏡面加工方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60186318A (https=) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62246421A (ja) * | 1986-04-17 | 1987-10-27 | Kobe Steel Ltd | Ｔｉ，Ｚｒ，Ｎｂ，Ｔａまたはそれらの合金の電解研削方法 |
| JPS63237815A (ja) * | 1987-03-26 | 1988-10-04 | Agency Of Ind Science & Technol | チタン材の鏡面研磨法 |
| JPH0627020U (ja) * | 1992-09-08 | 1994-04-12 | 西山ステンレスケミカル株式会社 | 複合電解研磨装置 |
| US5486282A (en) * | 1994-11-30 | 1996-01-23 | Ibm Corporation | Electroetching process for seed layer removal in electrochemical fabrication of wafers |
| WO2001071796A3 (en) * | 2000-03-23 | 2002-03-14 | Micron Technology Inc | Method for electrochemical polishing of a conductive material |
-
1984
- 1984-02-29 JP JP3957084A patent/JPS60186318A/ja active Granted
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62246421A (ja) * | 1986-04-17 | 1987-10-27 | Kobe Steel Ltd | Ｔｉ，Ｚｒ，Ｎｂ，Ｔａまたはそれらの合金の電解研削方法 |
| JPS63237815A (ja) * | 1987-03-26 | 1988-10-04 | Agency Of Ind Science & Technol | チタン材の鏡面研磨法 |
| JPH0627020U (ja) * | 1992-09-08 | 1994-04-12 | 西山ステンレスケミカル株式会社 | 複合電解研磨装置 |
| US5486282A (en) * | 1994-11-30 | 1996-01-23 | Ibm Corporation | Electroetching process for seed layer removal in electrochemical fabrication of wafers |
| US5543032A (en) * | 1994-11-30 | 1996-08-06 | Ibm Corporation | Electroetching method and apparatus |
| WO2001071796A3 (en) * | 2000-03-23 | 2002-03-14 | Micron Technology Inc | Method for electrochemical polishing of a conductive material |
| US6582281B2 (en) | 2000-03-23 | 2003-06-24 | Micron Technology, Inc. | Semiconductor processing methods of removing conductive material |
| US6790130B2 (en) | 2000-03-23 | 2004-09-14 | Micron Technology, Inc. | Semiconductor processing methods of removing conductive material |
| US7056194B2 (en) | 2000-03-23 | 2006-06-06 | Micron Technology, Inc. | Semiconductor processing methods of removing conductive material |
| US7367871B2 (en) | 2000-03-23 | 2008-05-06 | Micron Technology, Inc. | Semiconductor processing methods of removing conductive material |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0349688B2 (https=) | 1991-07-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |