JPS60174844A - ひずみゲ−ジ材料用非晶質合金 - Google Patents
ひずみゲ−ジ材料用非晶質合金Info
- Publication number
- JPS60174844A JPS60174844A JP3193384A JP3193384A JPS60174844A JP S60174844 A JPS60174844 A JP S60174844A JP 3193384 A JP3193384 A JP 3193384A JP 3193384 A JP3193384 A JP 3193384A JP S60174844 A JPS60174844 A JP S60174844A
- Authority
- JP
- Japan
- Prior art keywords
- strain gauge
- amorphous alloy
- formula
- film
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910000808 amorphous metal alloy Inorganic materials 0.000 title claims abstract description 14
- 239000000463 material Substances 0.000 title claims abstract description 10
- 239000000203 mixture Substances 0.000 claims abstract description 16
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 12
- 239000000956 alloy Substances 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 239000010409 thin film Substances 0.000 claims abstract description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 11
- 229910052796 boron Inorganic materials 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 abstract description 10
- 238000000034 method Methods 0.000 abstract description 5
- 238000004544 sputter deposition Methods 0.000 abstract description 5
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 229910008423 Si—B Inorganic materials 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 5
- 238000005096 rolling process Methods 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000005280 amorphization Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3193384A JPS60174844A (ja) | 1984-02-21 | 1984-02-21 | ひずみゲ−ジ材料用非晶質合金 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3193384A JPS60174844A (ja) | 1984-02-21 | 1984-02-21 | ひずみゲ−ジ材料用非晶質合金 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60174844A true JPS60174844A (ja) | 1985-09-09 |
| JPH0536497B2 JPH0536497B2 (enExample) | 1993-05-31 |
Family
ID=12344766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3193384A Granted JPS60174844A (ja) | 1984-02-21 | 1984-02-21 | ひずみゲ−ジ材料用非晶質合金 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60174844A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4812801A (en) * | 1987-05-14 | 1989-03-14 | The United States Of America As Represented By The Secretary Of The Air Force | Solid state gas pressure sensor |
| US4821011A (en) * | 1986-03-24 | 1989-04-11 | Aisin Seiki Kabushiki Kaisha | Pressure sensor |
| CN100389219C (zh) * | 2006-06-22 | 2008-05-21 | 山东大学 | 一种镍-硅-硼中间合金及其制备方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54122000A (en) * | 1978-03-13 | 1979-09-21 | Ibm | Amorphous magnetic film |
-
1984
- 1984-02-21 JP JP3193384A patent/JPS60174844A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54122000A (en) * | 1978-03-13 | 1979-09-21 | Ibm | Amorphous magnetic film |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4821011A (en) * | 1986-03-24 | 1989-04-11 | Aisin Seiki Kabushiki Kaisha | Pressure sensor |
| US4812801A (en) * | 1987-05-14 | 1989-03-14 | The United States Of America As Represented By The Secretary Of The Air Force | Solid state gas pressure sensor |
| CN100389219C (zh) * | 2006-06-22 | 2008-05-21 | 山东大学 | 一种镍-硅-硼中间合金及其制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0536497B2 (enExample) | 1993-05-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Parker et al. | Electrical Resistance‐Strain Characteristics of Thin Evaporated Metal Films | |
| JP3642449B2 (ja) | Ｃｒ−Ｎ基歪抵抗膜およびその製造法ならびに歪センサ | |
| US4663607A (en) | Magnetoresistive element | |
| US4805296A (en) | Method of manufacturing platinum resistance thermometer | |
| CA1156486A (en) | Deformable flexure element for strain gage transducer and method of manufacture | |
| JPS5814864B2 (ja) | 抵抗温度計用ガラス質金属合金製感温体 | |
| JPS63165725A (ja) | 圧力センサ−用歪ゲ−ジ | |
| Zhang et al. | Microstructure and temperature coefficient of resistance of platinum films | |
| US4100524A (en) | Electrical transducer and method of making | |
| EP0032180B1 (en) | Amorphous magnetic alloy containing at least co and ti | |
| JP3933213B2 (ja) | Ｃｒ基合金薄膜およびその製造法ならびにストレインゲージ | |
| JP2019192740A (ja) | 歪抵抗膜および歪センサ、ならびにそれらの製造方法 | |
| JPS60174844A (ja) | ひずみゲ−ジ材料用非晶質合金 | |
| CA1094360A (en) | Palladium alloys | |
| CA1105743A (en) | Alloy for magnetoresistive element and method of manufacturing the same | |
| US4465577A (en) | Method and device relating to thin-film cermets | |
| JP2019074452A (ja) | 薄膜ひずみセンサ材料および薄膜ひずみセンサ | |
| Ayerdi et al. | Ceramic pressure sensor based on tantalum thin film | |
| Du et al. | Microstructural investigation of as-deposited Co-Ag nano-granular films | |
| JPH0666162B2 (ja) | 歪ゲージ用薄膜抵抗体 | |
| JP2562610B2 (ja) | 歪ゲ−ジ用薄膜抵抗体 | |
| JPH0276201A (ja) | 歪ゲージ用薄膜抵抗体 | |
| US5521005A (en) | Magnetoresistive head | |
| JPH03212903A (ja) | 薄膜測温抵抗体の製造方法 | |
| Brunsch | Magnetic properties and corrosion resistance of (CoFeB) 100− xCrx thin films |