JPS6017444A - 放射線感応性樹脂組成物 - Google Patents

放射線感応性樹脂組成物

Info

Publication number
JPS6017444A
JPS6017444A JP12471983A JP12471983A JPS6017444A JP S6017444 A JPS6017444 A JP S6017444A JP 12471983 A JP12471983 A JP 12471983A JP 12471983 A JP12471983 A JP 12471983A JP S6017444 A JPS6017444 A JP S6017444A
Authority
JP
Japan
Prior art keywords
radiation
resin composition
aldehyde
polymer
sensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12471983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0158496B2 (enrdf_load_stackoverflow
Inventor
Kazuo Nate
和男 名手
Takashi Inoue
隆史 井上
Ataru Yokono
中 横野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12471983A priority Critical patent/JPS6017444A/ja
Publication of JPS6017444A publication Critical patent/JPS6017444A/ja
Publication of JPH0158496B2 publication Critical patent/JPH0158496B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
JP12471983A 1983-07-11 1983-07-11 放射線感応性樹脂組成物 Granted JPS6017444A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12471983A JPS6017444A (ja) 1983-07-11 1983-07-11 放射線感応性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12471983A JPS6017444A (ja) 1983-07-11 1983-07-11 放射線感応性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6017444A true JPS6017444A (ja) 1985-01-29
JPH0158496B2 JPH0158496B2 (enrdf_load_stackoverflow) 1989-12-12

Family

ID=14892407

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12471983A Granted JPS6017444A (ja) 1983-07-11 1983-07-11 放射線感応性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6017444A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0158496B2 (enrdf_load_stackoverflow) 1989-12-12

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