JPS60170013A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPS60170013A
JPS60170013A JP2388484A JP2388484A JPS60170013A JP S60170013 A JPS60170013 A JP S60170013A JP 2388484 A JP2388484 A JP 2388484A JP 2388484 A JP2388484 A JP 2388484A JP S60170013 A JPS60170013 A JP S60170013A
Authority
JP
Japan
Prior art keywords
film
magnetic core
coil conductor
magnetic
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2388484A
Other languages
Japanese (ja)
Inventor
Noboru Wakabayashi
登 若林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP2388484A priority Critical patent/JPS60170013A/en
Publication of JPS60170013A publication Critical patent/JPS60170013A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/313Disposition of layers

Abstract

PURPOSE:To improve the record/reproduction efficiency without deteriorating the characteristics of an upper magnetic core by forming a hollow part at a part of a lower magnetic core film to set a coil conductor into said hollow part and therefore flattening the upper magnetic core film with even thickness. CONSTITUTION:A lower magnetic core film 12 is formed on a magnetic substrate 11, and a coil conductor forming part 12b is deleted by etching. A nonmagnetic insulated film 13 is formed by sputtering to the entire part of the film 12 including a core film deleted part 12a with approximately same thickness as the film 12. Then the coil conductor forming groove part 13a is formed equidistantly by etching at the part 12a with rectangular sections. A conductor layer 14 having the film thickness equal to the depth of the part 13a is formed on the part 13a. Then the layer 14 is removed by etching excepting the part 13a, and the surface of the etched surface to form a coil conductor 14a. A gap forming insulated film 15 is formed on the surface of the conductor 14a, and the film 15 is etched away at a back gap part. Then a contact window is formed by etching. An upper magnetic core film 16 is formed finally, and a thin film magnetic head source matter is obtained by patterning. Then the track width processing is applied to said head source matter to obtain a thin film magnetic head 10'.

Description

【発明の詳細な説明】 産業上の利用分9jt 本発明は、商密度の磁気記録、再41−をP」能とする
薄1模磁気ヘットに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thin 1 mm magnetic head capable of performing commercial density magnetic recording and reproducing 41-P''.

背景技術とその問題点 例えばPCM信号を記録または再生する多チャンネル、
Jなわち多素子磁気ヘッドとし゛C薄M Ml気ヘッド
が用いられる。
Background technology and its problems For example, multi-channel recording or reproducing PCM signals,
In other words, a multi-element magnetic head and a thin M Ml magnetic head are used.

従来、この種の薄膜磁気ヘットは第1図及び第2図にネ
オ如く構成されζいる。先ず第1図に7にずものはコイ
ル導体を−1−に形成した薄膜磁気ヘッドであって磁性
または非磁性の基1m +11の上にパーマロイ、セン
ダスト、アモルファス等のスパッタ、蒸着等の手段によ
り上部磁性コア膜(2)を形成し、その上に5i02等
の非磁性絶縁膜(3)を介し′ζ−j−のコイル導体1
m (41が形成され、その上に非磁性絶縁膜(5)が
被着されて更にその上に上部磁性コア映(6)が形成さ
れる。そして両磁性コア欣+21 (61はコイル導体
層(4)を囲む形でギャップ(7)を介して閉磁路を形
成し”ζいる。
Conventionally, this type of thin film magnetic head has been constructed as shown in FIGS. 1 and 2. First, item 7 in Fig. 1 is a thin film magnetic head in which a coil conductor is formed to -1-, and permalloy, sendust, amorphous, etc. is deposited on a magnetic or non-magnetic base 1m+11 by means of sputtering, vapor deposition, etc. An upper magnetic core film (2) is formed, and a coil conductor 1 of
m (41 is formed, a non-magnetic insulating film (5) is deposited on it, and an upper magnetic core layer (6) is formed on it. Then, both magnetic core layers +21 (61 is a coil conductor layer A closed magnetic path is formed via a gap (7) surrounding (4).

このように形成される薄膜磁気ヘッドにおいて上部磁性
コア膜(6)の形成の際、コイル導体層(4)は所要の
厚さを有するので図下の如くコイル導体1−(4)の両
端部で段差を生じる。この段差のため上部磁性コ”r股
1e+は平坦部分(6a)の膜厚t1より段差部分(6
b)における膜厚t2は通常のスパッタや蒸着等の手段
では必然的に肉薄となる。この段差部分(6b)の膜厚
L2はコイル導体層(4)の両端部のテーパー角θによ
って制御可能であるが、このテーパー角θは通常のイオ
ンミリング、プラズマエツチング等のドライエツチング
法では45°〈θ<90°の範囲で変えられるだけでこ
の範囲ごは上部磁性コア股(6)の平坦部分(6a)と
段差部分(6b)のII!厚は1.=12となることは
不I′IJ能である。
In the thin film magnetic head formed in this way, when forming the upper magnetic core film (6), since the coil conductor layer (4) has a required thickness, both ends of the coil conductor 1-(4) are formed as shown in the bottom of the figure. This creates a step. Because of this step, the upper magnetic layer 1e+ has a thickness t1 of the step portion (6a), which is lower than that of the flat portion (6a).
The film thickness t2 in b) inevitably becomes thin when using ordinary means such as sputtering or vapor deposition. The film thickness L2 of this stepped portion (6b) can be controlled by the taper angle θ at both ends of the coil conductor layer (4), but this taper angle θ is 45. It can only be changed within the range of °<θ<90°, and this range is the flat part (6a) and stepped part (6b) of the upper magnetic core crotch (6). The thickness is 1. =12 is impossible.

このように薄膜磁気ヘッドは磁束を通ずことができる磁
性コアは薄膜により形成され°ζいるため記録、再生効
率は磁性コアのPrf41!、’:によって定まるごと
になり、またこの効率の制約は磁路中の磁性コアの最も
肉薄の部分で決定されるので本例においては上部磁性コ
アH@ +61の段差部分(6b)の膜厚によっ°CC
記録再再生効率定まるごとになる。
In this way, in a thin film magnetic head, the magnetic core through which magnetic flux can pass is formed of a thin film, so the recording and reproducing efficiency is as low as Prf41! , ':, and this efficiency constraint is determined by the thinnest part of the magnetic core in the magnetic path, so in this example, the film thickness of the stepped part (6b) of the upper magnetic core H@+61 By°CC
The recording/reproducing efficiency is determined.

そごで本例においては上部磁性コア腺(6)の段差部分
(6b)の膜厚を厚くすれば効率の向」二を図ることが
61能で、この膜厚を厚くする手法としてコイル導体層
(4)のエツチング形成方法を変えることが考えられる
が、上述した通雷のドライエツチング法以外ではそのエ
ツチングに時間が費やされると共に高密度マルチトラン
クヘッドを形成する場合トラックピッチが狭くなるとI
V膜のパターンニング、エツチングは不可能となる。ま
た磁性コア1 膜の磁気特性面からみても凹凸部分では
コア欣面内に不用な磁区が発生し透磁率の低]・をきた
し、記録、再生効率が租くなる等の欠点がある。
Therefore, in this example, it is possible to increase the efficiency by increasing the film thickness of the step part (6b) of the upper magnetic core gland (6), and one way to increase this film thickness is to use a coil conductor. It is conceivable to change the method of etching the layer (4), but with the method other than the above-mentioned lightning dry etching method, etching takes time and when forming a high-density multi-trunk head, the track pitch becomes narrower.
Patterning and etching of the V film becomes impossible. In addition, from the viewpoint of the magnetic properties of the magnetic core 1 film, there are disadvantages such as the occurrence of unnecessary magnetic domains within the surface of the core in the uneven portions, resulting in low magnetic permeability, resulting in poor recording and reproducing efficiency.

また、第2図にネオものはコイル導体を二層に形成した
薄映磁気ヘッドであっ°ζ、基板filに形成された下
部磁性コ゛F IQ +21の上に非磁性絶縁膜(3)
を介して第1のコイル導体In (41を所要間隔で形
成して第1の非磁性絶縁膜(5)を被着し、その上に第
2のコイル導体1t#(4’)を、第1のコイル導体1
tii (41の各間隔部に位置するように形成し、更
にその上に第2の非磁性絶縁H9!(5’)を被着しC
その上に上部磁性コア膜(6)を形成して構成される。
In addition, the Neo one shown in Figure 2 is a thin film magnetic head with a coil conductor formed in two layers.
A first coil conductor In (41) is formed at required intervals and a first non-magnetic insulating film (5) is deposited thereon, and a second coil conductor 1t# (4') is placed on top of the first coil conductor In (41). 1 coil conductor 1
C
An upper magnetic core film (6) is formed thereon.

このようにコイル導体を多1鰻に形成した薄膜磁気ヘッ
ドは記録電流を低減し、再生出力を向上さ−Uる点で自
利であるが、各種の考1.銀が必要でその1つにコイル
導体1m Ift部を平坦化させ上部磁性コア映の特性
劣化を防止し°Cいるが、コイル導体IHの両端部1な
わちフロントギャップ部(7)及びハックギャップ部(
7′)の近傍での段差は避けられず、従って上述の第1
図に示す一月−コイル導体の薄膜磁気ヘッドと同様に」
二部磁性コア腺(6)の段差部分(6b)は平坦部分(
6a)に比し肉薄となり士別と同様な問題が生ずる。
The thin film magnetic head in which the coil conductor is formed into a multilayer structure is advantageous in that it reduces the recording current and improves the reproduction output, but there are various considerations. One of the reasons why silver is needed is to flatten the If part of the coil conductor 1 m to prevent deterioration of the characteristics of the upper magnetic core. Department (
7') is unavoidable, and therefore the above-mentioned first
Similar to the thin-film magnetic head of the January-coil conductor shown in Fig.
The stepped part (6b) of the two-part magnetic core gland (6) is the flat part (
It is thinner than 6a) and the same problem as Shibetsu occurs.

発明の目的 本発明は、上述したような薄映磁気ヘッドにおいて、上
部磁性コア膜を均一な膜1νで平坦化して形成テキ、−
、L’: 811磁性コアの特性を劣化させることなく
記録、再生効率の向上をはかるようにし、史に上部磁性
コ゛7のエツチング時間の短縮化、パターンニングの精
度向上をばかり、製造の簡易化が弓部なs欣磁気ヘッド
を提供するものである。
Object of the Invention The present invention provides a thin film magnetic head as described above, in which the upper magnetic core film is formed by flattening it with a uniform film 1ν.
, L': 811 The recording and reproducing efficiency is improved without deteriorating the characteristics of the magnetic core, and the etching time of the upper magnetic core 7 is shortened, patterning accuracy is improved, and manufacturing is simplified. The present invention provides a curved S-shape magnetic head.

発明の概要 本発明は上記の]」的を達成するために、磁性基板、1
・部磁性ニドr1模、ギヤ・ノプハI tW I模及び
−F部磁f’1.:I )’税が舶次形成され、1一部
磁性二1ア股の一部に四部を形成し、ごの凹部に:1イ
ル導体を設りるごとによ幻薄股磁気ヘットを構成するも
のである。
SUMMARY OF THE INVENTION In order to achieve the above object, the present invention provides a magnetic substrate, 1
・Part magnetic nid r1 model, gear knob I tW I model and -F part magnetic f'1. :I)'Tax is formed in the vessel, 1 part magnetic 21 part is formed in 4 parts in part of the 21 parts, and each recessed part of the : 1 conductor is installed to form a phantom thin crotch magnetic head. It is something to do.

実り缶f夕jl 第3図以トを参照し°(本発明の詳細な説明する。fruit can f evening jl The present invention will be described in detail with reference to FIG.

第3図は本発明の一実施例とし”(の1319磁気ヘツ
ドの製造]1程説明図である。
FIG. 3 is an explanatory diagram of the first embodiment of the present invention.

同図においζ(11)は例えばMn −Zn系フェライ
ト、Ni−Zn系フェライト等より成る磁性基板で平滑
に加工仕上げした後、この基13j(11)の平面上に
センダスト、パーマロイ、アモルファス等によりスパッ
タ、蒸着等の手段で1・部磁性コ′/股(12ンを、後
で構成するコイル導体1挨と絶縁1模厚を含めた合計の
映1νl程度に形成し、この上部磁性コ′r11Q(1
2)のコイル導体形成部(12a)をドライエツチング
等により除去する(同図A)。
In the figure, ζ (11) is smoothed with a magnetic substrate made of, for example, Mn-Zn ferrite, Ni-Zn ferrite, etc., and then is coated with sendust, permalloy, amorphous, etc. on the plane of this base 13j (11). By means of sputtering, vapor deposition, etc., 1 part magnetic core (12 parts) is formed to a total thickness of about 1νl, including one coil conductor and one insulation layer, which will be constructed later. r11Q(1
2) The coil conductor forming portion (12a) is removed by dry etching or the like (FIG. A).

次にコア19除去部(12a)を含め上部((i f!
lコア1%(12)σN−にS i(h等の非磁性絶縁
膜(13)を形成しく同図B)、この非磁性絶縁膜(1
3)を介し一ζコ゛7膜除去部(12a )に第1のコ
イル導体j−(14)を形成し、Pli”JM間隔形状
にパターンニングする(同図C)。この場合第1のコイ
ル導体1−(14)はjii図C′に示す如き形状、す
なわちコア映除去部(12a)内にフロントギャップ側
及びハフクギ中ツブ側から等間隔形状にパターンニング
し“ζもよい。このようにバクーンニングされた第1の
コイル導体NC14)の上に非磁性絶縁膜(13’)を
被着しく同図り及びD′)、そしてこの非磁性絶縁11
Gt! (13’) 0) l−に第2のごzイル導体
1tJ(14’)を形成し、第1のこIイル導体1tm
(+4)の間隔部に入るようにパターンニングしてこの
表面を平坦化し、その上に非磁性絶縁膜(15)を被着
形成する(同図E及びE’)。
Next, the upper part including the core 19 removed part (12a) ((if!
A non-magnetic insulating film (13) such as Si (h) is formed on the l core 1% (12) σN- (Figure B), and this non-magnetic insulating film (1
3) A first coil conductor j-(14) is formed on the one ζ coil 7 film removed portion (12a) and patterned into a Pli''JM spacing shape (C in the same figure).In this case, the first coil conductor The conductor 1-(14) may have a shape as shown in FIG. A non-magnetic insulating film (13') is deposited on the first coil conductor NC14) which has been vacuumed in this way.
Gt! (13') 0) Form the second coil conductor 1tJ (14') on l-, and form the first coil conductor 1tm
The surface is flattened by patterning so as to fit into the (+4) interval, and a nonmagnetic insulating film (15) is deposited thereon (E and E' in the same figure).

次いでト813磁91+コア股(12)上のバックギャ
ップ部に当る部分の非磁性絶縁膜を全゛(エツチング除
去し、フロントギャップ部は所要のギャップ長となるよ
うに非磁性絶縁膜(15’)を形成することにより上部
磁1+1:+ア欣形成前の工程は終rする(同図F及び
1?′)。この場合フロントギャップ部は前段工程で形
成されCいる非磁性絶縁膜を所要のギャップ長に相当す
る膜厚になるようにイオンエツチング或いはラップ研摩
して形成しζもよい。
Next, the non-magnetic insulating film in the part corresponding to the back gap on the magnet 91 + core crotch (12) is completely etched away, and the non-magnetic insulating film (15') is removed in the front gap part so that the required gap length is obtained. ), the process before forming the upper magnetic field 1+1:+A is completed (F and 1?' in the same figure).In this case, the front gap part is formed in the previous step and requires a non-magnetic insulating film C. It may also be formed by ion etching or lap polishing so that the film thickness corresponds to the gap length of ζ.

そし“ζ最後に上部磁性コア股(16)を形成するごと
により薄膜磁気ヘッド素体が形成され(同図G及びG′
)、この素体をトラック中加工することにより第4図に
ボず薄膜磁気ヘッド001が得られる。
Finally, by forming the upper magnetic core crotch (16), a thin film magnetic head element is formed (see G and G' in the same figure).
), by subjecting this element to mid-track processing, a thin film magnetic head 001 with no scratches as shown in FIG. 4 is obtained.

なお、本例の図示の構成においてはコイル導体を二層に
形成しであるが、三)−以上多層に形成することもr=
J能で、特に偶数1−の場合は順次コイル導体パターン
の間隔に入るように積層形成できるので表面の平坦化が
容易となる。
Note that in the illustrated configuration of this example, the coil conductor is formed in two layers, but it can also be formed in multiple layers of 3)- or more.
In particular, in the case of an even number of 1-, layers can be formed so as to be successively spaced between the coil conductor patterns, making it easy to flatten the surface.

以上のように本例の工程をとることにより、J二部磁性
コア膜形成面は概略平坦化力沖J能となり、多少のバク
ーンニング誤差、各層の膜厚誤差を含めても段差を1μ
m前後に押えることが可能となっζ、上部磁性コア膜は
均一膜厚で平坦に形成できる。この上部磁性コア映の膜
厚は記録媒体の抗磁力及び所要のデプス値によっ”ζ決
められるが、近年の尚密度記録媒体であるメタルパウダ
ー等の高抗磁力媒体の場合、5μm以上の膜厚が必要と
なり、この場合1μm前後(2μm以上)の段差は磁気
特性上はとんど問題とならず、また1μm11f後の段
差の場合通常のスパッタ蒸着でも均一な膜厚に形成でき
る。
As described above, by following the steps in this example, the surface on which the magnetic core film is formed on the two parts has approximately the same flattening ability, and even if some buckooning errors and film thickness errors of each layer are included, the level difference can be reduced to 1 μm.
Since it is possible to suppress the thickness to around m, the upper magnetic core film can be formed flat with a uniform thickness. The film thickness of this upper magnetic core film is determined by the coercive force of the recording medium and the required depth value, but in the case of high coercive force media such as metal powder, which is a recent high-density recording medium, a film of 5 μm or more is used. In this case, a step of around 1 μm (2 μm or more) does not pose a problem in terms of magnetic properties, and in the case of a step of 1 μm after 11f, a uniform film thickness can be formed by ordinary sputter deposition.

第5図は本発明の他の実施例としての薄膜磁気ヘッドの
製造工程説明図ごある。
FIG. 5 is an explanatory diagram of the manufacturing process of a thin film magnetic head as another embodiment of the present invention.

本例はコイル導体が一層で形成されるとごろがコイル導
体を多層(図示では二Id)に形成する上述の実施例と
は異るところである。
This example differs from the above embodiment in which the coil conductor is formed in multiple layers (two Id in the figure) in that the coil conductor is formed in one layer.

ずなわぢ、本例の場合磁性基&(11)に1・゛部磁性
コア膜(12)を形成し、コイル導体形成部(12b)
をエツチング除去した後(同図A)、コア膜除去部<1
2a)を含む下部磁性コア膜(12)の全体にわたって
非磁性絶縁M(13)をスパッタ、蒸着、プラズマCV
 I)等の手段により下部磁性コア欣(12)と略同じ
膜厚に形成しく同図B)、その後、コア膜除去部(12
a)の絶縁膜にコイル導体形成用溝部(13a)をプラ
ズマエツチング等で例えば11Ji面知形状にエツチン
グにより等間隔で形成する(同図C)。
In this example, a 1.5 part magnetic core film (12) is formed on the magnetic base & (11), and a coil conductor forming part (12b) is formed.
After removing the core film by etching (A in the same figure), the core film removed portion <1
Sputtering, vapor deposition, plasma CV
The thickness of the lower magnetic core layer (12) is approximately the same as that of the lower magnetic core layer (12) by means such as I), and then the core layer removed portion (12) is formed to have the same thickness as the lower magnetic core layer (12).
Grooves (13a) for forming coil conductors are formed in the insulating film of a) by plasma etching or the like to form, for example, an 11Ji surface shape at equal intervals (FIG. C).

次いでその上にコイル導体形成用溝部(13a)の深さ
と同じ膜厚の導体層(14)を形成しく同図D)、溝部
(13a)以外をエツチング或いはラップ研摩等の手段
により除去し、その表面を平坦化することによりコイル
導体(14a)が形成される(同図E)。その後その表
面上にギヤツブ形成用絶縁[1(15)を形成し、パッ
クギャップ部分の絶縁膜(15)をエツチングにより除
去しく同図F)、コンタクト窓をエツチング形成する(
図ボせず)。
Next, a conductor layer (14) having the same thickness as the depth of the coil conductor forming groove (13a) is formed thereon, and the area other than the groove (13a) is removed by means such as etching or lap polishing. A coil conductor (14a) is formed by flattening the surface (E in the same figure). After that, an insulating film (15) for gear formation is formed on the surface, and the insulating film (15) in the pack gap part is removed by etching (Figure F), and a contact window is formed by etching (
(No figure shown).

そして最後に上部磁性コア腺(16)を形成してパター
ンニングすることにより薄膜磁気ヘッド素体を形成しく
同図G)、トラック中加工することにより第6図に示す
薄膜磁気ヘッド(10’)が得られる。
Finally, the upper magnetic core gland (16) is formed and patterned to form a thin film magnetic head element (G in the same figure), and the thin film magnetic head (10' shown in Fig. 6) is formed by processing during the track. is obtained.

以上のように本例の場合も上述した実施例の場合と同様
に上部磁性コア膜形成面の概略平坦化が可能となり、上
部磁性コア映を均一膜厚で平坦に形成できる。
As described above, in the case of this example as well, it is possible to substantially flatten the surface on which the upper magnetic core film is formed, and the upper magnetic core film can be formed flat with a uniform film thickness.

発明の効果 以上のように本発明にょるPJ股磁気ヘッドは磁性基扱
上に形成した下部磁性コア膜の一部に四部を形成し、こ
の四部にコイル導体を設りるので上部磁性コア1模形成
面にはコイル導体による段差はほとんど生ぜず上部磁性
コア股を均−膜厚で平坦に形成できて、磁気特性を劣化
させることなく、記録、再生効率が向上し、また製造に
おい′ζも上部磁性コア1漢は最低限の膜厚ですむので
エツチング時間の短縮化及びコアパターンニングの精度
の向上をはかることができて、信頼性の晶い薄肋磁気ヘ
ッドを得るごとができる等の効果を自する。
Effects of the Invention As described above, the PJ crotch magnetic head according to the present invention has four parts formed on a part of the lower magnetic core film formed on the magnetic substrate, and coil conductors are provided in these four parts. There are almost no steps caused by the coil conductor on the patterned surface, and the upper magnetic core crotch can be formed flat with an even thickness, improving recording and reproducing efficiency without deteriorating magnetic properties, and reducing manufacturing odor. Also, since the upper magnetic core requires only a minimum film thickness, the etching time can be shortened and the accuracy of core patterning can be improved, making it possible to obtain a highly reliable thin-ribbed magnetic head. have the effect of

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の薄M91磁気ヘッドの一例のWE面図、
第2図は同、他例の…1面図、第3図は本発明によるM
膜磁気ヘッドの一例の製造工程図、第4図は同、@股俳
気ヘットの一例の断面図、第5図は本発明による薄膜磁
気ヘソ1−の他例の製造」二稈図、第6図は同、tit
 1IR4(ti&気ヘットの他例の…目h1図である
。 図中001 (Ill’)は薄欣母気ヘット、(11)
は磁性基板、(I2)はト部磁性:1ア股、(13)は
絶縁膜、(14) (14’)はコイル導体、(15’
)はギヤツブ用踏股、(16)は1部研P↓:I −j
’ IIQである。 同 松隈秀盛′つ) 第1図
Figure 1 is a WE view of an example of a conventional thin M91 magnetic head.
Fig. 2 is a front view of the same and another example, and Fig. 3 is a M according to the present invention.
FIG. 4 is a cross-sectional view of an example of the thin film magnetic head 1 according to the present invention, and FIG. Figure 6 is the same, tit
1IR4 (This is the h1 diagram of another example of ti & qi het. 001 (Ill') in the figure is thin xin mother qi het, (11)
(I2) is magnetic substrate, (13) is an insulating film, (14) (14') is a coil conductor, (15'
) is the gear foot, (16) is the 1st section P↓: I -j
'It is IIQ. (Hidemori Matsukuma) Figure 1

Claims (1)

【特許請求の範囲】[Claims] 磁性基扱、上部磁性コア膜、ギヤツブ用薄映及〜 び上
部磁性コア1挨が順次形成され、十記ト部磁性コ”r膜
の一部に四部を形成し、該凹部にコイル導体を設けたご
とを特徴とする薄膜磁気ヘッド。
A magnetic substrate, an upper magnetic core film, a thin film for the gear, and an upper magnetic core 1 are sequentially formed, four parts are formed on a part of the magnetic core film, and a coil conductor is placed in the recessed part. A thin film magnetic head characterized by the following features:
JP2388484A 1984-02-10 1984-02-10 Thin film magnetic head Pending JPS60170013A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2388484A JPS60170013A (en) 1984-02-10 1984-02-10 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2388484A JPS60170013A (en) 1984-02-10 1984-02-10 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS60170013A true JPS60170013A (en) 1985-09-03

Family

ID=12122869

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2388484A Pending JPS60170013A (en) 1984-02-10 1984-02-10 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS60170013A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62114113A (en) * 1985-11-13 1987-05-25 Matsushita Electric Ind Co Ltd Thin film magnetic head

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5593519A (en) * 1978-12-28 1980-07-16 Matsushita Electric Ind Co Ltd Magnetic head

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5593519A (en) * 1978-12-28 1980-07-16 Matsushita Electric Ind Co Ltd Magnetic head

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62114113A (en) * 1985-11-13 1987-05-25 Matsushita Electric Ind Co Ltd Thin film magnetic head

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