JPS60169559A - 高硬度窒化ホウ素膜の製法 - Google Patents

高硬度窒化ホウ素膜の製法

Info

Publication number
JPS60169559A
JPS60169559A JP2301784A JP2301784A JPS60169559A JP S60169559 A JPS60169559 A JP S60169559A JP 2301784 A JP2301784 A JP 2301784A JP 2301784 A JP2301784 A JP 2301784A JP S60169559 A JPS60169559 A JP S60169559A
Authority
JP
Japan
Prior art keywords
ion
substrate
boron
ions
nitrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2301784A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0259862B2 (enrdf_load_html_response
Inventor
Mamoru Sato
守 佐藤
Koichi Yamaguchi
浩一 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Kyocera Corp filed Critical Agency of Industrial Science and Technology
Priority to JP2301784A priority Critical patent/JPS60169559A/ja
Priority to US06/700,697 priority patent/US4656052A/en
Publication of JPS60169559A publication Critical patent/JPS60169559A/ja
Publication of JPH0259862B2 publication Critical patent/JPH0259862B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0647—Boron nitride

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2301784A 1984-02-13 1984-02-13 高硬度窒化ホウ素膜の製法 Granted JPS60169559A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2301784A JPS60169559A (ja) 1984-02-13 1984-02-13 高硬度窒化ホウ素膜の製法
US06/700,697 US4656052A (en) 1984-02-13 1985-02-12 Process for production of high-hardness boron nitride film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2301784A JPS60169559A (ja) 1984-02-13 1984-02-13 高硬度窒化ホウ素膜の製法

Publications (2)

Publication Number Publication Date
JPS60169559A true JPS60169559A (ja) 1985-09-03
JPH0259862B2 JPH0259862B2 (enrdf_load_html_response) 1990-12-13

Family

ID=12098717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2301784A Granted JPS60169559A (ja) 1984-02-13 1984-02-13 高硬度窒化ホウ素膜の製法

Country Status (1)

Country Link
JP (1) JPS60169559A (enrdf_load_html_response)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62164869A (ja) * 1986-01-16 1987-07-21 Nissin Electric Co Ltd 高硬度被覆材料とその製造方法
JPS63250454A (ja) * 1987-04-06 1988-10-18 Hitachi Ltd イオンミキシング方法及びその装置
JPH0254758A (ja) * 1988-08-18 1990-02-23 Nissin Electric Co Ltd 薄膜形成装置
JPH02236269A (ja) * 1989-03-07 1990-09-19 Nissin Electric Co Ltd 窒化ホウ素膜の形成方法
JPH0397848A (ja) * 1989-09-07 1991-04-23 Nissin Electric Co Ltd 窒化ホウ素薄膜被覆高速度鋼切削工具の製造方法
JPH03160605A (ja) * 1989-11-17 1991-07-10 Nissin Electric Co Ltd 磁気ヘッドおよびその製造方法
JPH03191050A (ja) * 1989-12-20 1991-08-21 Nissin Electric Co Ltd 高硬度窒化ホウ素含有薄膜の製造方法
JPH03229857A (ja) * 1990-02-02 1991-10-11 Nissin Electric Co Ltd 窒化ホウ素薄膜の形成方法
JPH0442411A (ja) * 1990-06-08 1992-02-13 Nissin Electric Co Ltd 磁気ヘッド
JPH0499262A (ja) * 1990-08-10 1992-03-31 Nissin Electric Co Ltd 光学ガラス素子の成形型
US5277939A (en) * 1987-02-10 1994-01-11 Semiconductor Energy Laboratory Co., Ltd. ECR CVD method for forming BN films

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62164869A (ja) * 1986-01-16 1987-07-21 Nissin Electric Co Ltd 高硬度被覆材料とその製造方法
US5277939A (en) * 1987-02-10 1994-01-11 Semiconductor Energy Laboratory Co., Ltd. ECR CVD method for forming BN films
JPS63250454A (ja) * 1987-04-06 1988-10-18 Hitachi Ltd イオンミキシング方法及びその装置
JPH0254758A (ja) * 1988-08-18 1990-02-23 Nissin Electric Co Ltd 薄膜形成装置
JPH02236269A (ja) * 1989-03-07 1990-09-19 Nissin Electric Co Ltd 窒化ホウ素膜の形成方法
JPH0397848A (ja) * 1989-09-07 1991-04-23 Nissin Electric Co Ltd 窒化ホウ素薄膜被覆高速度鋼切削工具の製造方法
JPH03160605A (ja) * 1989-11-17 1991-07-10 Nissin Electric Co Ltd 磁気ヘッドおよびその製造方法
JPH03191050A (ja) * 1989-12-20 1991-08-21 Nissin Electric Co Ltd 高硬度窒化ホウ素含有薄膜の製造方法
JPH03229857A (ja) * 1990-02-02 1991-10-11 Nissin Electric Co Ltd 窒化ホウ素薄膜の形成方法
JPH0442411A (ja) * 1990-06-08 1992-02-13 Nissin Electric Co Ltd 磁気ヘッド
JPH0499262A (ja) * 1990-08-10 1992-03-31 Nissin Electric Co Ltd 光学ガラス素子の成形型

Also Published As

Publication number Publication date
JPH0259862B2 (enrdf_load_html_response) 1990-12-13

Similar Documents

Publication Publication Date Title
US4657774A (en) Method for thin film formation
US4656052A (en) Process for production of high-hardness boron nitride film
JPS60195094A (ja) ダイヤモンド薄膜の製造方法
WO1988010321A1 (en) Process for the deposition of diamond films
JPS5941510B2 (ja) 酸化ベリリウム膜とその形成方法
JPS60169559A (ja) 高硬度窒化ホウ素膜の製法
JPH0351787B2 (enrdf_load_html_response)
JPH04959B2 (enrdf_load_html_response)
JPH04958B2 (enrdf_load_html_response)
JPS6134173A (ja) 高硬度窒化ホウ素膜の製造方法
JPS60181262A (ja) 高硬度窒化ホウ素膜の製造方法
JPS61227163A (ja) 高硬度窒化ホウ素膜の製法
JPH0515788B2 (enrdf_load_html_response)
JP2611521B2 (ja) 窒化ホウ素薄膜の形成方法
JPS62161952A (ja) 立方晶窒化硼素薄膜の形成方法
JP2791034B2 (ja) カーボンイオンビーム発生方法
JP4294138B2 (ja) Ｅｃｒプラズマを用いた反応性スパッタリングによる金型の離型処理方法
JP2603919B2 (ja) 立方晶系窒化ホウ素の結晶粒を含む窒化ホウ素膜の作製方法
JP2504255B2 (ja) 窒化ホウ素薄膜の形成方法
JP2611522B2 (ja) 窒化ホウ素薄膜の形成方法
JPH04285154A (ja) 炭素薄膜の作成方法
JPH0397847A (ja) 窒化ホウ素膜の形成方法
JPS60127299A (ja) ダイヤモンドの気相合成法
JPS60223113A (ja) 薄膜形成方法
JP4408505B2 (ja) ダイヤモンドライクカーボン膜の形成方法と装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term