JPS60168104A - 電子ビ−ム露光方法 - Google Patents

電子ビ−ム露光方法

Info

Publication number
JPS60168104A
JPS60168104A JP59023962A JP2396284A JPS60168104A JP S60168104 A JPS60168104 A JP S60168104A JP 59023962 A JP59023962 A JP 59023962A JP 2396284 A JP2396284 A JP 2396284A JP S60168104 A JPS60168104 A JP S60168104A
Authority
JP
Japan
Prior art keywords
electron beam
respect
exposure method
resist
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59023962A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0466321B2 (enrdf_load_stackoverflow
Inventor
Mamoru Nakasuji
護 中筋
Yoshio Suzuki
鈴木　美雄
Izumi Kasahara
笠原　泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP59023962A priority Critical patent/JPS60168104A/ja
Publication of JPS60168104A publication Critical patent/JPS60168104A/ja
Publication of JPH0466321B2 publication Critical patent/JPH0466321B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Electron Beam Exposure (AREA)
JP59023962A 1984-02-10 1984-02-10 電子ビ−ム露光方法 Granted JPS60168104A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59023962A JPS60168104A (ja) 1984-02-10 1984-02-10 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59023962A JPS60168104A (ja) 1984-02-10 1984-02-10 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS60168104A true JPS60168104A (ja) 1985-08-31
JPH0466321B2 JPH0466321B2 (enrdf_load_stackoverflow) 1992-10-22

Family

ID=12125171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59023962A Granted JPS60168104A (ja) 1984-02-10 1984-02-10 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS60168104A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01168881A (ja) * 1987-12-23 1989-07-04 Anelva Corp 走査系を備えたイオンビーム照射方法および装置
JPH0243555A (ja) * 1988-08-03 1990-02-14 Kuraray Co Ltd パターン形成方法および露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01168881A (ja) * 1987-12-23 1989-07-04 Anelva Corp 走査系を備えたイオンビーム照射方法および装置
JPH0243555A (ja) * 1988-08-03 1990-02-14 Kuraray Co Ltd パターン形成方法および露光装置

Also Published As

Publication number Publication date
JPH0466321B2 (enrdf_load_stackoverflow) 1992-10-22

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