JPS60153982A - 表面洗浄方法 - Google Patents

表面洗浄方法

Info

Publication number
JPS60153982A
JPS60153982A JP863084A JP863084A JPS60153982A JP S60153982 A JPS60153982 A JP S60153982A JP 863084 A JP863084 A JP 863084A JP 863084 A JP863084 A JP 863084A JP S60153982 A JPS60153982 A JP S60153982A
Authority
JP
Japan
Prior art keywords
ozone
cleaning
water
ultraviolet
cleaning effect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP863084A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0466628B2 (enrdf_load_stackoverflow
Inventor
信好 海賀
巨太郎 居安
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP863084A priority Critical patent/JPS60153982A/ja
Publication of JPS60153982A publication Critical patent/JPS60153982A/ja
Publication of JPH0466628B2 publication Critical patent/JPH0466628B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Cleaning In General (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP863084A 1984-01-23 1984-01-23 表面洗浄方法 Granted JPS60153982A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP863084A JPS60153982A (ja) 1984-01-23 1984-01-23 表面洗浄方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP863084A JPS60153982A (ja) 1984-01-23 1984-01-23 表面洗浄方法

Publications (2)

Publication Number Publication Date
JPS60153982A true JPS60153982A (ja) 1985-08-13
JPH0466628B2 JPH0466628B2 (enrdf_load_stackoverflow) 1992-10-23

Family

ID=11698268

Family Applications (1)

Application Number Title Priority Date Filing Date
JP863084A Granted JPS60153982A (ja) 1984-01-23 1984-01-23 表面洗浄方法

Country Status (1)

Country Link
JP (1) JPS60153982A (enrdf_load_stackoverflow)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6333824A (ja) * 1986-07-28 1988-02-13 Dainippon Screen Mfg Co Ltd 表面洗浄方法
JPH01140727A (ja) * 1987-11-27 1989-06-01 Dainippon Screen Mfg Co Ltd 基板洗浄方法
JPH04179225A (ja) * 1990-11-14 1992-06-25 Ebara Res Co Ltd 洗浄方法
US5269850A (en) * 1989-12-20 1993-12-14 Hughes Aircraft Company Method of removing organic flux using peroxide composition
EP0722741A3 (en) * 1988-05-05 1996-11-13 Elopak Systems Sterilization
US5695570A (en) * 1991-02-28 1997-12-09 Texas Instruments Incorporated Method for the photo-stimulated removal of trace metals from a semiconductor surface
WO2000039025A1 (en) * 1998-12-28 2000-07-06 Daewoo Electronics Co., Ltd. Radical generating system
WO2001078793A1 (en) * 2000-04-12 2001-10-25 Purizer Corporation Sterilization process for air, liquid and surfaces
CN104195575A (zh) * 2014-08-27 2014-12-10 富乐德科技发展（天津）有限公司 去除附着于金属零件表面TiN及Ti薄膜的清洗方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320375A (en) * 1976-08-10 1978-02-24 Toshiba Corp Cleaning method of turbidimeter
JPS57180132A (en) * 1981-04-30 1982-11-06 Fujitsu Ltd Washing method of substrate
JPS58210538A (ja) * 1982-05-31 1983-12-07 Mitsubishi Electric Corp 水質センサ−用採水装置
JPS60143884A (ja) * 1983-12-28 1985-07-30 富士通株式会社 洗浄方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320375A (en) * 1976-08-10 1978-02-24 Toshiba Corp Cleaning method of turbidimeter
JPS57180132A (en) * 1981-04-30 1982-11-06 Fujitsu Ltd Washing method of substrate
JPS58210538A (ja) * 1982-05-31 1983-12-07 Mitsubishi Electric Corp 水質センサ−用採水装置
JPS60143884A (ja) * 1983-12-28 1985-07-30 富士通株式会社 洗浄方法

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6333824A (ja) * 1986-07-28 1988-02-13 Dainippon Screen Mfg Co Ltd 表面洗浄方法
JPH01140727A (ja) * 1987-11-27 1989-06-01 Dainippon Screen Mfg Co Ltd 基板洗浄方法
EP0722741A3 (en) * 1988-05-05 1996-11-13 Elopak Systems Sterilization
EP1080734A3 (en) * 1988-05-05 2001-04-11 Elopak Systems Ag Sterilization
US5269850A (en) * 1989-12-20 1993-12-14 Hughes Aircraft Company Method of removing organic flux using peroxide composition
JPH04179225A (ja) * 1990-11-14 1992-06-25 Ebara Res Co Ltd 洗浄方法
US5695570A (en) * 1991-02-28 1997-12-09 Texas Instruments Incorporated Method for the photo-stimulated removal of trace metals from a semiconductor surface
WO2000039025A1 (en) * 1998-12-28 2000-07-06 Daewoo Electronics Co., Ltd. Radical generating system
US6303085B1 (en) 1998-12-28 2001-10-16 Daewoo Electronics Co., Ltd. Radical generating system
AU764349B2 (en) * 1998-12-28 2003-08-14 Daewoo Electronics Corporation Radical generating system
WO2001078793A1 (en) * 2000-04-12 2001-10-25 Purizer Corporation Sterilization process for air, liquid and surfaces
CN104195575A (zh) * 2014-08-27 2014-12-10 富乐德科技发展（天津）有限公司 去除附着于金属零件表面TiN及Ti薄膜的清洗方法

Also Published As

Publication number Publication date
JPH0466628B2 (enrdf_load_stackoverflow) 1992-10-23

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