JPS60153982A - 表面洗浄方法 - Google Patents
表面洗浄方法Info
- Publication number
- JPS60153982A JPS60153982A JP863084A JP863084A JPS60153982A JP S60153982 A JPS60153982 A JP S60153982A JP 863084 A JP863084 A JP 863084A JP 863084 A JP863084 A JP 863084A JP S60153982 A JPS60153982 A JP S60153982A
- Authority
- JP
- Japan
- Prior art keywords
- ozone
- cleaning
- water
- ultraviolet
- cleaning effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 14
- 238000005406 washing Methods 0.000 title description 6
- 238000004140 cleaning Methods 0.000 claims description 43
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 38
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 37
- 239000000356 contaminant Substances 0.000 claims description 12
- 230000000694 effects Effects 0.000 description 23
- 239000011521 glass Substances 0.000 description 16
- 239000007789 gas Substances 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 239000003344 environmental pollutant Substances 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 231100000719 pollutant Toxicity 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 235000014593 oils and fats Nutrition 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 235000019504 cigarettes Nutrition 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 239000010730 cutting oil Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N hydrogen peroxide Substances OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002957 persistent organic pollutant Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Cleaning In General (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP863084A JPS60153982A (ja) | 1984-01-23 | 1984-01-23 | 表面洗浄方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP863084A JPS60153982A (ja) | 1984-01-23 | 1984-01-23 | 表面洗浄方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60153982A true JPS60153982A (ja) | 1985-08-13 |
| JPH0466628B2 JPH0466628B2 (enrdf_load_stackoverflow) | 1992-10-23 |
Family
ID=11698268
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP863084A Granted JPS60153982A (ja) | 1984-01-23 | 1984-01-23 | 表面洗浄方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60153982A (enrdf_load_stackoverflow) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6333824A (ja) * | 1986-07-28 | 1988-02-13 | Dainippon Screen Mfg Co Ltd | 表面洗浄方法 |
| JPH01140727A (ja) * | 1987-11-27 | 1989-06-01 | Dainippon Screen Mfg Co Ltd | 基板洗浄方法 |
| JPH04179225A (ja) * | 1990-11-14 | 1992-06-25 | Ebara Res Co Ltd | 洗浄方法 |
| US5269850A (en) * | 1989-12-20 | 1993-12-14 | Hughes Aircraft Company | Method of removing organic flux using peroxide composition |
| EP0722741A3 (en) * | 1988-05-05 | 1996-11-13 | Elopak Systems | Sterilization |
| US5695570A (en) * | 1991-02-28 | 1997-12-09 | Texas Instruments Incorporated | Method for the photo-stimulated removal of trace metals from a semiconductor surface |
| WO2000039025A1 (en) * | 1998-12-28 | 2000-07-06 | Daewoo Electronics Co., Ltd. | Radical generating system |
| WO2001078793A1 (en) * | 2000-04-12 | 2001-10-25 | Purizer Corporation | Sterilization process for air, liquid and surfaces |
| CN104195575A (zh) * | 2014-08-27 | 2014-12-10 | 富乐德科技发展（天津）有限公司 | 去除附着于金属零件表面TiN及Ti薄膜的清洗方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5320375A (en) * | 1976-08-10 | 1978-02-24 | Toshiba Corp | Cleaning method of turbidimeter |
| JPS57180132A (en) * | 1981-04-30 | 1982-11-06 | Fujitsu Ltd | Washing method of substrate |
| JPS58210538A (ja) * | 1982-05-31 | 1983-12-07 | Mitsubishi Electric Corp | 水質センサ−用採水装置 |
| JPS60143884A (ja) * | 1983-12-28 | 1985-07-30 | 富士通株式会社 | 洗浄方法 |
-
1984
- 1984-01-23 JP JP863084A patent/JPS60153982A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5320375A (en) * | 1976-08-10 | 1978-02-24 | Toshiba Corp | Cleaning method of turbidimeter |
| JPS57180132A (en) * | 1981-04-30 | 1982-11-06 | Fujitsu Ltd | Washing method of substrate |
| JPS58210538A (ja) * | 1982-05-31 | 1983-12-07 | Mitsubishi Electric Corp | 水質センサ−用採水装置 |
| JPS60143884A (ja) * | 1983-12-28 | 1985-07-30 | 富士通株式会社 | 洗浄方法 |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6333824A (ja) * | 1986-07-28 | 1988-02-13 | Dainippon Screen Mfg Co Ltd | 表面洗浄方法 |
| JPH01140727A (ja) * | 1987-11-27 | 1989-06-01 | Dainippon Screen Mfg Co Ltd | 基板洗浄方法 |
| EP0722741A3 (en) * | 1988-05-05 | 1996-11-13 | Elopak Systems | Sterilization |
| EP1080734A3 (en) * | 1988-05-05 | 2001-04-11 | Elopak Systems Ag | Sterilization |
| US5269850A (en) * | 1989-12-20 | 1993-12-14 | Hughes Aircraft Company | Method of removing organic flux using peroxide composition |
| JPH04179225A (ja) * | 1990-11-14 | 1992-06-25 | Ebara Res Co Ltd | 洗浄方法 |
| US5695570A (en) * | 1991-02-28 | 1997-12-09 | Texas Instruments Incorporated | Method for the photo-stimulated removal of trace metals from a semiconductor surface |
| WO2000039025A1 (en) * | 1998-12-28 | 2000-07-06 | Daewoo Electronics Co., Ltd. | Radical generating system |
| US6303085B1 (en) | 1998-12-28 | 2001-10-16 | Daewoo Electronics Co., Ltd. | Radical generating system |
| AU764349B2 (en) * | 1998-12-28 | 2003-08-14 | Daewoo Electronics Corporation | Radical generating system |
| WO2001078793A1 (en) * | 2000-04-12 | 2001-10-25 | Purizer Corporation | Sterilization process for air, liquid and surfaces |
| CN104195575A (zh) * | 2014-08-27 | 2014-12-10 | 富乐德科技发展（天津）有限公司 | 去除附着于金属零件表面TiN及Ti薄膜的清洗方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0466628B2 (enrdf_load_stackoverflow) | 1992-10-23 |
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