JPS60152677A - 立方晶窒化硼素被覆硬質体の製造方法 - Google Patents
立方晶窒化硼素被覆硬質体の製造方法Info
- Publication number
- JPS60152677A JPS60152677A JP704384A JP704384A JPS60152677A JP S60152677 A JPS60152677 A JP S60152677A JP 704384 A JP704384 A JP 704384A JP 704384 A JP704384 A JP 704384A JP S60152677 A JPS60152677 A JP S60152677A
- Authority
- JP
- Japan
- Prior art keywords
- boron nitride
- coated
- cubic boron
- hard body
- hard
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052582 BN Inorganic materials 0.000 title claims description 29
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims description 29
- 238000000034 method Methods 0.000 title claims description 10
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000000758 substrate Substances 0.000 claims description 22
- 239000011247 coating layer Substances 0.000 claims description 15
- 239000010410 layer Substances 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 6
- 229910052796 boron Inorganic materials 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 150000001247 metal acetylides Chemical class 0.000 claims description 6
- 239000011230 binding agent Substances 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 4
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 230000000737 periodic effect Effects 0.000 claims description 4
- 150000002739 metals Chemical class 0.000 claims description 3
- 239000012808 vapor phase Substances 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 description 18
- 239000000463 material Substances 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000012071 phase Substances 0.000 description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 101100026210 Drosophila melanogaster Clbn gene Proteins 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- -1 iron group metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000010587 phase diagram Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/342—Boron nitride
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/148—Composition of the cutting inserts
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP704384A JPS60152677A (ja) | 1984-01-20 | 1984-01-20 | 立方晶窒化硼素被覆硬質体の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP704384A JPS60152677A (ja) | 1984-01-20 | 1984-01-20 | 立方晶窒化硼素被覆硬質体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60152677A true JPS60152677A (ja) | 1985-08-10 |
| JPH0542509B2 JPH0542509B2 (enrdf_load_stackoverflow) | 1993-06-28 |
Family
ID=11655019
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP704384A Granted JPS60152677A (ja) | 1984-01-20 | 1984-01-20 | 立方晶窒化硼素被覆硬質体の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60152677A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0297677A (ja) * | 1988-06-13 | 1990-04-10 | Sandvik Ab | 被覆工程で脱炭可能な基体の被覆体 |
| US4971851A (en) * | 1984-02-13 | 1990-11-20 | Hewlett-Packard Company | Silicon carbide film for X-ray masks and vacuum windows |
| US5137772A (en) * | 1987-03-27 | 1992-08-11 | Nihon Sinku Gijutsu Kabusiki Kaisha | Body coated with cubic boron nitride and method for manufacturing the same |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5775744A (en) * | 1980-10-31 | 1982-05-12 | Toshiba Tungaloy Co Ltd | Tool containing and coated with dispersed material |
| JPS6063372A (ja) * | 1983-09-19 | 1985-04-11 | Agency Of Ind Science & Technol | 高硬度窒化ホウ素薄膜の製造方法 |
-
1984
- 1984-01-20 JP JP704384A patent/JPS60152677A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5775744A (en) * | 1980-10-31 | 1982-05-12 | Toshiba Tungaloy Co Ltd | Tool containing and coated with dispersed material |
| JPS6063372A (ja) * | 1983-09-19 | 1985-04-11 | Agency Of Ind Science & Technol | 高硬度窒化ホウ素薄膜の製造方法 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4971851A (en) * | 1984-02-13 | 1990-11-20 | Hewlett-Packard Company | Silicon carbide film for X-ray masks and vacuum windows |
| US5137772A (en) * | 1987-03-27 | 1992-08-11 | Nihon Sinku Gijutsu Kabusiki Kaisha | Body coated with cubic boron nitride and method for manufacturing the same |
| JPH0297677A (ja) * | 1988-06-13 | 1990-04-10 | Sandvik Ab | 被覆工程で脱炭可能な基体の被覆体 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0542509B2 (enrdf_load_stackoverflow) | 1993-06-28 |
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