JPS60149783A - 選択的メツキ方法 - Google Patents
選択的メツキ方法Info
- Publication number
- JPS60149783A JPS60149783A JP611784A JP611784A JPS60149783A JP S60149783 A JPS60149783 A JP S60149783A JP 611784 A JP611784 A JP 611784A JP 611784 A JP611784 A JP 611784A JP S60149783 A JPS60149783 A JP S60149783A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- selective
- fluid
- plating method
- chemical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
- C23C18/1608—Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
- C23C18/1612—Process or apparatus coating on selected surface areas by direct patterning through irradiation means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemically Coating (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP611784A JPS60149783A (ja) | 1984-01-17 | 1984-01-17 | 選択的メツキ方法 |
| US06/691,877 US4639378A (en) | 1984-01-17 | 1985-01-16 | Auto-selective metal deposition on dielectric surfaces |
| EP85100466A EP0151413A3 (en) | 1984-01-17 | 1985-01-17 | Auto-selective metal deposition on dielectric surfaces |
| US06/882,498 US4822633A (en) | 1984-01-17 | 1986-07-07 | Auto-selective metal deposition on dielectric surfaces |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP611784A JPS60149783A (ja) | 1984-01-17 | 1984-01-17 | 選択的メツキ方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60149783A true JPS60149783A (ja) | 1985-08-07 |
| JPH0534428B2 JPH0534428B2 (enExample) | 1993-05-24 |
Family
ID=11629560
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP611784A Granted JPS60149783A (ja) | 1984-01-17 | 1984-01-17 | 選択的メツキ方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60149783A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63262476A (ja) * | 1987-04-17 | 1988-10-28 | Meiban Kogei Kk | パタ−ンの形成方法 |
| JPH0681153A (ja) * | 1992-03-10 | 1994-03-22 | Internatl Business Mach Corp <Ibm> | レーザによる金属の析出方法 |
| JPWO2017187930A1 (ja) * | 2016-04-26 | 2019-02-07 | 株式会社村田製作所 | セラミック電子部品の製造方法 |
| KR20190046821A (ko) * | 2016-09-13 | 2019-05-07 | 발스티비니스 모크슬리니우 티리무 인스티투타스 피지니우 아이알 테크놀로기요스 모크슬루 첸트라스 | 폴리머 물품 표면 상에 전기-전도성 트레이스들의 형성을 위한 방법 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4920030A (enExample) * | 1972-06-15 | 1974-02-22 | ||
| JPS515626A (en) * | 1974-07-04 | 1976-01-17 | Matsushita Electric Industrial Co Ltd | Ryuryoseigyoki |
| JPS5362176A (en) * | 1976-11-15 | 1978-06-03 | Nippon Telegraph & Telephone | Method of forming printed circuit |
| JPS5562156A (en) * | 1978-10-27 | 1980-05-10 | Schering Ag | Manufacture of metal pattern on electric insulating supporter by photochemical method |
| JPS55148797A (en) * | 1979-05-08 | 1980-11-19 | Ibm | Selective electroplating method |
-
1984
- 1984-01-17 JP JP611784A patent/JPS60149783A/ja active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4920030A (enExample) * | 1972-06-15 | 1974-02-22 | ||
| JPS515626A (en) * | 1974-07-04 | 1976-01-17 | Matsushita Electric Industrial Co Ltd | Ryuryoseigyoki |
| JPS5362176A (en) * | 1976-11-15 | 1978-06-03 | Nippon Telegraph & Telephone | Method of forming printed circuit |
| JPS5562156A (en) * | 1978-10-27 | 1980-05-10 | Schering Ag | Manufacture of metal pattern on electric insulating supporter by photochemical method |
| JPS55148797A (en) * | 1979-05-08 | 1980-11-19 | Ibm | Selective electroplating method |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63262476A (ja) * | 1987-04-17 | 1988-10-28 | Meiban Kogei Kk | パタ−ンの形成方法 |
| JPH0681153A (ja) * | 1992-03-10 | 1994-03-22 | Internatl Business Mach Corp <Ibm> | レーザによる金属の析出方法 |
| JPWO2017187930A1 (ja) * | 2016-04-26 | 2019-02-07 | 株式会社村田製作所 | セラミック電子部品の製造方法 |
| US11821090B2 (en) | 2016-04-26 | 2023-11-21 | Murata Manufacturing Co., Ltd. | Method of manufacturing ceramic electronic component |
| KR20190046821A (ko) * | 2016-09-13 | 2019-05-07 | 발스티비니스 모크슬리니우 티리무 인스티투타스 피지니우 아이알 테크놀로기요스 모크슬루 첸트라스 | 폴리머 물품 표면 상에 전기-전도성 트레이스들의 형성을 위한 방법 |
| JP2019526711A (ja) * | 2016-09-13 | 2019-09-19 | バルスティビニス モクスリニウ トリム インスティチュータス フィジニウ アイアール テクノロジジョス モクスル セントラス | ポリマー物品表面に導電性トレースを形成する方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0534428B2 (enExample) | 1993-05-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4822633A (en) | Auto-selective metal deposition on dielectric surfaces | |
| JP3153682B2 (ja) | 回路板の製造方法 | |
| US8529738B2 (en) | In situ plating and etching of materials covered with a surface film | |
| US4349583A (en) | Laser enhanced maskless method for plating and simultaneous plating and etching of patterns | |
| US4981715A (en) | Method of patterning electroless plated metal on a polymer substrate | |
| US4432855A (en) | Automated system for laser mask definition for laser enhanced and conventional plating and etching | |
| DE3002166C2 (enExample) | ||
| US20110042201A1 (en) | In situ Plating And Soldering Of Materials Covered With A Surface Film | |
| JP3493703B2 (ja) | 回路板の形成方法 | |
| US5084299A (en) | Method for patterning electroless plated metal on a polymer substrate | |
| JPH01500472A (ja) | 印刷回路板の製造方法 | |
| EP0098346B1 (en) | A method for depositing a metal layer on polyesters | |
| JP2005022956A (ja) | セラミックの金属化 | |
| JPH07506770A (ja) | 多孔フォイルの製造方法 | |
| JPH07180089A (ja) | 電気鍍金方法及び構成 | |
| JPH0326816B2 (enExample) | ||
| JPH10507229A (ja) | 連結された金属構造の層を電気的に非伝導性の表面に形成するための方法 | |
| US20040206629A1 (en) | Method for the selectively electroplating a strip-shaped, metal support material | |
| JPS60149782A (ja) | 選択的メツキ方法 | |
| JPH0534428B2 (enExample) | ||
| DD157989A3 (de) | Verfahren zur strukturierten chemisch-reduktiven metallabscheidung | |
| JPH02190474A (ja) | 金属化のための基板の処理方法 | |
| US6960282B2 (en) | Apparatus for cleaning residual material from an article | |
| CN117604586A (zh) | 激光-电化学沉积制备耐磨金属表面的方法及系统 | |
| JPH0480374A (ja) | プリント配線板の製造方法 |