JPS60149133U - エツチングモニタ− - Google Patents

エツチングモニタ−

Info

Publication number
JPS60149133U
JPS60149133U JP3492984U JP3492984U JPS60149133U JP S60149133 U JPS60149133 U JP S60149133U JP 3492984 U JP3492984 U JP 3492984U JP 3492984 U JP3492984 U JP 3492984U JP S60149133 U JPS60149133 U JP S60149133U
Authority
JP
Japan
Prior art keywords
etching
vacuum chamber
sensor
etching monitor
sensors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3492984U
Other languages
English (en)
Japanese (ja)
Other versions
JPH056655Y2 (enrdf_load_stackoverflow
Inventor
正志 菊池
Original Assignee
日本真空技術株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本真空技術株式会社 filed Critical 日本真空技術株式会社
Priority to JP3492984U priority Critical patent/JPS60149133U/ja
Publication of JPS60149133U publication Critical patent/JPS60149133U/ja
Application granted granted Critical
Publication of JPH056655Y2 publication Critical patent/JPH056655Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Drying Of Semiconductors (AREA)
JP3492984U 1984-03-13 1984-03-13 エツチングモニタ− Granted JPS60149133U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3492984U JPS60149133U (ja) 1984-03-13 1984-03-13 エツチングモニタ−

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3492984U JPS60149133U (ja) 1984-03-13 1984-03-13 エツチングモニタ−

Publications (2)

Publication Number Publication Date
JPS60149133U true JPS60149133U (ja) 1985-10-03
JPH056655Y2 JPH056655Y2 (enrdf_load_stackoverflow) 1993-02-19

Family

ID=30538752

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3492984U Granted JPS60149133U (ja) 1984-03-13 1984-03-13 エツチングモニタ−

Country Status (1)

Country Link
JP (1) JPS60149133U (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61206226A (ja) * 1985-03-11 1986-09-12 Hitachi Ltd ドライエッチング装置
JP2006313847A (ja) * 2005-05-09 2006-11-16 Hitachi High-Technologies Corp プラズマ発光測定システム

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55128584A (en) * 1979-03-27 1980-10-04 Mitsubishi Electric Corp Plasma etching device
JPS56130473A (en) * 1980-03-14 1981-10-13 Hitachi Ltd Dry etching apparatus
JPS5745254A (en) * 1980-09-01 1982-03-15 Nippon Telegr & Teleph Corp <Ntt> Automatic detector for amount of silicon wafer worked
JPS57102022A (en) * 1980-12-17 1982-06-24 Nec Corp Reactive sputter etching equipment
JPS58216423A (ja) * 1982-06-10 1983-12-16 Hitachi Ltd エツチング終点検出装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55128584A (en) * 1979-03-27 1980-10-04 Mitsubishi Electric Corp Plasma etching device
JPS56130473A (en) * 1980-03-14 1981-10-13 Hitachi Ltd Dry etching apparatus
JPS5745254A (en) * 1980-09-01 1982-03-15 Nippon Telegr & Teleph Corp <Ntt> Automatic detector for amount of silicon wafer worked
JPS57102022A (en) * 1980-12-17 1982-06-24 Nec Corp Reactive sputter etching equipment
JPS58216423A (ja) * 1982-06-10 1983-12-16 Hitachi Ltd エツチング終点検出装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61206226A (ja) * 1985-03-11 1986-09-12 Hitachi Ltd ドライエッチング装置
JP2006313847A (ja) * 2005-05-09 2006-11-16 Hitachi High-Technologies Corp プラズマ発光測定システム

Also Published As

Publication number Publication date
JPH056655Y2 (enrdf_load_stackoverflow) 1993-02-19

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