JPS56130473A - Dry etching apparatus - Google Patents

Dry etching apparatus

Info

Publication number
JPS56130473A
JPS56130473A JP3157380A JP3157380A JPS56130473A JP S56130473 A JPS56130473 A JP S56130473A JP 3157380 A JP3157380 A JP 3157380A JP 3157380 A JP3157380 A JP 3157380A JP S56130473 A JPS56130473 A JP S56130473A
Authority
JP
Japan
Prior art keywords
voltage
treatment
substances
substance
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3157380A
Other languages
Japanese (ja)
Inventor
Toru Otsubo
Susumu Aiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3157380A priority Critical patent/JPS56130473A/en
Publication of JPS56130473A publication Critical patent/JPS56130473A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To uniformize progress of treatment among substances to be treated by detecting the treatment conditions of the substances one by one and individually stopping the treatment at the end.
CONSTITUTION: Treatment chamber 1 is evacuated by suction from pipe 14, and an etching gas is introduced into chamber 1 from feed pipe 13. By supplying power to electrode table 6 from high frequency power source 27, glow discharge is generated between table 6 and electrode 11 to etch substances 30. The light of generated plasma is captured with lens system 16 through lighting window 9 and sent to spectroscopic analyzer 18 through light guide 17. In analyzer 18 a predetermined wavelength is converted into voltage, and this voltage is applied to end detecting circuit 20, where it is compared to the reference voltage. When both the voltages agree with each other or the applied voltage is lower than the reference voltage, a signal is given to shutter driving circuit 26 to drive solenoid 22, and shutter 25 is moved to an upper part of substance 30 to cover the etched surface, thereby stopping the further progress of etching. This operation is carried out for each substance 30.
COPYRIGHT: (C)1981,JPO&Japio
JP3157380A 1980-03-14 1980-03-14 Dry etching apparatus Pending JPS56130473A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3157380A JPS56130473A (en) 1980-03-14 1980-03-14 Dry etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3157380A JPS56130473A (en) 1980-03-14 1980-03-14 Dry etching apparatus

Publications (1)

Publication Number Publication Date
JPS56130473A true JPS56130473A (en) 1981-10-13

Family

ID=12334910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3157380A Pending JPS56130473A (en) 1980-03-14 1980-03-14 Dry etching apparatus

Country Status (1)

Country Link
JP (1) JPS56130473A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5965433A (en) * 1982-10-06 1984-04-13 Hitachi Ltd Detection device for finish of etching
JPS60149133U (en) * 1984-03-13 1985-10-03 日本真空技術株式会社 Etching monitor
JPS61206226A (en) * 1985-03-11 1986-09-12 Hitachi Ltd Plasma monitor
KR100607414B1 (en) * 2000-05-17 2006-08-01 삼성전자주식회사 Etching apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5965433A (en) * 1982-10-06 1984-04-13 Hitachi Ltd Detection device for finish of etching
JPS60149133U (en) * 1984-03-13 1985-10-03 日本真空技術株式会社 Etching monitor
JPH056655Y2 (en) * 1984-03-13 1993-02-19
JPS61206226A (en) * 1985-03-11 1986-09-12 Hitachi Ltd Plasma monitor
JPH0574932B2 (en) * 1985-03-11 1993-10-19 Hitachi Ltd
KR100607414B1 (en) * 2000-05-17 2006-08-01 삼성전자주식회사 Etching apparatus

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