JPS60148116A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS60148116A
JPS60148116A JP59004111A JP411184A JPS60148116A JP S60148116 A JPS60148116 A JP S60148116A JP 59004111 A JP59004111 A JP 59004111A JP 411184 A JP411184 A JP 411184A JP S60148116 A JPS60148116 A JP S60148116A
Authority
JP
Japan
Prior art keywords
resist
pattern
film
processed
chromium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59004111A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0438131B2 (enExample
Inventor
Yoshikazu Tsujino
辻野　嘉一
Yuji Hamada
祐次 浜田
Hisao Mori
久雄 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd, Sanyo Denki Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP59004111A priority Critical patent/JPS60148116A/ja
Publication of JPS60148116A publication Critical patent/JPS60148116A/ja
Publication of JPH0438131B2 publication Critical patent/JPH0438131B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59004111A 1984-01-12 1984-01-12 パタ−ン形成方法 Granted JPS60148116A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59004111A JPS60148116A (ja) 1984-01-12 1984-01-12 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59004111A JPS60148116A (ja) 1984-01-12 1984-01-12 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS60148116A true JPS60148116A (ja) 1985-08-05
JPH0438131B2 JPH0438131B2 (enExample) 1992-06-23

Family

ID=11575671

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59004111A Granted JPS60148116A (ja) 1984-01-12 1984-01-12 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS60148116A (enExample)

Also Published As

Publication number Publication date
JPH0438131B2 (enExample) 1992-06-23

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