JPS60146234A - ポジ型感光性樹脂組成物 - Google Patents

ポジ型感光性樹脂組成物

Info

Publication number
JPS60146234A
JPS60146234A JP59002521A JP252184A JPS60146234A JP S60146234 A JPS60146234 A JP S60146234A JP 59002521 A JP59002521 A JP 59002521A JP 252184 A JP252184 A JP 252184A JP S60146234 A JPS60146234 A JP S60146234A
Authority
JP
Japan
Prior art keywords
group
naphthoquinonediazide
sulfonic acid
ethylene glycol
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59002521A
Other languages
English (en)
Japanese (ja)
Other versions
JPH045378B2 (enrdf_load_stackoverflow
Inventor
Yukihiro Hosaka
幸宏 保坂
Takao Miura
孝夫 三浦
Yoshiyuki Harita
榛田 善行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
JSR Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd, Japan Synthetic Rubber Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP59002521A priority Critical patent/JPS60146234A/ja
Priority to EP85300184A priority patent/EP0148787A3/en
Publication of JPS60146234A publication Critical patent/JPS60146234A/ja
Publication of JPH045378B2 publication Critical patent/JPH045378B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59002521A 1984-01-10 1984-01-10 ポジ型感光性樹脂組成物 Granted JPS60146234A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59002521A JPS60146234A (ja) 1984-01-10 1984-01-10 ポジ型感光性樹脂組成物
EP85300184A EP0148787A3 (en) 1984-01-10 1985-01-10 Positive type photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59002521A JPS60146234A (ja) 1984-01-10 1984-01-10 ポジ型感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS60146234A true JPS60146234A (ja) 1985-08-01
JPH045378B2 JPH045378B2 (enrdf_load_stackoverflow) 1992-01-31

Family

ID=11531676

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59002521A Granted JPS60146234A (ja) 1984-01-10 1984-01-10 ポジ型感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS60146234A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62150245A (ja) * 1985-12-24 1987-07-04 Japan Synthetic Rubber Co Ltd 集積回路作製用ポジ型レジスト
JPS63113451A (ja) * 1986-10-30 1988-05-18 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH09311441A (ja) * 1995-10-14 1997-12-02 Kunhoseokyuiiwahaku Jushikuhesa ポジティブ型フォトレジスト組成物

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62150245A (ja) * 1985-12-24 1987-07-04 Japan Synthetic Rubber Co Ltd 集積回路作製用ポジ型レジスト
JPS63113451A (ja) * 1986-10-30 1988-05-18 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH09311441A (ja) * 1995-10-14 1997-12-02 Kunhoseokyuiiwahaku Jushikuhesa ポジティブ型フォトレジスト組成物

Also Published As

Publication number Publication date
JPH045378B2 (enrdf_load_stackoverflow) 1992-01-31

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