JPS60116175A - Mis電界効果半導体装置の製造方法 - Google Patents
Mis電界効果半導体装置の製造方法Info
- Publication number
- JPS60116175A JPS60116175A JP58225060A JP22506083A JPS60116175A JP S60116175 A JPS60116175 A JP S60116175A JP 58225060 A JP58225060 A JP 58225060A JP 22506083 A JP22506083 A JP 22506083A JP S60116175 A JPS60116175 A JP S60116175A
- Authority
- JP
- Japan
- Prior art keywords
- film
- gate electrode
- melting point
- metal film
- point metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58225060A JPS60116175A (ja) | 1983-11-29 | 1983-11-29 | Mis電界効果半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58225060A JPS60116175A (ja) | 1983-11-29 | 1983-11-29 | Mis電界効果半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60116175A true JPS60116175A (ja) | 1985-06-22 |
JPH0580820B2 JPH0580820B2 (enrdf_load_stackoverflow) | 1993-11-10 |
Family
ID=16823409
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58225060A Granted JPS60116175A (ja) | 1983-11-29 | 1983-11-29 | Mis電界効果半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60116175A (enrdf_load_stackoverflow) |
-
1983
- 1983-11-29 JP JP58225060A patent/JPS60116175A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0580820B2 (enrdf_load_stackoverflow) | 1993-11-10 |
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