JPS60111038U - vacuum chuck - Google Patents
vacuum chuckInfo
- Publication number
- JPS60111038U JPS60111038U JP19968983U JP19968983U JPS60111038U JP S60111038 U JPS60111038 U JP S60111038U JP 19968983 U JP19968983 U JP 19968983U JP 19968983 U JP19968983 U JP 19968983U JP S60111038 U JPS60111038 U JP S60111038U
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chuck
- wafer
- chuck
- wafer suction
- rubber material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Jigs For Machine Tools (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来のウェハーステッパーを説明スるための図
、第２図は従来のウェハーステッパーに用いられている
真空チャックを説明するための図、第３図は本考案によ
る真空チャックを説明するための図、第４図はその作用
を説明するための図である。
図面において、１０は真空チャック本体、１１は多孔質
ゴム系材料、１２は真空吸引用の通路、１３は真空吸引
用のパイプ、１４はウェハー、１５はゴミ等の異物をそ
れぞれ示す。Figure 1 is a diagram for explaining a conventional wafer stepper, Figure 2 is a diagram for explaining a vacuum chuck used in a conventional wafer stepper, and Figure 3 is a diagram for explaining a vacuum chuck according to the present invention. FIG. 4 is a diagram for explaining its operation. In the drawings, 10 is a vacuum chuck main body, 11 is a porous rubber material, 12 is a passage for vacuum suction, 13 is a pipe for vacuum suction, 14 is a wafer, and 15 is a foreign object such as dust.
Claims (1)
ェハー吸着用真空チャックにおいて、該チャックのウェ
ハー吸着面を多孔質ゴム系材料で形成したことを特徴と
する真空チャック。A vacuum chuck for wafer suction used in a wafer stepper for manufacturing semiconductor devices, characterized in that a wafer suction surface of the chuck is formed of a porous rubber material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19968983U JPS60111038U (en) | 1983-12-29 | 1983-12-29 | vacuum chuck |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19968983U JPS60111038U (en) | 1983-12-29 | 1983-12-29 | vacuum chuck |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60111038U true JPS60111038U (en) | 1985-07-27 |
Family
ID=30759842
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19968983U Pending JPS60111038U (en) | 1983-12-29 | 1983-12-29 | vacuum chuck |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60111038U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002246300A (en) * | 2001-02-20 | 2002-08-30 | Seiko Instruments Inc | Apparatus for manufacturing semiconductor |
| JP2015088510A (en) * | 2013-10-28 | 2015-05-07 | 凸版印刷株式会社 | Euv exposure device, protective coat, and exposure method of euv mask |
-
1983
- 1983-12-29 JP JP19968983U patent/JPS60111038U/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002246300A (en) * | 2001-02-20 | 2002-08-30 | Seiko Instruments Inc | Apparatus for manufacturing semiconductor |
| JP4567216B2 (en) * | 2001-02-20 | 2010-10-20 | セイコーインスツル株式会社 | Semiconductor manufacturing equipment |
| JP2015088510A (en) * | 2013-10-28 | 2015-05-07 | 凸版印刷株式会社 | Euv exposure device, protective coat, and exposure method of euv mask |
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