JPS59171338U - Container for cleaning semiconductor wafers - Google Patents
Container for cleaning semiconductor wafersInfo
- Publication number
- JPS59171338U JPS59171338U JP6561783U JP6561783U JPS59171338U JP S59171338 U JPS59171338 U JP S59171338U JP 6561783 U JP6561783 U JP 6561783U JP 6561783 U JP6561783 U JP 6561783U JP S59171338 U JPS59171338 U JP S59171338U
- Authority
- JP
- Japan
- Prior art keywords
- container
- semiconductor wafers
- cleaning
- cleaning semiconductor
- container body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は本考案の半導体ウェハの洗浄用容器の一実施例
を示す斜視図、第２図はその平面図、第３図は側面図で
ある。
１・・・・・・容器本体、２・・・・・・側壁、３・・
・・・・ダクト。FIG. 1 is a perspective view showing an embodiment of the semiconductor wafer cleaning container of the present invention, FIG. 2 is a plan view thereof, and FIG. 3 is a side view thereof. 1...Container body, 2...Side wall, 3...
····duct.
Claims (1)
半導体ウェハの洗浄用容器において、容器本体１の側壁
２に、その接線方向に突出するよう排気および排液用の
ダクト３を形成したことを特徴とする半導体ウェハの洗
浄用容器。 ２ ダクト３が、容器本体１の側壁２の底部から半分以
上の高さにわたって開口してなる実用新案登録請求の範
囲第１項記載の半導体ウェハの洗浄用容器。 ３ ダクト３が、容器本体１にやや下向き勾配に突設し
てなる実用新案登録請求の範囲第１項または第２項記載
の半導体ウェハの洗浄用容器。[Scope of Claim for Utility Model Registration] 1. In a container for cleaning semiconductor wafers that stores semiconductor wafers and performs processing such as cleaning, a container body 1 has a container body 1 with a side wall 2 projecting in a tangential direction for exhaust and drainage. A container for cleaning semiconductor wafers, characterized in that a duct 3 is formed therein for cleaning semiconductor wafers. 2. The container for cleaning semiconductor wafers according to claim 1, wherein the duct 3 is opened from the bottom of the side wall 2 of the container body 1 over half the height or more. 3. A semiconductor wafer cleaning container according to claim 1 or 2, wherein the duct 3 projects from the container body 1 with a slight downward slope.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6561783U JPS59171338U (en) | 1983-04-30 | 1983-04-30 | Container for cleaning semiconductor wafers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6561783U JPS59171338U (en) | 1983-04-30 | 1983-04-30 | Container for cleaning semiconductor wafers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59171338U true JPS59171338U (en) | 1984-11-16 |
Family
ID=30195818
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6561783U Pending JPS59171338U (en) | 1983-04-30 | 1983-04-30 | Container for cleaning semiconductor wafers |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59171338U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017518173A (en) * | 2014-04-30 | 2017-07-06 | アルファ−ラヴァル・コーポレート・アーベー | centrifuge |
-
1983
- 1983-04-30 JP JP6561783U patent/JPS59171338U/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017518173A (en) * | 2014-04-30 | 2017-07-06 | アルファ−ラヴァル・コーポレート・アーベー | centrifuge |
| US10532365B2 (en) | 2014-04-30 | 2020-01-14 | Alfa Laval Corporate Ab | Centrifugal separator having an outlet opening opposite a stack of separation disks |
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