JPS59187148U - Silicon wafer vacuum suction cup - Google Patents

Silicon wafer vacuum suction cup

Info

Publication number
JPS59187148U
JPS59187148U JP8112183U JP8112183U JPS59187148U JP S59187148 U JPS59187148 U JP S59187148U JP 8112183 U JP8112183 U JP 8112183U JP 8112183 U JP8112183 U JP 8112183U JP S59187148 U JPS59187148 U JP S59187148U
Authority
JP
Japan
Prior art keywords
suction cup
silicon wafer
vacuum suction
wafer vacuum
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8112183U
Other languages
Japanese (ja)
Inventor
嘉之 上野
Original Assignee
日本電信電話株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電信電話株式会社 filed Critical 日本電信電話株式会社
Priority to JP8112183U priority Critical patent/JPS59187148U/en
Publication of JPS59187148U publication Critical patent/JPS59187148U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の真空吸着盤の断面図、第2図a。 bは本考案の実施例に係る吸着盤の断面図、第3図は本
考案の他の実施例に係る吸着盤の断面図、第4図aは本
考案の基準面の実施例を示す概略平面図であり、第4図
すは該s−s’断面図である。 図面中、1は本体部材、2は排気孔、3はパイプ、4は
真空室、5は排気口、6は可撓性薄膜、7ば固定枠、8
は細孔、9はリング、10はシリコンウェハ、21.2
2は細孔である。
FIG. 1 is a sectional view of a conventional vacuum suction cup, and FIG. 2a is a sectional view of a conventional vacuum suction cup. b is a cross-sectional view of a suction cup according to an embodiment of the present invention, FIG. 3 is a cross-sectional view of a suction cup according to another embodiment of the present invention, and FIG. 4 a is a schematic diagram showing an embodiment of the reference surface of the present invention. FIG. 4 is a plan view, and FIG. 4 is a sectional view taken along line ss'. In the drawing, 1 is a main body member, 2 is an exhaust hole, 3 is a pipe, 4 is a vacuum chamber, 5 is an exhaust port, 6 is a flexible thin film, 7 is a fixed frame, 8
is a pore, 9 is a ring, 10 is a silicon wafer, 21.2
2 is a pore.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] シリコンウェハ真空吸着盤において、表面に排気孔もし
くは、排気孔と連通ずる細溝を有する基準面と、この基
準面を覆う可撓性薄膜とを有し、この可撓性薄膜の外表
面が吸着面であることを特徴とするシリコンウェハ真空
吸着盤。
A silicon wafer vacuum suction cup has a reference surface having an exhaust hole or a narrow groove communicating with the exhaust hole on the surface, and a flexible thin film covering this reference surface, and the outer surface of this flexible thin film is used for suction. A silicon wafer vacuum suction cup characterized by its flat surface.
JP8112183U 1983-05-31 1983-05-31 Silicon wafer vacuum suction cup Pending JPS59187148U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8112183U JPS59187148U (en) 1983-05-31 1983-05-31 Silicon wafer vacuum suction cup

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8112183U JPS59187148U (en) 1983-05-31 1983-05-31 Silicon wafer vacuum suction cup

Publications (1)

Publication Number Publication Date
JPS59187148U true JPS59187148U (en) 1984-12-12

Family

ID=30211092

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8112183U Pending JPS59187148U (en) 1983-05-31 1983-05-31 Silicon wafer vacuum suction cup

Country Status (1)

Country Link
JP (1) JPS59187148U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4958773A (en) * 1972-10-04 1974-06-07

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4958773A (en) * 1972-10-04 1974-06-07

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