JPS59187148U - Silicon wafer vacuum suction cup - Google Patents
Silicon wafer vacuum suction cupInfo
- Publication number
- JPS59187148U JPS59187148U JP8112183U JP8112183U JPS59187148U JP S59187148 U JPS59187148 U JP S59187148U JP 8112183 U JP8112183 U JP 8112183U JP 8112183 U JP8112183 U JP 8112183U JP S59187148 U JPS59187148 U JP S59187148U
- Authority
- JP
- Japan
- Prior art keywords
- suction cup
- silicon wafer
- vacuum suction
- wafer vacuum
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来の真空吸着盤の断面図、第2図a。
bは本考案の実施例に係る吸着盤の断面図、第3図は本
考案の他の実施例に係る吸着盤の断面図、第4図aは本
考案の基準面の実施例を示す概略平面図であり、第4図
すは該s−s’断面図である。
図面中、1は本体部材、2は排気孔、3はパイプ、4は
真空室、5は排気口、6は可撓性薄膜、7ば固定枠、8
は細孔、9はリング、10はシリコンウェハ、21.2
2は細孔である。FIG. 1 is a sectional view of a conventional vacuum suction cup, and FIG. 2a is a sectional view of a conventional vacuum suction cup. b is a cross-sectional view of a suction cup according to an embodiment of the present invention, FIG. 3 is a cross-sectional view of a suction cup according to another embodiment of the present invention, and FIG. 4 a is a schematic diagram showing an embodiment of the reference surface of the present invention. FIG. 4 is a plan view, and FIG. 4 is a sectional view taken along line ss'. In the drawing, 1 is a main body member, 2 is an exhaust hole, 3 is a pipe, 4 is a vacuum chamber, 5 is an exhaust port, 6 is a flexible thin film, 7 is a fixed frame, 8
is a pore, 9 is a ring, 10 is a silicon wafer, 21.2
2 is a pore.
Claims (1)
くは、排気孔と連通ずる細溝を有する基準面と、この基
準面を覆う可撓性薄膜とを有し、この可撓性薄膜の外表
面が吸着面であることを特徴とするシリコンウェハ真空
吸着盤。A silicon wafer vacuum suction cup has a reference surface having an exhaust hole or a narrow groove communicating with the exhaust hole on the surface, and a flexible thin film covering this reference surface, and the outer surface of this flexible thin film is used for suction. A silicon wafer vacuum suction cup characterized by its flat surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8112183U JPS59187148U (en) | 1983-05-31 | 1983-05-31 | Silicon wafer vacuum suction cup |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8112183U JPS59187148U (en) | 1983-05-31 | 1983-05-31 | Silicon wafer vacuum suction cup |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59187148U true JPS59187148U (en) | 1984-12-12 |
Family
ID=30211092
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8112183U Pending JPS59187148U (en) | 1983-05-31 | 1983-05-31 | Silicon wafer vacuum suction cup |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59187148U (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4958773A (en) * | 1972-10-04 | 1974-06-07 |
-
1983
- 1983-05-31 JP JP8112183U patent/JPS59187148U/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4958773A (en) * | 1972-10-04 | 1974-06-07 |
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