JPS60104134A - プラズマ重合コ−テイング装置 - Google Patents

プラズマ重合コ−テイング装置

Info

Publication number
JPS60104134A
JPS60104134A JP58211443A JP21144383A JPS60104134A JP S60104134 A JPS60104134 A JP S60104134A JP 58211443 A JP58211443 A JP 58211443A JP 21144383 A JP21144383 A JP 21144383A JP S60104134 A JPS60104134 A JP S60104134A
Authority
JP
Japan
Prior art keywords
gas
plasma
vacuum chamber
coating
tape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58211443A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0149363B2 (enExample
Inventor
Hideo Kurokawa
英雄 黒川
Yoshihiro Minamide
南出　整宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58211443A priority Critical patent/JPS60104134A/ja
Publication of JPS60104134A publication Critical patent/JPS60104134A/ja
Publication of JPH0149363B2 publication Critical patent/JPH0149363B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Polymerisation Methods In General (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
JP58211443A 1983-11-09 1983-11-09 プラズマ重合コ−テイング装置 Granted JPS60104134A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58211443A JPS60104134A (ja) 1983-11-09 1983-11-09 プラズマ重合コ−テイング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58211443A JPS60104134A (ja) 1983-11-09 1983-11-09 プラズマ重合コ−テイング装置

Publications (2)

Publication Number Publication Date
JPS60104134A true JPS60104134A (ja) 1985-06-08
JPH0149363B2 JPH0149363B2 (enExample) 1989-10-24

Family

ID=16606036

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58211443A Granted JPS60104134A (ja) 1983-11-09 1983-11-09 プラズマ重合コ−テイング装置

Country Status (1)

Country Link
JP (1) JPS60104134A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5261962A (en) * 1991-06-05 1993-11-16 Mitsubishi Jukogyo Kabushiki Kaisha Plasma-chemical vapor-phase epitaxy system comprising a planar antenna
EP1555103A1 (de) * 2004-01-15 2005-07-20 arccure technologies GmbH Verfahren und Vorrichtung zur Härtung von radikalisch polymerisierbaren Beschichtungen von Oberflächen
WO2012133102A1 (ja) * 2011-03-25 2012-10-04 積水化学工業株式会社 重合性モノマーの凝縮装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5857404A (ja) * 1981-10-01 1983-04-05 Hitachi Ltd プラズマ重合方法
JPS5874701A (ja) * 1981-10-29 1983-05-06 Sekisui Chem Co Ltd 高分子薄膜の形成方法
JPS5876402A (ja) * 1981-11-02 1983-05-09 Central Res Inst Of Electric Power Ind エポキシ注型絶縁材の表面抵抗低減方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5857404A (ja) * 1981-10-01 1983-04-05 Hitachi Ltd プラズマ重合方法
JPS5874701A (ja) * 1981-10-29 1983-05-06 Sekisui Chem Co Ltd 高分子薄膜の形成方法
JPS5876402A (ja) * 1981-11-02 1983-05-09 Central Res Inst Of Electric Power Ind エポキシ注型絶縁材の表面抵抗低減方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5261962A (en) * 1991-06-05 1993-11-16 Mitsubishi Jukogyo Kabushiki Kaisha Plasma-chemical vapor-phase epitaxy system comprising a planar antenna
EP1555103A1 (de) * 2004-01-15 2005-07-20 arccure technologies GmbH Verfahren und Vorrichtung zur Härtung von radikalisch polymerisierbaren Beschichtungen von Oberflächen
WO2012133102A1 (ja) * 2011-03-25 2012-10-04 積水化学工業株式会社 重合性モノマーの凝縮装置

Also Published As

Publication number Publication date
JPH0149363B2 (enExample) 1989-10-24

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