JPS6010272Y2 - 試料汚染防止装置 - Google Patents

試料汚染防止装置

Info

Publication number
JPS6010272Y2
JPS6010272Y2 JP12053180U JP12053180U JPS6010272Y2 JP S6010272 Y2 JPS6010272 Y2 JP S6010272Y2 JP 12053180 U JP12053180 U JP 12053180U JP 12053180 U JP12053180 U JP 12053180U JP S6010272 Y2 JPS6010272 Y2 JP S6010272Y2
Authority
JP
Japan
Prior art keywords
sample
objective lens
gap
cooling section
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12053180U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5745153U (enExample
Inventor
功 松井
恒 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12053180U priority Critical patent/JPS6010272Y2/ja
Publication of JPS5745153U publication Critical patent/JPS5745153U/ja
Application granted granted Critical
Publication of JPS6010272Y2 publication Critical patent/JPS6010272Y2/ja
Expired legal-status Critical Current

Links

JP12053180U 1980-08-27 1980-08-27 試料汚染防止装置 Expired JPS6010272Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12053180U JPS6010272Y2 (ja) 1980-08-27 1980-08-27 試料汚染防止装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12053180U JPS6010272Y2 (ja) 1980-08-27 1980-08-27 試料汚染防止装置

Publications (2)

Publication Number Publication Date
JPS5745153U JPS5745153U (enExample) 1982-03-12
JPS6010272Y2 true JPS6010272Y2 (ja) 1985-04-09

Family

ID=29481196

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12053180U Expired JPS6010272Y2 (ja) 1980-08-27 1980-08-27 試料汚染防止装置

Country Status (1)

Country Link
JP (1) JPS6010272Y2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0418838Y2 (enExample) * 1987-04-27 1992-04-27
JPH01241418A (ja) * 1988-03-24 1989-09-26 Japan Steel Works Ltd:The 射出成形機の射出装置
AU625074B2 (en) * 1988-10-13 1992-07-02 Seiki Corporation Injection moulding
JPH06297521A (ja) * 1993-04-12 1994-10-25 Japan Steel Works Ltd:The 射出成形機の射出装置

Also Published As

Publication number Publication date
JPS5745153U (enExample) 1982-03-12

Similar Documents

Publication Publication Date Title
TW200540911A (en) Inspection apparatus and inspection method
JPH04137728A (ja) 集束イオンビームエッチング装置
KR20120106620A (ko) 검사 장치
US20060249697A1 (en) Method, apparatus and system for specimen fabrication by using an ion beam
US3761709A (en) Method and apparatus for observing biological specimens using a scanning electron microscope
JPS6010272Y2 (ja) 試料汚染防止装置
JPH0817709A (ja) 荷電粒子ビーム装置
JP4644470B2 (ja) イオンビーム加工装置および試料作製方法
WO2014069325A1 (ja) 電子ビーム顕微装置
JP2939906B1 (ja) イオンビーム加工装置
US12429403B2 (en) Sample transfer device
JPS5951704B2 (ja) 磁気レンズ装置
JPS6086748A (ja) 電子顕微鏡用雰囲気試料室
JP2827109B2 (ja) 集束イオンビーム加工装置の加工方法
JP3389788B2 (ja) 荷電粒子線装置
JPS62126309A (ja) パタ−ン検査装置
JPH0615390Y2 (ja) 試料予備室を備えた電子顕微鏡
JPH0548357Y2 (enExample)
JPS62252128A (ja) 半導体製造装置の基板導入装置
JPH0247552Y2 (enExample)
WO2025036921A1 (en) Humidity control arrangement and/or immersion liquid removal arrangement for closed imaging compartment immersion microscopy and an arrangement and method for closed imaging compartment immersion microscopy
JPH01105451A (ja) 電子顕微鏡における試料汚染除去装置
JPS6164055A (ja) 走査形電子顕微鏡
JPS63226866A (ja) 真空装置
JPS5957849U (ja) 電子顕微鏡等の試料交換装置