JPS5999243A - 感ガス素子 - Google Patents
感ガス素子Info
- Publication number
- JPS5999243A JPS5999243A JP20770682A JP20770682A JPS5999243A JP S5999243 A JPS5999243 A JP S5999243A JP 20770682 A JP20770682 A JP 20770682A JP 20770682 A JP20770682 A JP 20770682A JP S5999243 A JPS5999243 A JP S5999243A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- catalyst layer
- sensitive element
- sensitive
- gas sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003054 catalyst Substances 0.000 claims abstract description 74
- 229910052751 metal Inorganic materials 0.000 claims abstract description 22
- 239000002184 metal Substances 0.000 claims abstract description 22
- 239000010409 thin film Substances 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 229910052697 platinum Inorganic materials 0.000 claims description 8
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 abstract description 23
- 239000010408 film Substances 0.000 abstract description 20
- 230000004043 responsiveness Effects 0.000 abstract description 6
- 238000007650 screen-printing Methods 0.000 abstract description 4
- 229910052737 gold Inorganic materials 0.000 abstract description 2
- 238000002156 mixing Methods 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 3
- 229910052593 corundum Inorganic materials 0.000 abstract 3
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 3
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 abstract 2
- 239000007789 gas Substances 0.000 description 117
- 230000035945 sensitivity Effects 0.000 description 16
- 239000000463 material Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 230000003197 catalytic effect Effects 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 11
- 239000012298 atmosphere Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 230000007423 decrease Effects 0.000 description 8
- 238000001514 detection method Methods 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 230000004044 response Effects 0.000 description 7
- 238000005245 sintering Methods 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000009412 basement excavation Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20770682A JPS5999243A (ja) | 1982-11-29 | 1982-11-29 | 感ガス素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20770682A JPS5999243A (ja) | 1982-11-29 | 1982-11-29 | 感ガス素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5999243A true JPS5999243A (ja) | 1984-06-07 |
| JPS6152420B2 JPS6152420B2 (enrdf_load_stackoverflow) | 1986-11-13 |
Family
ID=16544213
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20770682A Granted JPS5999243A (ja) | 1982-11-29 | 1982-11-29 | 感ガス素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5999243A (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62254047A (ja) * | 1986-04-25 | 1987-11-05 | Figaro Eng Inc | 低アルコ−ル感度ガスセンサの製造方法 |
| JPH0254157A (ja) * | 1988-08-18 | 1990-02-23 | Toshiba Corp | ガスセンサ |
| US5086286A (en) * | 1989-07-28 | 1992-02-04 | Kurabe Industrial Co., Ltd. | Gas-sensitive device |
| JP2002323467A (ja) * | 2001-04-25 | 2002-11-08 | Denso Corp | 薄膜型ガスセンサ及びその製造方法 |
| WO2003006977A3 (de) * | 2001-07-10 | 2003-04-03 | Bosch Gmbh Robert | Schichtverbund und mikromechanisches sensorelement, insbesondere gassensorelement, mit diesem schichtverbund |
| JP2018054593A (ja) * | 2016-09-21 | 2018-04-05 | 大阪瓦斯株式会社 | ガスセンサおよびガス検知装置 |
-
1982
- 1982-11-29 JP JP20770682A patent/JPS5999243A/ja active Granted
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62254047A (ja) * | 1986-04-25 | 1987-11-05 | Figaro Eng Inc | 低アルコ−ル感度ガスセンサの製造方法 |
| JPH0254157A (ja) * | 1988-08-18 | 1990-02-23 | Toshiba Corp | ガスセンサ |
| US5086286A (en) * | 1989-07-28 | 1992-02-04 | Kurabe Industrial Co., Ltd. | Gas-sensitive device |
| JP2002323467A (ja) * | 2001-04-25 | 2002-11-08 | Denso Corp | 薄膜型ガスセンサ及びその製造方法 |
| WO2003006977A3 (de) * | 2001-07-10 | 2003-04-03 | Bosch Gmbh Robert | Schichtverbund und mikromechanisches sensorelement, insbesondere gassensorelement, mit diesem schichtverbund |
| JP2018054593A (ja) * | 2016-09-21 | 2018-04-05 | 大阪瓦斯株式会社 | ガスセンサおよびガス検知装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6152420B2 (enrdf_load_stackoverflow) | 1986-11-13 |
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