JPS599913A - 液相エピタキシヤル成長装置 - Google Patents

液相エピタキシヤル成長装置

Info

Publication number
JPS599913A
JPS599913A JP57119373A JP11937382A JPS599913A JP S599913 A JPS599913 A JP S599913A JP 57119373 A JP57119373 A JP 57119373A JP 11937382 A JP11937382 A JP 11937382A JP S599913 A JPS599913 A JP S599913A
Authority
JP
Japan
Prior art keywords
substrate holder
chamber
melt
storage chamber
molten liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57119373A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6359529B2 (cg-RX-API-DMAC10.html
Inventor
Takao Oda
織田　隆雄
Susumu Yoshida
進 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP57119373A priority Critical patent/JPS599913A/ja
Publication of JPS599913A publication Critical patent/JPS599913A/ja
Publication of JPS6359529B2 publication Critical patent/JPS6359529B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/263—

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP57119373A 1982-07-07 1982-07-07 液相エピタキシヤル成長装置 Granted JPS599913A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57119373A JPS599913A (ja) 1982-07-07 1982-07-07 液相エピタキシヤル成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57119373A JPS599913A (ja) 1982-07-07 1982-07-07 液相エピタキシヤル成長装置

Publications (2)

Publication Number Publication Date
JPS599913A true JPS599913A (ja) 1984-01-19
JPS6359529B2 JPS6359529B2 (cg-RX-API-DMAC10.html) 1988-11-21

Family

ID=14759898

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57119373A Granted JPS599913A (ja) 1982-07-07 1982-07-07 液相エピタキシヤル成長装置

Country Status (1)

Country Link
JP (1) JPS599913A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109698064A (zh) * 2019-01-08 2019-04-30 重庆华虹仪表有限公司 提高低压互感器生产效率的注料模具及其应用工艺

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09299129A (ja) * 1996-05-09 1997-11-25 Roosutobiifu Kamakurayama:Kk 荷物運搬具

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109698064A (zh) * 2019-01-08 2019-04-30 重庆华虹仪表有限公司 提高低压互感器生产效率的注料模具及其应用工艺

Also Published As

Publication number Publication date
JPS6359529B2 (cg-RX-API-DMAC10.html) 1988-11-21

Similar Documents

Publication Publication Date Title
JPS599913A (ja) 液相エピタキシヤル成長装置
US7134826B2 (en) Substrate transfer apparatus, substrate processing apparatus and holding table
US3821039A (en) Method of epitaxially depositing a semiconductor material on a substrate
TWI555075B (zh) 基板處理設備及基板處理方法
TW201009976A (en) Epitaxy processing system and its processing method
JP4014411B2 (ja) Ｉｉｉ族窒化物の結晶製造方法
JPH0735396Y2 (ja) ウエハカセット搬送箱
US20210265186A1 (en) Carrier tray
CN107546149A (zh) 集成芯片工艺工具
JP2811902B2 (ja) 液相エピタキシャル成長装置
JPH06128079A (ja) 縦型液相エピタキシャル成長装置
JPH03225847A (ja) ウエハカセツトストツカ
KR102209707B1 (ko) 수직형 액상 에피텍셜 장치
JPH05183045A (ja) カセット保管ケース
JPH04127265U (ja) 液相エピタキシヤル成長装置
JP3064796B2 (ja) 電子部品供給装置
JPH0260052B2 (cg-RX-API-DMAC10.html)
JP2615616B2 (ja) 半導体搬送用無人車
US4412502A (en) Apparatus for the elimination of edge growth in liquid phase epitaxy
JPS62131534A (ja) 半導体ウエハ−ハンドリング用治具
JPS626335B2 (cg-RX-API-DMAC10.html)
JPH0310594B2 (cg-RX-API-DMAC10.html)
JP2666584B2 (ja) 液相エピタキシャル成長装置
JP2017135170A (ja) 気相成長装置及び気相成長方法
JP2543795Y2 (ja) 気相成長装置