JPS5991693U - Infrared heat treatment equipment - Google Patents

Infrared heat treatment equipment

Info

Publication number
JPS5991693U
JPS5991693U JP18882882U JP18882882U JPS5991693U JP S5991693 U JPS5991693 U JP S5991693U JP 18882882 U JP18882882 U JP 18882882U JP 18882882 U JP18882882 U JP 18882882U JP S5991693 U JPS5991693 U JP S5991693U
Authority
JP
Japan
Prior art keywords
heat treatment
infrared heat
semiconductor substrate
treatment equipment
support stand
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18882882U
Other languages
Japanese (ja)
Inventor
山仲 格
Original Assignee
松下電子工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 松下電子工業株式会社 filed Critical 松下電子工業株式会社
Priority to JP18882882U priority Critical patent/JPS5991693U/en
Publication of JPS5991693U publication Critical patent/JPS5991693U/en
Pending legal-status Critical Current

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  • Resistance Heating (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来装置の基本的構造の概要断面図、第2図は
本考案実施例装置の基本的構造の概要断面図、第3図は
同装置の平面概略図、第4図は本考案の他の実施例装置
の要部概要断面図である。 1・・・・・・グラファイトヒータ、2・・・・・・シ
ャッタ、3・・・・・・支持台、4・・・・・・被処理
用基板、6・・・・・・凹状部。
Fig. 1 is a schematic cross-sectional view of the basic structure of the conventional device, Fig. 2 is a schematic cross-sectional view of the basic structure of the device according to the present invention, Fig. 3 is a schematic plan view of the same device, and Fig. 4 is the schematic cross-sectional view of the basic structure of the device according to the present invention. FIG. 3 is a schematic cross-sectional view of main parts of another embodiment of the device. 1...Graphite heater, 2...Shutter, 3...Support stand, 4...Substrate to be processed, 6...Concave portion .

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体基板を加熱する加熱部と、この加熱部により加熱
される半導体基板を支持する支持台とを有し、前記支持
台の前記半導体基板を載置する載置部には前記半導体基
板径より径小な凹状部を有する赤外線加熱処理装置。
It has a heating part that heats a semiconductor substrate, and a support stand that supports the semiconductor substrate heated by the heating part, and a mounting part of the support stand on which the semiconductor substrate is placed has a diameter smaller than the diameter of the semiconductor substrate. An infrared heat treatment device with a small concave part.
JP18882882U 1982-12-13 1982-12-13 Infrared heat treatment equipment Pending JPS5991693U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18882882U JPS5991693U (en) 1982-12-13 1982-12-13 Infrared heat treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18882882U JPS5991693U (en) 1982-12-13 1982-12-13 Infrared heat treatment equipment

Publications (1)

Publication Number Publication Date
JPS5991693U true JPS5991693U (en) 1984-06-21

Family

ID=30407264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18882882U Pending JPS5991693U (en) 1982-12-13 1982-12-13 Infrared heat treatment equipment

Country Status (1)

Country Link
JP (1) JPS5991693U (en)

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