JPS59109135U - Infrared heat treatment equipment - Google Patents

Infrared heat treatment equipment

Info

Publication number
JPS59109135U
JPS59109135U JP314883U JP314883U JPS59109135U JP S59109135 U JPS59109135 U JP S59109135U JP 314883 U JP314883 U JP 314883U JP 314883 U JP314883 U JP 314883U JP S59109135 U JPS59109135 U JP S59109135U
Authority
JP
Japan
Prior art keywords
infrared heat
heat treatment
treatment equipment
heater
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP314883U
Other languages
Japanese (ja)
Inventor
山仲　格
Original Assignee
松下電子工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 松下電子工業株式会社 filed Critical 松下電子工業株式会社
Priority to JP314883U priority Critical patent/JPS59109135U/en
Publication of JPS59109135U publication Critical patent/JPS59109135U/en
Pending legal-status Critical Current

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  • Resistance Heating (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図は赤外線加熱処理装置の要部を示す斜視図、第２
図は従来例のヒーターの構造を示す平面図、第３図は本
考案のヒーターの概念を示す平面図、第４図、第５図は
本考案のヒーターの実施例を示す平面図、第６図はヒー
ターを２組用いた本考案の実施例を説明するための斜視
図である。 １・・・半導体基板、２・・・半導体基板保持板、３・
・・半導体基板を保持するピン、４・・・ヒーター、８
・・パヒーターの中心部、９・・・ヒーターの周辺部。Figure 1 is a perspective view showing the main parts of the infrared heat treatment equipment, Figure 2
3 is a plan view showing the concept of the heater of the present invention. FIGS. 4 and 5 are plan views showing an embodiment of the heater of the present invention. The figure is a perspective view for explaining an embodiment of the present invention using two sets of heaters. 1... Semiconductor substrate, 2... Semiconductor substrate holding plate, 3.
・・Pin that holds the semiconductor substrate, 4 ・・Heater, 8
...center of the heater, 9...periphery of the heater.

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] （１）基板を加熱しかつ一体的に形成された発熱体を有
するヒーターを備え、前記ヒーターの発熱体の密度が中
心部より周辺部において高いことを特徴とする赤外線加
熱処理装置。。(1) An infrared heat treatment apparatus comprising a heater that heats a substrate and has an integrally formed heating element, wherein the density of the heating element of the heater is higher in a peripheral area than in a central area. . （２）被処理基板の両側に各々のヒーターを有すること
を特徴とする実用新案登録請求の範囲第１項に記載の赤
外線加熱処理装置。(2) The infrared heat processing apparatus according to claim 1, which is a registered utility model, and has heaters on both sides of the substrate to be processed.
JP314883U 1983-01-12 1983-01-12 Infrared heat treatment equipment Pending JPS59109135U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP314883U JPS59109135U (en) 1983-01-12 1983-01-12 Infrared heat treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP314883U JPS59109135U (en) 1983-01-12 1983-01-12 Infrared heat treatment equipment

Publications (1)

Publication Number Publication Date
JPS59109135U true JPS59109135U (en) 1984-07-23

Family

ID=30134778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP314883U Pending JPS59109135U (en) 1983-01-12 1983-01-12 Infrared heat treatment equipment

Country Status (1)

Country Link
JP (1) JPS59109135U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61156742A (en) * 1984-12-28 1986-07-16 Toshiba Corp Short period heat treatment device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61156742A (en) * 1984-12-28 1986-07-16 Toshiba Corp Short period heat treatment device

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