JPS59109133U - Infrared heat treatment equipment - Google Patents

Infrared heat treatment equipment

Info

Publication number
JPS59109133U
JPS59109133U JP314683U JP314683U JPS59109133U JP S59109133 U JPS59109133 U JP S59109133U JP 314683 U JP314683 U JP 314683U JP 314683 U JP314683 U JP 314683U JP S59109133 U JPS59109133 U JP S59109133U
Authority
JP
Japan
Prior art keywords
heat treatment
treatment equipment
substrate
infrared heat
support stand
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP314683U
Other languages
Japanese (ja)
Inventor
山仲 格
Original Assignee
松下電子工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 松下電子工業株式会社 filed Critical 松下電子工業株式会社
Priority to JP314683U priority Critical patent/JPS59109133U/en
Publication of JPS59109133U publication Critical patent/JPS59109133U/en
Pending legal-status Critical Current

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  • Resistance Heating (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図a、 bは、従来例を説明するための断面図及び
要部平面図、第2図a、 b、第3図a、 b。 第4図a、 bは、本考案を説明するための断面図及び
要部平面図である。− 1・・・主ヒゴー、2・・・ジャツレ−13・・・保持
台、4・・・半導体基板、6・・・補助ヒーター。 Cα) 第3図 −(bツ ク ゛   第4図
FIGS. 1a and 1b are a cross-sectional view and a plan view of essential parts for explaining a conventional example, FIGS. 2a and 2b, and 3a and 3b. FIGS. 4a and 4b are a sectional view and a plan view of essential parts for explaining the present invention. - 1... Main higo, 2... Jatsure-13... Holding stand, 4... Semiconductor substrate, 6... Auxiliary heater. Cα) Fig. 3 - (b Tsuk゛ Fig. 4

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] (1)被加熱用基板を設置する支持台と、上記基板の主
面に対抗して設けられた主ヒーターと、上記支持台の上
記基板の設置部分周辺に設けられた補助ヒーターとを有
する赤外線加熱処理装置。
(1) An infrared ray having a support stand on which a substrate to be heated is installed, a main heater provided opposite the main surface of the substrate, and an auxiliary heater provided around the part of the support stand where the substrate is installed. Heat treatment equipment.
(2)  補助ヒーターは基板側面に設けられている実
用新案登録請求の範囲第1項記載の赤外線加熱−処廟装
置。
(2) The infrared heating and mausoleum device according to claim 1, wherein the auxiliary heater is provided on the side surface of the substrate.
JP314683U 1983-01-12 1983-01-12 Infrared heat treatment equipment Pending JPS59109133U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP314683U JPS59109133U (en) 1983-01-12 1983-01-12 Infrared heat treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP314683U JPS59109133U (en) 1983-01-12 1983-01-12 Infrared heat treatment equipment

Publications (1)

Publication Number Publication Date
JPS59109133U true JPS59109133U (en) 1984-07-23

Family

ID=30134776

Family Applications (1)

Application Number Title Priority Date Filing Date
JP314683U Pending JPS59109133U (en) 1983-01-12 1983-01-12 Infrared heat treatment equipment

Country Status (1)

Country Link
JP (1) JPS59109133U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61156742A (en) * 1984-12-28 1986-07-16 Toshiba Corp Short period heat treatment device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61156742A (en) * 1984-12-28 1986-07-16 Toshiba Corp Short period heat treatment device

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