JPS5991692U - Infrared heat treatment equipment - Google Patents

Infrared heat treatment equipment

Info

Publication number
JPS5991692U
JPS5991692U JP18882782U JP18882782U JPS5991692U JP S5991692 U JPS5991692 U JP S5991692U JP 18882782 U JP18882782 U JP 18882782U JP 18882782 U JP18882782 U JP 18882782U JP S5991692 U JPS5991692 U JP S5991692U
Authority
JP
Japan
Prior art keywords
heat treatment
infrared heat
treatment equipment
support stand
heating unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18882782U
Other languages
Japanese (ja)
Inventor
山仲 格
Original Assignee
松下電子工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 松下電子工業株式会社 filed Critical 松下電子工業株式会社
Priority to JP18882782U priority Critical patent/JPS5991692U/en
Publication of JPS5991692U publication Critical patent/JPS5991692U/en
Pending legal-status Critical Current

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  • Resistance Heating (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来例を説明するための断面図、第2図は本考
案の実施例を説明するための断面図、第3図は第2図の
平面図、第4図は本考案に係る装置の減衰板の平面図で
ある。 1・・・・・・グラファイトヒーター、2・・・・・・
シャッター、3°・・・・・・支持台、4・・・・・・
半導体基板、5・・・・・・減衰板、6・・・・・・減
衰板支持棒。 ′J
Fig. 1 is a cross-sectional view for explaining the conventional example, Fig. 2 is a cross-sectional view for explaining the embodiment of the present invention, Fig. 3 is a plan view of Fig. 2, and Fig. 4 is a cross-sectional view for explaining the embodiment of the present invention. FIG. 3 is a plan view of a damping plate of the device. 1...Graphite heater, 2...
Shutter, 3°...Support stand, 4...
Semiconductor substrate, 5... damping plate, 6... damping plate support rod. 'J

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 基板を加熱する加熱部と、前記加熱部により加熱される
基板を支持する支持台と、前記加熱部と前記支持台との
間に設置される減衰板とを有し、前記支持台に支持され
る基板の周辺部には前記加熱部からの赤外線を直接照射
し、中心部には前記減衰板により赤外線を弱めて照射す
ることを特徴とする赤外線加熱処理装置。
A heating unit that heats a substrate, a support stand that supports the substrate heated by the heating unit, and a damping plate that is installed between the heating unit and the support stand, and is supported by the support stand. An infrared heat treatment apparatus characterized in that the peripheral part of the substrate is directly irradiated with infrared rays from the heating section, and the central part is irradiated with the infrared rays weakened by the attenuation plate.
JP18882782U 1982-12-13 1982-12-13 Infrared heat treatment equipment Pending JPS5991692U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18882782U JPS5991692U (en) 1982-12-13 1982-12-13 Infrared heat treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18882782U JPS5991692U (en) 1982-12-13 1982-12-13 Infrared heat treatment equipment

Publications (1)

Publication Number Publication Date
JPS5991692U true JPS5991692U (en) 1984-06-21

Family

ID=30407262

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18882782U Pending JPS5991692U (en) 1982-12-13 1982-12-13 Infrared heat treatment equipment

Country Status (1)

Country Link
JP (1) JPS5991692U (en)

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