JPS5991692U - Infrared heat treatment equipment - Google Patents
Infrared heat treatment equipmentInfo
- Publication number
- JPS5991692U JPS5991692U JP18882782U JP18882782U JPS5991692U JP S5991692 U JPS5991692 U JP S5991692U JP 18882782 U JP18882782 U JP 18882782U JP 18882782 U JP18882782 U JP 18882782U JP S5991692 U JPS5991692 U JP S5991692U
- Authority
- JP
- Japan
- Prior art keywords
- heat treatment
- infrared heat
- treatment equipment
- support stand
- heating unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Resistance Heating (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来例を説明するための断面図、第2図は本考
案の実施例を説明するための断面図、第3図は第2図の
平面図、第4図は本考案に係る装置の減衰板の平面図で
ある。
1・・・・・・グラファイトヒーター、2・・・・・・
シャッター、3°・・・・・・支持台、4・・・・・・
半導体基板、5・・・・・・減衰板、6・・・・・・減
衰板支持棒。
′JFig. 1 is a cross-sectional view for explaining the conventional example, Fig. 2 is a cross-sectional view for explaining the embodiment of the present invention, Fig. 3 is a plan view of Fig. 2, and Fig. 4 is a cross-sectional view for explaining the embodiment of the present invention. FIG. 3 is a plan view of a damping plate of the device. 1...Graphite heater, 2...
Shutter, 3°...Support stand, 4...
Semiconductor substrate, 5... damping plate, 6... damping plate support rod. 'J
Claims (1)
基板を支持する支持台と、前記加熱部と前記支持台との
間に設置される減衰板とを有し、前記支持台に支持され
る基板の周辺部には前記加熱部からの赤外線を直接照射
し、中心部には前記減衰板により赤外線を弱めて照射す
ることを特徴とする赤外線加熱処理装置。A heating unit that heats a substrate, a support stand that supports the substrate heated by the heating unit, and a damping plate that is installed between the heating unit and the support stand, and is supported by the support stand. An infrared heat treatment apparatus characterized in that the peripheral part of the substrate is directly irradiated with infrared rays from the heating section, and the central part is irradiated with the infrared rays weakened by the attenuation plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18882782U JPS5991692U (en) | 1982-12-13 | 1982-12-13 | Infrared heat treatment equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18882782U JPS5991692U (en) | 1982-12-13 | 1982-12-13 | Infrared heat treatment equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5991692U true JPS5991692U (en) | 1984-06-21 |
Family
ID=30407262
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18882782U Pending JPS5991692U (en) | 1982-12-13 | 1982-12-13 | Infrared heat treatment equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5991692U (en) |
-
1982
- 1982-12-13 JP JP18882782U patent/JPS5991692U/en active Pending
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