JPS5986143A - ウエハ自動交換装置 - Google Patents

ウエハ自動交換装置

Info

Publication number
JPS5986143A
JPS5986143A JP57195235A JP19523582A JPS5986143A JP S5986143 A JPS5986143 A JP S5986143A JP 57195235 A JP57195235 A JP 57195235A JP 19523582 A JP19523582 A JP 19523582A JP S5986143 A JPS5986143 A JP S5986143A
Authority
JP
Japan
Prior art keywords
wafer
disk
transfer
arm
magazine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57195235A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0140467B2 (enrdf_load_html_response
Inventor
Nobuhiro Yoshioka
吉岡　信博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Ulvac Inc
Priority to JP57195235A priority Critical patent/JPS5986143A/ja
Publication of JPS5986143A publication Critical patent/JPS5986143A/ja
Publication of JPH0140467B2 publication Critical patent/JPH0140467B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP57195235A 1982-11-09 1982-11-09 ウエハ自動交換装置 Granted JPS5986143A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57195235A JPS5986143A (ja) 1982-11-09 1982-11-09 ウエハ自動交換装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57195235A JPS5986143A (ja) 1982-11-09 1982-11-09 ウエハ自動交換装置

Publications (2)

Publication Number Publication Date
JPS5986143A true JPS5986143A (ja) 1984-05-18
JPH0140467B2 JPH0140467B2 (enrdf_load_html_response) 1989-08-29

Family

ID=16337728

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57195235A Granted JPS5986143A (ja) 1982-11-09 1982-11-09 ウエハ自動交換装置

Country Status (1)

Country Link
JP (1) JPS5986143A (enrdf_load_html_response)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62133546U (enrdf_load_html_response) * 1986-02-17 1987-08-22
JPS62158756U (enrdf_load_html_response) * 1986-03-29 1987-10-08
JPS63108713A (ja) * 1986-10-27 1988-05-13 Nec Kansai Ltd イオン注入方法
JPH02126649A (ja) * 1988-11-07 1990-05-15 Teru Yamanashi Kk 移し換え装置
US5061144A (en) * 1988-11-30 1991-10-29 Tokyo Electron Limited Resist process apparatus
TWI447795B (zh) * 2010-12-29 2014-08-01 Univ Tsinghua 用於化學機械拋光設備的晶圓交換裝置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108641A (ja) * 1981-12-21 1983-06-28 Hitachi Ltd ウエハ自動交換装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108641A (ja) * 1981-12-21 1983-06-28 Hitachi Ltd ウエハ自動交換装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62133546U (enrdf_load_html_response) * 1986-02-17 1987-08-22
JPS62158756U (enrdf_load_html_response) * 1986-03-29 1987-10-08
JPS63108713A (ja) * 1986-10-27 1988-05-13 Nec Kansai Ltd イオン注入方法
JPH02126649A (ja) * 1988-11-07 1990-05-15 Teru Yamanashi Kk 移し換え装置
US5061144A (en) * 1988-11-30 1991-10-29 Tokyo Electron Limited Resist process apparatus
TWI447795B (zh) * 2010-12-29 2014-08-01 Univ Tsinghua 用於化學機械拋光設備的晶圓交換裝置

Also Published As

Publication number Publication date
JPH0140467B2 (enrdf_load_html_response) 1989-08-29

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