JPS5984550A - 半導体装置の製法 - Google Patents

半導体装置の製法

Info

Publication number
JPS5984550A
JPS5984550A JP19473582A JP19473582A JPS5984550A JP S5984550 A JPS5984550 A JP S5984550A JP 19473582 A JP19473582 A JP 19473582A JP 19473582 A JP19473582 A JP 19473582A JP S5984550 A JPS5984550 A JP S5984550A
Authority
JP
Japan
Prior art keywords
pattern
photoresist
metal
semiconductor device
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19473582A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0530054B2 (cs
Inventor
Masaru Miyazaki
勝 宮崎
Susumu Takahashi
進 高橋
Takahiro Kobashi
小橋　隆裕
Kiichi Kamiyanagi
喜一 上柳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP19473582A priority Critical patent/JPS5984550A/ja
Publication of JPS5984550A publication Critical patent/JPS5984550A/ja
Publication of JPH0530054B2 publication Critical patent/JPH0530054B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
JP19473582A 1982-11-08 1982-11-08 半導体装置の製法 Granted JPS5984550A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19473582A JPS5984550A (ja) 1982-11-08 1982-11-08 半導体装置の製法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19473582A JPS5984550A (ja) 1982-11-08 1982-11-08 半導体装置の製法

Publications (2)

Publication Number Publication Date
JPS5984550A true JPS5984550A (ja) 1984-05-16
JPH0530054B2 JPH0530054B2 (cs) 1993-05-07

Family

ID=16329355

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19473582A Granted JPS5984550A (ja) 1982-11-08 1982-11-08 半導体装置の製法

Country Status (1)

Country Link
JP (1) JPS5984550A (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011075888A1 (de) * 2011-05-16 2012-11-22 Robert Bosch Gmbh Halbleitervorrichtung mit mindestens einem Kontakt und Herstellungsverfahren für eine Halbleitervorrichtung mit mindestens einem Kontakt

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011075888A1 (de) * 2011-05-16 2012-11-22 Robert Bosch Gmbh Halbleitervorrichtung mit mindestens einem Kontakt und Herstellungsverfahren für eine Halbleitervorrichtung mit mindestens einem Kontakt
DE102011075888B4 (de) * 2011-05-16 2014-07-10 Robert Bosch Gmbh Halbleitervorrichtung mit mindestens einem Kontakt und Herstellungsverfahren für eine Halbleitervorrichtung mit mindestens einem Kontakt
US9202702B2 (en) 2011-05-16 2015-12-01 Robert Bosch Gmbh Semiconductor device having at least one contact, and manufacturing method for a semiconductor device having at least one contact

Also Published As

Publication number Publication date
JPH0530054B2 (cs) 1993-05-07

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