JPS5984428A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS5984428A
JPS5984428A JP57194112A JP19411282A JPS5984428A JP S5984428 A JPS5984428 A JP S5984428A JP 57194112 A JP57194112 A JP 57194112A JP 19411282 A JP19411282 A JP 19411282A JP S5984428 A JPS5984428 A JP S5984428A
Authority
JP
Japan
Prior art keywords
resist
radiation
layer
positive
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57194112A
Other languages
English (en)
Japanese (ja)
Other versions
JPH035654B2 (enrdf_load_html_response
Inventor
Masaru Sasako
勝 笹子
Kazuhiko Tsuji
和彦 辻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57194112A priority Critical patent/JPS5984428A/ja
Publication of JPS5984428A publication Critical patent/JPS5984428A/ja
Publication of JPH035654B2 publication Critical patent/JPH035654B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57194112A 1982-11-04 1982-11-04 パタ−ン形成方法 Granted JPS5984428A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57194112A JPS5984428A (ja) 1982-11-04 1982-11-04 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57194112A JPS5984428A (ja) 1982-11-04 1982-11-04 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS5984428A true JPS5984428A (ja) 1984-05-16
JPH035654B2 JPH035654B2 (enrdf_load_html_response) 1991-01-28

Family

ID=16319115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57194112A Granted JPS5984428A (ja) 1982-11-04 1982-11-04 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS5984428A (enrdf_load_html_response)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006316995A (ja) * 2005-05-10 2006-11-24 Eads Space Transportation Gmbh 機械式回転駆動装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006316995A (ja) * 2005-05-10 2006-11-24 Eads Space Transportation Gmbh 機械式回転駆動装置

Also Published As

Publication number Publication date
JPH035654B2 (enrdf_load_html_response) 1991-01-28

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