JPS5983111A - 光集積回路作製法 - Google Patents

光集積回路作製法

Info

Publication number
JPS5983111A
JPS5983111A JP19415082A JP19415082A JPS5983111A JP S5983111 A JPS5983111 A JP S5983111A JP 19415082 A JP19415082 A JP 19415082A JP 19415082 A JP19415082 A JP 19415082A JP S5983111 A JPS5983111 A JP S5983111A
Authority
JP
Japan
Prior art keywords
photoresist
diffraction grating
substrate
optical
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19415082A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0524481B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Kenji Okamoto
賢司 岡本
Yoshikazu Nishiwaki
西脇　由和
Haruji Matsuoka
松岡　春治
Yozo Nishiura
洋三 西浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP19415082A priority Critical patent/JPS5983111A/ja
Priority to US06/548,591 priority patent/US4517280A/en
Priority to EP83110986A priority patent/EP0110184B1/en
Priority to DE8383110986T priority patent/DE3370078D1/de
Publication of JPS5983111A publication Critical patent/JPS5983111A/ja
Publication of JPH0524481B2 publication Critical patent/JPH0524481B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP19415082A 1982-11-04 1982-11-04 光集積回路作製法 Granted JPS5983111A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP19415082A JPS5983111A (ja) 1982-11-04 1982-11-04 光集積回路作製法
US06/548,591 US4517280A (en) 1982-11-04 1983-11-03 Process for fabricating integrated optics
EP83110986A EP0110184B1 (en) 1982-11-04 1983-11-03 Process for fabricating integrated optics
DE8383110986T DE3370078D1 (en) 1982-11-04 1983-11-03 Process for fabricating integrated optics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19415082A JPS5983111A (ja) 1982-11-04 1982-11-04 光集積回路作製法

Publications (2)

Publication Number Publication Date
JPS5983111A true JPS5983111A (ja) 1984-05-14
JPH0524481B2 JPH0524481B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-04-08

Family

ID=16319744

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19415082A Granted JPS5983111A (ja) 1982-11-04 1982-11-04 光集積回路作製法

Country Status (1)

Country Link
JP (1) JPS5983111A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007508717A (ja) * 2003-10-17 2007-04-05 インテル コーポレイション トレンチを有する複合的パターニング方法及びその装置
JP2007510289A (ja) * 2003-10-17 2007-04-19 インテル コーポレイション パターニングされた素子の繰り返しアレイに不規則性を導入する多段階処理
JP2009044158A (ja) * 2007-08-09 2009-02-26 Samsung Electro Mech Co Ltd ナノパターン形成装置及びこれを用いたナノパターン形成方法
US8053146B2 (en) * 2005-02-10 2011-11-08 Ovd Kinegram Ag Multi-layer body including a diffractive relief structure and method for producing the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53124457A (en) * 1977-04-06 1978-10-30 Toshiba Corp Light amprification circuit
JPS5434253A (en) * 1977-08-23 1979-03-13 Nippon Telegr & Teleph Corp <Ntt> Method of manufacturing diffraction grating

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53124457A (en) * 1977-04-06 1978-10-30 Toshiba Corp Light amprification circuit
JPS5434253A (en) * 1977-08-23 1979-03-13 Nippon Telegr & Teleph Corp <Ntt> Method of manufacturing diffraction grating

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007508717A (ja) * 2003-10-17 2007-04-05 インテル コーポレイション トレンチを有する複合的パターニング方法及びその装置
JP2007510289A (ja) * 2003-10-17 2007-04-19 インテル コーポレイション パターニングされた素子の繰り返しアレイに不規則性を導入する多段階処理
KR100906788B1 (ko) * 2003-10-17 2009-07-09 인텔 코포레이션 복합 프린팅 방법, 장치 및 시스템
US8053146B2 (en) * 2005-02-10 2011-11-08 Ovd Kinegram Ag Multi-layer body including a diffractive relief structure and method for producing the same
US8450029B2 (en) 2005-02-10 2013-05-28 Ovd Kinegram Ag Multi-layer body and process for the production of a multi-layer body
JP2009044158A (ja) * 2007-08-09 2009-02-26 Samsung Electro Mech Co Ltd ナノパターン形成装置及びこれを用いたナノパターン形成方法
US8198609B2 (en) 2007-08-09 2012-06-12 Samsung Led Co., Ltd Apparatus for forming nano pattern and method for forming the nano pattern using the same

Also Published As

Publication number Publication date
JPH0524481B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-04-08

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