JPS5978431A - 電子衝撃、電界放出形イオン源 - Google Patents

電子衝撃、電界放出形イオン源

Info

Publication number
JPS5978431A
JPS5978431A JP57187784A JP18778482A JPS5978431A JP S5978431 A JPS5978431 A JP S5978431A JP 57187784 A JP57187784 A JP 57187784A JP 18778482 A JP18778482 A JP 18778482A JP S5978431 A JPS5978431 A JP S5978431A
Authority
JP
Japan
Prior art keywords
ion source
ion
filament
auxiliary electrode
field emission
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57187784A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0369137B2 (enrdf_load_stackoverflow
Inventor
Hifumi Tamura
田村　一二三
Toru Ishitani
亨 石谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57187784A priority Critical patent/JPS5978431A/ja
Publication of JPS5978431A publication Critical patent/JPS5978431A/ja
Publication of JPH0369137B2 publication Critical patent/JPH0369137B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0807—Gas field ion sources [GFIS]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
JP57187784A 1982-10-26 1982-10-26 電子衝撃、電界放出形イオン源 Granted JPS5978431A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57187784A JPS5978431A (ja) 1982-10-26 1982-10-26 電子衝撃、電界放出形イオン源

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57187784A JPS5978431A (ja) 1982-10-26 1982-10-26 電子衝撃、電界放出形イオン源

Publications (2)

Publication Number Publication Date
JPS5978431A true JPS5978431A (ja) 1984-05-07
JPH0369137B2 JPH0369137B2 (enrdf_load_stackoverflow) 1991-10-31

Family

ID=16212158

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57187784A Granted JPS5978431A (ja) 1982-10-26 1982-10-26 電子衝撃、電界放出形イオン源

Country Status (1)

Country Link
JP (1) JPS5978431A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6239538B1 (en) 1997-09-17 2001-05-29 Nec Corporation Field emitter
JP2013239514A (ja) * 2012-05-14 2013-11-28 Jeol Ltd 電子銃、その駆動装置、およびその制御方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1830552A1 (en) 1999-12-28 2007-09-05 Sony Corporation Image commercial transactions system and method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5222991A (en) * 1975-08-15 1977-02-21 Hitachi Ltd Method of controlling plasma type ion source
JPS56123453U (enrdf_load_stackoverflow) * 1980-02-22 1981-09-19

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5222991A (en) * 1975-08-15 1977-02-21 Hitachi Ltd Method of controlling plasma type ion source
JPS56123453U (enrdf_load_stackoverflow) * 1980-02-22 1981-09-19

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6239538B1 (en) 1997-09-17 2001-05-29 Nec Corporation Field emitter
JP2013239514A (ja) * 2012-05-14 2013-11-28 Jeol Ltd 電子銃、その駆動装置、およびその制御方法

Also Published As

Publication number Publication date
JPH0369137B2 (enrdf_load_stackoverflow) 1991-10-31

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