JPS5957427A - 電子ビ−ム描画デ−タ作成方法 - Google Patents

電子ビ−ム描画デ−タ作成方法

Info

Publication number
JPS5957427A
JPS5957427A JP16800182A JP16800182A JPS5957427A JP S5957427 A JPS5957427 A JP S5957427A JP 16800182 A JP16800182 A JP 16800182A JP 16800182 A JP16800182 A JP 16800182A JP S5957427 A JPS5957427 A JP S5957427A
Authority
JP
Japan
Prior art keywords
data
repetitive
frame
width
converted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16800182A
Other languages
English (en)
Japanese (ja)
Other versions
JPH056338B2 (enExample
Inventor
Kiyomi Koyama
清美 小山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP16800182A priority Critical patent/JPS5957427A/ja
Publication of JPS5957427A publication Critical patent/JPS5957427A/ja
Publication of JPH056338B2 publication Critical patent/JPH056338B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP16800182A 1982-09-27 1982-09-27 電子ビ−ム描画デ−タ作成方法 Granted JPS5957427A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16800182A JPS5957427A (ja) 1982-09-27 1982-09-27 電子ビ−ム描画デ−タ作成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16800182A JPS5957427A (ja) 1982-09-27 1982-09-27 電子ビ−ム描画デ−タ作成方法

Publications (2)

Publication Number Publication Date
JPS5957427A true JPS5957427A (ja) 1984-04-03
JPH056338B2 JPH056338B2 (enExample) 1993-01-26

Family

ID=15859957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16800182A Granted JPS5957427A (ja) 1982-09-27 1982-09-27 電子ビ−ム描画デ−タ作成方法

Country Status (1)

Country Link
JP (1) JPS5957427A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS614228A (ja) * 1984-06-18 1986-01-10 Toshiba Corp 荷電ビ−ム描画方法
JPS62156816A (ja) * 1985-12-28 1987-07-11 Toshiba Corp パタ−ン描画方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5483773A (en) * 1977-12-16 1979-07-04 Fujitsu Ltd Electron-beam exposure unit
JPS5734334A (en) * 1980-08-08 1982-02-24 Toshiba Corp Pattern forming

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5483773A (en) * 1977-12-16 1979-07-04 Fujitsu Ltd Electron-beam exposure unit
JPS5734334A (en) * 1980-08-08 1982-02-24 Toshiba Corp Pattern forming

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS614228A (ja) * 1984-06-18 1986-01-10 Toshiba Corp 荷電ビ−ム描画方法
JPS62156816A (ja) * 1985-12-28 1987-07-11 Toshiba Corp パタ−ン描画方法

Also Published As

Publication number Publication date
JPH056338B2 (enExample) 1993-01-26

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