JPS5952563A - コ−テイング装置 - Google Patents

コ−テイング装置

Info

Publication number
JPS5952563A
JPS5952563A JP16345182A JP16345182A JPS5952563A JP S5952563 A JPS5952563 A JP S5952563A JP 16345182 A JP16345182 A JP 16345182A JP 16345182 A JP16345182 A JP 16345182A JP S5952563 A JPS5952563 A JP S5952563A
Authority
JP
Japan
Prior art keywords
sample
specimen
sintered filter
chemical liquid
clean
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16345182A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0361510B2 (cs
Inventor
Satoshi Araihara
新井原　聡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16345182A priority Critical patent/JPS5952563A/ja
Publication of JPS5952563A publication Critical patent/JPS5952563A/ja
Publication of JPH0361510B2 publication Critical patent/JPH0361510B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP16345182A 1982-09-20 1982-09-20 コ−テイング装置 Granted JPS5952563A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16345182A JPS5952563A (ja) 1982-09-20 1982-09-20 コ−テイング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16345182A JPS5952563A (ja) 1982-09-20 1982-09-20 コ−テイング装置

Publications (2)

Publication Number Publication Date
JPS5952563A true JPS5952563A (ja) 1984-03-27
JPH0361510B2 JPH0361510B2 (cs) 1991-09-20

Family

ID=15774126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16345182A Granted JPS5952563A (ja) 1982-09-20 1982-09-20 コ−テイング装置

Country Status (1)

Country Link
JP (1) JPS5952563A (cs)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6251221A (ja) * 1985-08-30 1987-03-05 Nec Kyushu Ltd 塗布装置
JPS62198122A (ja) * 1986-02-26 1987-09-01 Hitachi Ltd 半導体処理装置
JPS6482628A (en) * 1987-09-25 1989-03-28 Toshiba Corp Photoresist processing device
JPH01254277A (ja) * 1988-03-31 1989-10-11 Matsushita Electric Ind Co Ltd スピナー回転処理装置
JPH03267169A (ja) * 1990-03-15 1991-11-28 Matsushita Electric Ind Co Ltd 薄膜製造装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498499A (cs) * 1972-03-27 1974-01-25
JPS56113377A (en) * 1980-02-12 1981-09-07 Fujitsu Ltd Rotary coater

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498499A (cs) * 1972-03-27 1974-01-25
JPS56113377A (en) * 1980-02-12 1981-09-07 Fujitsu Ltd Rotary coater

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6251221A (ja) * 1985-08-30 1987-03-05 Nec Kyushu Ltd 塗布装置
JPS62198122A (ja) * 1986-02-26 1987-09-01 Hitachi Ltd 半導体処理装置
JPS6482628A (en) * 1987-09-25 1989-03-28 Toshiba Corp Photoresist processing device
JPH01254277A (ja) * 1988-03-31 1989-10-11 Matsushita Electric Ind Co Ltd スピナー回転処理装置
JPH03267169A (ja) * 1990-03-15 1991-11-28 Matsushita Electric Ind Co Ltd 薄膜製造装置

Also Published As

Publication number Publication date
JPH0361510B2 (cs) 1991-09-20

Similar Documents

Publication Publication Date Title
KR102410089B1 (ko) 액 처리 장치 및 액 처리 방법
JPH08213308A (ja) 塗布方法
JPS5952563A (ja) コ−テイング装置
JP3442219B2 (ja) 基板処理装置
JPH04369210A (ja) 半導体ウエハ用回転塗布装置
JPH10309509A (ja) 回転式基板処理装置および基板処理方法
JPH09122560A (ja) 回転式塗布装置
JPH0851061A (ja) 塗布膜形成方法及びその装置
JPH06275506A (ja) 回転塗布装置及びその方法
JP2608136B2 (ja) 回転塗布装置
JP2537611B2 (ja) 塗布材料の塗布装置
KR100644051B1 (ko) 포토 레지스트 코팅 장치 및 이를 이용한 웨이퍼 이물 제거방법
JP2558490B2 (ja) 現像装置
JPH1079334A (ja) 半導体基板の塗布膜除去装置
JPS61206221A (ja) スピン塗布装置
JPH0369110A (ja) 半導体製造装置
JP2913607B2 (ja) 処理方法
JPH1187226A (ja) 基板現像装置
JPS62136265A (ja) 処理液塗布装置
JPH08255745A (ja) 塗布膜形成方法及びその装置
JPS6333660Y2 (cs)
US6395086B1 (en) Shield for wafer station
JPH01302819A (ja) スプレィ現像装置
JPH05228413A (ja) 塗布装置
JP2002263558A (ja) 塗布方法