JPS5946032A - 洗浄装置 - Google Patents

洗浄装置

Info

Publication number
JPS5946032A
JPS5946032A JP15591782A JP15591782A JPS5946032A JP S5946032 A JPS5946032 A JP S5946032A JP 15591782 A JP15591782 A JP 15591782A JP 15591782 A JP15591782 A JP 15591782A JP S5946032 A JPS5946032 A JP S5946032A
Authority
JP
Japan
Prior art keywords
ammonia
hydrogen peroxide
cleaning
concentration
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15591782A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6316901B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Masaaki Harazono
正昭 原園
Masahiro Watanabe
正博 渡辺
Yutaka Hiratsuka
豊 平塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15591782A priority Critical patent/JPS5946032A/ja
Publication of JPS5946032A publication Critical patent/JPS5946032A/ja
Publication of JPS6316901B2 publication Critical patent/JPS6316901B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP15591782A 1982-09-09 1982-09-09 洗浄装置 Granted JPS5946032A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15591782A JPS5946032A (ja) 1982-09-09 1982-09-09 洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15591782A JPS5946032A (ja) 1982-09-09 1982-09-09 洗浄装置

Publications (2)

Publication Number Publication Date
JPS5946032A true JPS5946032A (ja) 1984-03-15
JPS6316901B2 JPS6316901B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-04-11

Family

ID=15616331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15591782A Granted JPS5946032A (ja) 1982-09-09 1982-09-09 洗浄装置

Country Status (1)

Country Link
JP (1) JPS5946032A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02722U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1988-06-10 1990-01-05
JPH0496329A (ja) * 1990-08-14 1992-03-27 Kawasaki Steel Corp 半導体装置の製造方法
US5275184A (en) * 1990-10-19 1994-01-04 Dainippon Screen Mfg. Co., Ltd. Apparatus and system for treating surface of a wafer by dipping the same in a treatment solution and a gate device for chemical agent used in the apparatus and the system
US5472516A (en) * 1994-04-15 1995-12-05 At&T Corp. Process and apparatus for semiconductor device fabrication
EP0675528A3 (en) * 1994-03-28 1997-05-28 Shinetsu Handotai Kk Method for rinsing substrates and rinsing device.
EP1172844A3 (en) * 2000-07-14 2005-12-14 Sony Corporation Substrate cleaning method and substrate cleaning apparatus
US20230060851A1 (en) * 2021-09-01 2023-03-02 Cardioquip, Llc System and method for in-line optical sensing of hydrogen peroxide

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02722U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1988-06-10 1990-01-05
JPH0496329A (ja) * 1990-08-14 1992-03-27 Kawasaki Steel Corp 半導体装置の製造方法
US5275184A (en) * 1990-10-19 1994-01-04 Dainippon Screen Mfg. Co., Ltd. Apparatus and system for treating surface of a wafer by dipping the same in a treatment solution and a gate device for chemical agent used in the apparatus and the system
EP0675528A3 (en) * 1994-03-28 1997-05-28 Shinetsu Handotai Kk Method for rinsing substrates and rinsing device.
US5881748A (en) * 1994-03-28 1999-03-16 Shin-Etsu Handotai Co. Ltd. Apparatus for rinsing wafers adhered with chemical liquid by use of purified water
US5472516A (en) * 1994-04-15 1995-12-05 At&T Corp. Process and apparatus for semiconductor device fabrication
EP1172844A3 (en) * 2000-07-14 2005-12-14 Sony Corporation Substrate cleaning method and substrate cleaning apparatus
US7255749B2 (en) 2000-07-14 2007-08-14 Sony Corporation Substrate cleaning method and substrate cleaning apparatus
US20230060851A1 (en) * 2021-09-01 2023-03-02 Cardioquip, Llc System and method for in-line optical sensing of hydrogen peroxide
EP4396575A1 (en) 2021-09-01 2024-07-10 CardioQuip, LLC System and method for in-line optical sensing of hydrogen peroxide
EP4396575A4 (en) * 2021-09-01 2024-12-25 CardioQuip, LLC SYSTEM AND METHOD FOR ONLINE OPTICAL DETECTION OF HYDROGEN PEROXIDE

Also Published As

Publication number Publication date
JPS6316901B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-04-11

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