JPS5944044A - 感光性平版印刷版 - Google Patents

感光性平版印刷版

Info

Publication number
JPS5944044A
JPS5944044A JP15478482A JP15478482A JPS5944044A JP S5944044 A JPS5944044 A JP S5944044A JP 15478482 A JP15478482 A JP 15478482A JP 15478482 A JP15478482 A JP 15478482A JP S5944044 A JPS5944044 A JP S5944044A
Authority
JP
Japan
Prior art keywords
org
salt
compd
soluble
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15478482A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0345824B2 (enrdf_load_stackoverflow
Inventor
Teruo Ezaka
江坂 照男
Takatoshi Oota
太田 高敏
Masao Nakatsuka
雅郎 中塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Okamoto Chemical Industry Co Ltd
Original Assignee
Okamoto Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Okamoto Chemical Industry Co Ltd filed Critical Okamoto Chemical Industry Co Ltd
Priority to JP15478482A priority Critical patent/JPS5944044A/ja
Publication of JPS5944044A publication Critical patent/JPS5944044A/ja
Publication of JPH0345824B2 publication Critical patent/JPH0345824B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP15478482A 1982-09-06 1982-09-06 感光性平版印刷版 Granted JPS5944044A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15478482A JPS5944044A (ja) 1982-09-06 1982-09-06 感光性平版印刷版

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15478482A JPS5944044A (ja) 1982-09-06 1982-09-06 感光性平版印刷版

Publications (2)

Publication Number Publication Date
JPS5944044A true JPS5944044A (ja) 1984-03-12
JPH0345824B2 JPH0345824B2 (enrdf_load_stackoverflow) 1991-07-12

Family

ID=15591818

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15478482A Granted JPS5944044A (ja) 1982-09-06 1982-09-06 感光性平版印刷版

Country Status (1)

Country Link
JP (1) JPS5944044A (enrdf_load_stackoverflow)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51143405A (en) * 1975-06-05 1976-12-09 Hodogaya Chemical Co Ltd Copying material for lithographic printing
JPS56121031A (en) * 1980-02-28 1981-09-22 Konishiroku Photo Ind Co Ltd Photosensitive composition

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51143405A (en) * 1975-06-05 1976-12-09 Hodogaya Chemical Co Ltd Copying material for lithographic printing
JPS56121031A (en) * 1980-02-28 1981-09-22 Konishiroku Photo Ind Co Ltd Photosensitive composition

Also Published As

Publication number Publication date
JPH0345824B2 (enrdf_load_stackoverflow) 1991-07-12

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