JPH0345824B2 - - Google Patents

Info

Publication number
JPH0345824B2
JPH0345824B2 JP57154784A JP15478482A JPH0345824B2 JP H0345824 B2 JPH0345824 B2 JP H0345824B2 JP 57154784 A JP57154784 A JP 57154784A JP 15478482 A JP15478482 A JP 15478482A JP H0345824 B2 JPH0345824 B2 JP H0345824B2
Authority
JP
Japan
Prior art keywords
photosensitive
water
diazo
organic solvent
soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57154784A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5944044A (ja
Inventor
Teruo Ezaka
Takatoshi Oota
Masao Nakatsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Okamoto Chemical Industry Co Ltd
Original Assignee
Okamoto Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Okamoto Chemical Industry Co Ltd filed Critical Okamoto Chemical Industry Co Ltd
Priority to JP15478482A priority Critical patent/JPS5944044A/ja
Publication of JPS5944044A publication Critical patent/JPS5944044A/ja
Publication of JPH0345824B2 publication Critical patent/JPH0345824B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP15478482A 1982-09-06 1982-09-06 感光性平版印刷版 Granted JPS5944044A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15478482A JPS5944044A (ja) 1982-09-06 1982-09-06 感光性平版印刷版

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15478482A JPS5944044A (ja) 1982-09-06 1982-09-06 感光性平版印刷版

Publications (2)

Publication Number Publication Date
JPS5944044A JPS5944044A (ja) 1984-03-12
JPH0345824B2 true JPH0345824B2 (enrdf_load_stackoverflow) 1991-07-12

Family

ID=15591818

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15478482A Granted JPS5944044A (ja) 1982-09-06 1982-09-06 感光性平版印刷版

Country Status (1)

Country Link
JP (1) JPS5944044A (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51143405A (en) * 1975-06-05 1976-12-09 Hodogaya Chemical Co Ltd Copying material for lithographic printing
JPS56121031A (en) * 1980-02-28 1981-09-22 Konishiroku Photo Ind Co Ltd Photosensitive composition

Also Published As

Publication number Publication date
JPS5944044A (ja) 1984-03-12

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