JPS5936731B2 - 印刷材料 - Google Patents

印刷材料

Info

Publication number
JPS5936731B2
JPS5936731B2 JP51067029A JP6702976A JPS5936731B2 JP S5936731 B2 JPS5936731 B2 JP S5936731B2 JP 51067029 A JP51067029 A JP 51067029A JP 6702976 A JP6702976 A JP 6702976A JP S5936731 B2 JPS5936731 B2 JP S5936731B2
Authority
JP
Japan
Prior art keywords
photosensitive
diazo
substrate
material according
item
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51067029A
Other languages
English (en)
Japanese (ja)
Other versions
JPS522520A (en
Inventor
ロバート・ダブリユー・ハルマン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Napp Systems Inc
Original Assignee
Napp Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems Inc filed Critical Napp Systems Inc
Publication of JPS522520A publication Critical patent/JPS522520A/ja
Publication of JPS5936731B2 publication Critical patent/JPS5936731B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Insulating Films (AREA)
JP51067029A 1975-06-19 1976-06-08 印刷材料 Expired JPS5936731B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US58833475A 1975-06-19 1975-06-19

Publications (2)

Publication Number Publication Date
JPS522520A JPS522520A (en) 1977-01-10
JPS5936731B2 true JPS5936731B2 (ja) 1984-09-05

Family

ID=24353419

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51067029A Expired JPS5936731B2 (ja) 1975-06-19 1976-06-08 印刷材料

Country Status (12)

Country Link
JP (1) JPS5936731B2 (uk)
BE (1) BE841797A (uk)
CA (1) CA1091969A (uk)
CH (1) CH633893A5 (uk)
DE (1) DE2626066A1 (uk)
DK (1) DK232276A (uk)
FR (1) FR2315110A1 (uk)
GB (1) GB1548764A (uk)
IT (1) IT1061234B (uk)
NL (1) NL7604774A (uk)
NO (1) NO762006L (uk)
SE (1) SE422847B (uk)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154627A (en) * 1976-06-18 1977-12-22 Fuji Photo Film Co Ltd Silver halide light sensitive material
JPS52154626A (en) * 1976-06-18 1977-12-22 Fuji Photo Film Co Ltd Silver halide light sensitive material
JPS5518621A (en) * 1978-07-26 1980-02-08 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
DE2834059A1 (de) * 1978-08-03 1980-02-14 Hoechst Ag Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
JPS5823026A (ja) * 1981-08-04 1983-02-10 Nippon Paint Co Ltd 水現像性平版印刷版材
JPS58174939A (ja) * 1982-03-18 1983-10-14 Konishiroku Photo Ind Co Ltd 画像形成材料
US4551415A (en) * 1982-04-22 1985-11-05 E. I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
US4668604A (en) * 1982-04-22 1987-05-26 E.I. Du Pont De Nemours And Company Positive-working photosensitive elements containing crosslinked beads and process of use
US4601970A (en) * 1982-04-22 1986-07-22 E. I. Du Pont De Nemours And Company Dry photosensitive film containing crosslinked beads
DE3328019A1 (de) * 1982-09-21 1984-03-22 Polychrome Corp., 10702 Yonkers, N.Y. Mit wasser entwickelbare druckplatte
GB2273366B (en) * 1992-11-18 1996-03-27 Du Pont Forming images on radiation-sensitive plates
US5688627A (en) * 1996-07-02 1997-11-18 Precision Lithograining Corp. Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3382069A (en) * 1964-06-18 1968-05-07 Azoplate Corp Planographic printing plate
GB1469941A (en) * 1973-04-10 1977-04-06 Andrews Paper & Chem Co Inc Diazotype reproduction layer

Also Published As

Publication number Publication date
SE7605083L (sv) 1976-12-20
DE2626066A1 (de) 1977-01-20
CH633893A5 (en) 1982-12-31
IT1061234B (it) 1983-02-28
FR2315110A1 (fr) 1977-01-14
FR2315110B1 (uk) 1981-11-13
GB1548764A (en) 1979-07-18
BE841797A (fr) 1976-09-01
NO762006L (uk) 1976-12-21
SE422847B (sv) 1982-03-29
NL7604774A (nl) 1976-12-21
CA1091969A (en) 1980-12-23
DK232276A (da) 1976-12-20
JPS522520A (en) 1977-01-10

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