JPS5928479B2 - 凹版印刷版 - Google Patents
凹版印刷版Info
- Publication number
- JPS5928479B2 JPS5928479B2 JP15731579A JP15731579A JPS5928479B2 JP S5928479 B2 JPS5928479 B2 JP S5928479B2 JP 15731579 A JP15731579 A JP 15731579A JP 15731579 A JP15731579 A JP 15731579A JP S5928479 B2 JPS5928479 B2 JP S5928479B2
- Authority
- JP
- Japan
- Prior art keywords
- printing
- ink
- layer
- plate
- oil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007639 printing Methods 0.000 title claims description 100
- 239000005871 repellent Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 description 26
- 239000010408 film Substances 0.000 description 19
- 239000000463 material Substances 0.000 description 19
- 238000007645 offset printing Methods 0.000 description 14
- 229920002379 silicone rubber Polymers 0.000 description 13
- 239000004945 silicone rubber Substances 0.000 description 13
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 229920001971 elastomer Polymers 0.000 description 6
- 230000006835 compression Effects 0.000 description 4
- 238000007906 compression Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000007644 letterpress printing Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229920003225 polyurethane elastomer Polymers 0.000 description 3
- 230000002940 repellent Effects 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 241000238413 Octopus Species 0.000 description 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- FBOUIAKEJMZPQG-AWNIVKPZSA-N (1E)-1-(2,4-dichlorophenyl)-4,4-dimethyl-2-(1,2,4-triazol-1-yl)pent-1-en-3-ol Chemical compound C1=NC=NN1/C(C(O)C(C)(C)C)=C/C1=CC=C(Cl)C=C1Cl FBOUIAKEJMZPQG-AWNIVKPZSA-N 0.000 description 1
- XBTRYWRVOBZSGM-UHFFFAOYSA-N (4-methylphenyl)methanediamine Chemical compound CC1=CC=C(C(N)N)C=C1 XBTRYWRVOBZSGM-UHFFFAOYSA-N 0.000 description 1
- QLUXVUVEVXYICG-UHFFFAOYSA-N 1,1-dichloroethene;prop-2-enenitrile Chemical compound C=CC#N.ClC(Cl)=C QLUXVUVEVXYICG-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- XUGUHTGSMPZQIW-UHFFFAOYSA-N [[4-(4-diazonioiminocyclohexa-2,5-dien-1-ylidene)cyclohexa-2,5-dien-1-ylidene]hydrazinylidene]azanide Chemical group C1=CC(N=[N+]=[N-])=CC=C1C1=CC=C(N=[N+]=[N-])C=C1 XUGUHTGSMPZQIW-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 125000001752 diazonium salt group Chemical group 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 238000010017 direct printing Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000009408 flooring Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000013441 quality evaluation Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000003381 solubilizing effect Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/10—Intaglio printing ; Gravure printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Printing Methods (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15731579A JPS5928479B2 (ja) | 1979-12-03 | 1979-12-03 | 凹版印刷版 |
| FR8025480A FR2471283A1 (fr) | 1979-12-03 | 1980-12-01 | Plaque d'impression a gravure et procede d'impression a l'aide d'une telle plaque |
| DE19803045322 DE3045322C2 (de) | 1979-12-03 | 1980-12-02 | Verfahren zum Herstellen einer Tiefdruckform |
| GB8038608A GB2066159B (en) | 1979-12-03 | 1980-12-02 | Intaglio printing plate and a printing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15731579A JPS5928479B2 (ja) | 1979-12-03 | 1979-12-03 | 凹版印刷版 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5678991A JPS5678991A (en) | 1981-06-29 |
| JPS5928479B2 true JPS5928479B2 (ja) | 1984-07-13 |
Family
ID=15646993
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15731579A Expired JPS5928479B2 (ja) | 1979-12-03 | 1979-12-03 | 凹版印刷版 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS5928479B2 (https=) |
| DE (1) | DE3045322C2 (https=) |
| FR (1) | FR2471283A1 (https=) |
| GB (1) | GB2066159B (https=) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56137989A (en) * | 1980-03-29 | 1981-10-28 | Toppan Printing Co Ltd | Printing plate and printing method by use thereof |
| JPS5946090A (ja) * | 1982-09-09 | 1984-03-15 | 東洋紙業株式会社 | プリント配線基板の製造方法 |
| JPS5946091A (ja) * | 1982-09-09 | 1984-03-15 | 東洋紙業株式会社 | プリント配線基板の製造方法 |
| JPS5946089A (ja) * | 1982-09-09 | 1984-03-15 | 東洋紙業株式会社 | プリント配線基板の製造方法 |
| JPS59188990A (ja) * | 1983-04-11 | 1984-10-26 | 松下電器産業株式会社 | プリント配線基板の製造法 |
| JPS59231887A (ja) * | 1983-06-13 | 1984-12-26 | 日本文化精工株式会社 | Ｕｖインキを用いプリント基板等の凹凸面若しくは平面に画線をエツチングする方法 |
| JPS6039889A (ja) * | 1983-08-12 | 1985-03-01 | 大日本インキ化学工業株式会社 | レジストパタ−ンの形成方法 |
| JPS6039888A (ja) * | 1983-08-12 | 1985-03-01 | 大日本インキ化学工業株式会社 | レジストパタ−ンの形成方法 |
| JPS61163343A (ja) * | 1985-01-16 | 1986-07-24 | Toray Ind Inc | 水なし平版印刷版 |
| DE3730193A1 (de) * | 1987-09-09 | 1989-03-23 | Bonner Zeitungsdruckerei | Druckform, insbesondere druckplatte und hochdruckverfahren |
| JPH02117193A (ja) * | 1988-09-30 | 1990-05-01 | Molex Inc | パッド印刷されたリモートコントローラ |
| JPH039358A (ja) * | 1989-06-06 | 1991-01-17 | Murakami Screen Kk | グラビア印刷用版およびその製造法 |
| US5996488A (en) * | 1994-11-25 | 1999-12-07 | Canon Kabushiki Kaisha | Preparation of an electron source by offset printing electrodes having thickness less than 200 nm |
| EP0802170A3 (en) * | 1996-04-16 | 1997-11-05 | Corning Incorporated | Method and apparatus for forming glass rib structures |
| DE19713311C2 (de) * | 1997-03-29 | 1999-03-11 | Schott Glas | Verfahren und Vorrichtung zur Erzeugung von großflächigen Präzisionsstrukturen auf Flachglas |
| DE69826359T2 (de) * | 1997-04-30 | 2005-09-29 | Kyocera Corp. | Hertellungsverfahren eines Substrats für eine Plasma-Anzeigeeinheit |
| ES2259081T3 (es) * | 2001-04-26 | 2006-09-16 | Sacmi Cooperativa Meccanici Imola Societa' Cooperativa In Breve Sacmi Imola S.C. | Un soporte para la impresion decorativa de superficies, particularmente de materiales ceramicos y similares. |
| WO2002087893A1 (en) * | 2001-04-26 | 2002-11-07 | Arktype S.R.L. | A support for the decorative printing of surfaces, particularly of ceramic materials and the like |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE426939C (de) * | 1924-11-29 | 1926-03-23 | Seiden Textil Akt Ges | Druckform in Form von Walzen oder Platten mit Hartgummidruckflaeche |
| US3241486A (en) * | 1961-09-28 | 1966-03-22 | Interchem Corp | New planographic printing plate and method for producing same |
| US3511178A (en) * | 1967-01-06 | 1970-05-12 | Minnesota Mining & Mfg | Printing plate and method |
| BE754692A (fr) * | 1969-08-12 | 1971-02-11 | Scott Paper Co | Plaque d'impression planographique a sec et sa methode de preparation |
| DE2061287C3 (de) * | 1970-12-12 | 1981-07-23 | Basf Ag, 6700 Ludwigshafen | Verfahren zur Herstellung von tiefenvariablen Tiefdruckformen |
| US3949142A (en) * | 1971-05-20 | 1976-04-06 | Scott Paper Company | Dry planographic plate |
| JPS5426923B2 (https=) * | 1972-03-21 | 1979-09-06 | ||
| US3859090A (en) * | 1973-05-17 | 1975-01-07 | Eastman Kodak Co | Repellent compositions and elements containing the same |
| US4086093A (en) * | 1974-10-11 | 1978-04-25 | Toray Industries, Inc. | Dry planographic printing plate |
-
1979
- 1979-12-03 JP JP15731579A patent/JPS5928479B2/ja not_active Expired
-
1980
- 1980-12-01 FR FR8025480A patent/FR2471283A1/fr active Granted
- 1980-12-02 GB GB8038608A patent/GB2066159B/en not_active Expired
- 1980-12-02 DE DE19803045322 patent/DE3045322C2/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB2066159A (en) | 1981-07-08 |
| DE3045322A1 (de) | 1981-09-03 |
| FR2471283B1 (https=) | 1984-06-22 |
| DE3045322C2 (de) | 1984-11-15 |
| FR2471283A1 (fr) | 1981-06-19 |
| JPS5678991A (en) | 1981-06-29 |
| GB2066159B (en) | 1983-11-23 |
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