JPS5927541A - 半導体回路装置 - Google Patents
半導体回路装置Info
- Publication number
- JPS5927541A JPS5927541A JP9702883A JP9702883A JPS5927541A JP S5927541 A JPS5927541 A JP S5927541A JP 9702883 A JP9702883 A JP 9702883A JP 9702883 A JP9702883 A JP 9702883A JP S5927541 A JPS5927541 A JP S5927541A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- semiconductor substrate
- semiconductor
- conductive
- probe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims description 170
- 239000000758 substrate Substances 0.000 claims description 211
- 239000000523 sample Substances 0.000 claims description 60
- 238000012360 testing method Methods 0.000 claims description 57
- 239000011248 coating agent Substances 0.000 claims description 21
- 238000000576 coating method Methods 0.000 claims description 21
- 230000001419 dependent effect Effects 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 239000004020 conductor Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 238000011156 evaluation Methods 0.000 claims description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 239000010937 tungsten Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 25
- 238000005530 etching Methods 0.000 description 8
- 238000001465 metallisation Methods 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 229910052581 Si3N4 Inorganic materials 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920002323 Silicone foam Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- QKJXFFMKZPQALO-UHFFFAOYSA-N chromium;iron;methane;silicon Chemical compound C.[Si].[Cr].[Fe] QKJXFFMKZPQALO-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000003708 edge detection Methods 0.000 description 1
- KOWWOODYPWDWOJ-LVBPXUMQSA-N elatine Chemical compound C([C@]12CN(C3[C@@]45OCO[C@]44[C@H]6[C@@H](OC)[C@@H]([C@H](C4)OC)C[C@H]6[C@@]3([C@@H]1[C@@H]5OC)[C@@H](OC)CC2)CC)OC(=O)C1=CC=CC=C1N1C(=O)CC(C)C1=O KOWWOODYPWDWOJ-LVBPXUMQSA-N 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000013514 silicone foam Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Measuring Leads Or Probes (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US38437882A | 1982-06-03 | 1982-06-03 | |
US384453 | 1982-06-03 | ||
US384378 | 1982-06-03 | ||
US384454 | 1982-06-03 | ||
US384451 | 1999-08-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5927541A true JPS5927541A (ja) | 1984-02-14 |
JPH0576771B2 JPH0576771B2 (enrdf_load_stackoverflow) | 1993-10-25 |
Family
ID=23517098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9702883A Granted JPS5927541A (ja) | 1982-06-03 | 1983-06-02 | 半導体回路装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5927541A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62259453A (ja) * | 1986-05-02 | 1987-11-11 | Nec Corp | プロープカード |
JPS63244749A (ja) * | 1987-03-31 | 1988-10-12 | Tokyo Electron Ltd | プロービング用接触端子ユニット |
WO1995034000A1 (fr) * | 1994-06-03 | 1995-12-14 | Hitachi, Ltd. | Dispositif de connexion et sa fabrication |
-
1983
- 1983-06-02 JP JP9702883A patent/JPS5927541A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62259453A (ja) * | 1986-05-02 | 1987-11-11 | Nec Corp | プロープカード |
JPS63244749A (ja) * | 1987-03-31 | 1988-10-12 | Tokyo Electron Ltd | プロービング用接触端子ユニット |
WO1995034000A1 (fr) * | 1994-06-03 | 1995-12-14 | Hitachi, Ltd. | Dispositif de connexion et sa fabrication |
Also Published As
Publication number | Publication date |
---|---|
JPH0576771B2 (enrdf_load_stackoverflow) | 1993-10-25 |
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