JPS5923875A - ドライエツチング方法 - Google Patents

ドライエツチング方法

Info

Publication number
JPS5923875A
JPS5923875A JP13412482A JP13412482A JPS5923875A JP S5923875 A JPS5923875 A JP S5923875A JP 13412482 A JP13412482 A JP 13412482A JP 13412482 A JP13412482 A JP 13412482A JP S5923875 A JPS5923875 A JP S5923875A
Authority
JP
Japan
Prior art keywords
etching
silicon
dry
plasma
contamination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13412482A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6231071B2 (cs
Inventor
Yoshitsugu Nishimoto
西本　佳嗣
Shingo Kadomura
新吾 門村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP13412482A priority Critical patent/JPS5923875A/ja
Publication of JPS5923875A publication Critical patent/JPS5923875A/ja
Publication of JPS6231071B2 publication Critical patent/JPS6231071B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP13412482A 1982-07-30 1982-07-30 ドライエツチング方法 Granted JPS5923875A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13412482A JPS5923875A (ja) 1982-07-30 1982-07-30 ドライエツチング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13412482A JPS5923875A (ja) 1982-07-30 1982-07-30 ドライエツチング方法

Publications (2)

Publication Number Publication Date
JPS5923875A true JPS5923875A (ja) 1984-02-07
JPS6231071B2 JPS6231071B2 (cs) 1987-07-06

Family

ID=15121020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13412482A Granted JPS5923875A (ja) 1982-07-30 1982-07-30 ドライエツチング方法

Country Status (1)

Country Link
JP (1) JPS5923875A (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS639121A (ja) * 1986-06-30 1988-01-14 Toshiba Corp ドライエツチング方法
EP1619269A3 (en) * 2004-07-23 2006-11-08 Air Products And Chemicals, Inc. Method for enhancing fluorine utilization

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63183077U (cs) * 1987-05-19 1988-11-25
JPH01257439A (ja) * 1987-07-17 1989-10-13 Nippon Flour Mills Co Ltd パスタ類、麺類の調理方法および調理用耐熱容器、包装麺類
JPH0162723U (cs) * 1987-10-14 1989-04-21

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5565364A (en) * 1978-11-08 1980-05-16 Toshiba Corp Etching method
JPS56144543A (en) * 1980-03-17 1981-11-10 Ibm Method of manufacturing semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5565364A (en) * 1978-11-08 1980-05-16 Toshiba Corp Etching method
JPS56144543A (en) * 1980-03-17 1981-11-10 Ibm Method of manufacturing semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS639121A (ja) * 1986-06-30 1988-01-14 Toshiba Corp ドライエツチング方法
EP1619269A3 (en) * 2004-07-23 2006-11-08 Air Products And Chemicals, Inc. Method for enhancing fluorine utilization
KR100760891B1 (ko) 2004-07-23 2007-09-27 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 불소 이용 강화를 위한 방법

Also Published As

Publication number Publication date
JPS6231071B2 (cs) 1987-07-06

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