JPS59215727A - 表面処理方法 - Google Patents

表面処理方法

Info

Publication number
JPS59215727A
JPS59215727A JP58092176A JP9217683A JPS59215727A JP S59215727 A JPS59215727 A JP S59215727A JP 58092176 A JP58092176 A JP 58092176A JP 9217683 A JP9217683 A JP 9217683A JP S59215727 A JPS59215727 A JP S59215727A
Authority
JP
Japan
Prior art keywords
level
treatment
time
detected
surface treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58092176A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0142627B2 (enrdf_load_stackoverflow
Inventor
Nobutoshi Ogami
大神　信敏
Masaru Kitagawa
勝 北川
Hisao Nishizawa
西沢　久雄
Masakazu Saida
斎田　政和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP58092176A priority Critical patent/JPS59215727A/ja
Priority to US06/611,420 priority patent/US4569717A/en
Publication of JPS59215727A publication Critical patent/JPS59215727A/ja
Publication of JPH0142627B2 publication Critical patent/JPH0142627B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP58092176A 1983-05-24 1983-05-24 表面処理方法 Granted JPS59215727A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58092176A JPS59215727A (ja) 1983-05-24 1983-05-24 表面処理方法
US06/611,420 US4569717A (en) 1983-05-24 1984-05-17 Method of surface treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58092176A JPS59215727A (ja) 1983-05-24 1983-05-24 表面処理方法

Publications (2)

Publication Number Publication Date
JPS59215727A true JPS59215727A (ja) 1984-12-05
JPH0142627B2 JPH0142627B2 (enrdf_load_stackoverflow) 1989-09-13

Family

ID=14047119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58092176A Granted JPS59215727A (ja) 1983-05-24 1983-05-24 表面処理方法

Country Status (1)

Country Link
JP (1) JPS59215727A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0142627B2 (enrdf_load_stackoverflow) 1989-09-13

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